FR2511709B1 - - Google Patents
Info
- Publication number
- FR2511709B1 FR2511709B1 FR8116115A FR8116115A FR2511709B1 FR 2511709 B1 FR2511709 B1 FR 2511709B1 FR 8116115 A FR8116115 A FR 8116115A FR 8116115 A FR8116115 A FR 8116115A FR 2511709 B1 FR2511709 B1 FR 2511709B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8116115A FR2511709A1 (fr) | 1981-08-21 | 1981-08-21 | Procede pour obtenir un vide pousse dans l'enceinte d'un reacteur d'epitaxie par jets moleculaires et reacteur mettant en oeuvre ce procede |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8116115A FR2511709A1 (fr) | 1981-08-21 | 1981-08-21 | Procede pour obtenir un vide pousse dans l'enceinte d'un reacteur d'epitaxie par jets moleculaires et reacteur mettant en oeuvre ce procede |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2511709A1 FR2511709A1 (fr) | 1983-02-25 |
FR2511709B1 true FR2511709B1 (fr) | 1983-10-21 |
Family
ID=9261613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8116115A Granted FR2511709A1 (fr) | 1981-08-21 | 1981-08-21 | Procede pour obtenir un vide pousse dans l'enceinte d'un reacteur d'epitaxie par jets moleculaires et reacteur mettant en oeuvre ce procede |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2511709A1 (fr) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0653636B2 (ja) * | 1985-12-27 | 1994-07-20 | 守彦 木俣 | 分子線エピタキシアル装置 |
JPH08203830A (ja) * | 1994-07-20 | 1996-08-09 | Applied Materials Inc | 高温超高真空用真空処理チャンバ |
US6361618B1 (en) | 1994-07-20 | 2002-03-26 | Applied Materials, Inc. | Methods and apparatus for forming and maintaining high vacuum environments |
US6109880A (en) * | 1994-10-31 | 2000-08-29 | Saes Pure Gas, Inc. | Getter pump module and system including focus shields |
US5911560A (en) * | 1994-10-31 | 1999-06-15 | Saes Pure Gas, Inc. | Getter pump module and system |
US6142742A (en) * | 1994-10-31 | 2000-11-07 | Saes Pure Gas, Inc. | Getter pump module and system |
US5685963A (en) * | 1994-10-31 | 1997-11-11 | Saes Pure Gas, Inc. | In situ getter pump system and method |
US5972183A (en) * | 1994-10-31 | 1999-10-26 | Saes Getter S.P.A | Getter pump module and system |
US6077404A (en) | 1998-02-17 | 2000-06-20 | Applied Material, Inc. | Reflow chamber and process |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR850990A (fr) * | 1938-03-02 | 1939-12-30 | Procédé et appareil pour déposer des métaux par évaporation thermique dans le vide | |
CA1102013A (fr) * | 1977-05-26 | 1981-05-26 | Chin-An Chang | Traduction non-disponible |
-
1981
- 1981-08-21 FR FR8116115A patent/FR2511709A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2511709A1 (fr) | 1983-02-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |