FR2471621B1 - Plaque de resine photosensible stable vis-a-vis des variations d'humidite et developpable par l'eau et son procede de preparation - Google Patents

Plaque de resine photosensible stable vis-a-vis des variations d'humidite et developpable par l'eau et son procede de preparation

Info

Publication number
FR2471621B1
FR2471621B1 FR8002118A FR8002118A FR2471621B1 FR 2471621 B1 FR2471621 B1 FR 2471621B1 FR 8002118 A FR8002118 A FR 8002118A FR 8002118 A FR8002118 A FR 8002118A FR 2471621 B1 FR2471621 B1 FR 2471621B1
Authority
FR
France
Prior art keywords
developable
moisture
preparation
water
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8002118A
Other languages
English (en)
Other versions
FR2471621A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of FR2471621A1 publication Critical patent/FR2471621A1/fr
Application granted granted Critical
Publication of FR2471621B1 publication Critical patent/FR2471621B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR8002118A 1979-12-17 1980-01-31 Plaque de resine photosensible stable vis-a-vis des variations d'humidite et developpable par l'eau et son procede de preparation Expired FR2471621B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IE2441/79A IE49128B1 (en) 1979-12-17 1979-12-17 Process for the preparation of a photosensitive printing plate and use of the printing plate thereby obtained for the preparation of relief printing blocks

Publications (2)

Publication Number Publication Date
FR2471621A1 FR2471621A1 (fr) 1981-06-19
FR2471621B1 true FR2471621B1 (fr) 1985-06-28

Family

ID=11034812

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8002118A Expired FR2471621B1 (fr) 1979-12-17 1980-01-31 Plaque de resine photosensible stable vis-a-vis des variations d'humidite et developpable par l'eau et son procede de preparation

Country Status (7)

Country Link
DE (1) DE3003011C2 (fr)
DK (1) DK155899C (fr)
FR (1) FR2471621B1 (fr)
IE (1) IE49128B1 (fr)
IT (1) IT1128755B (fr)
SU (1) SU1366068A3 (fr)
ZA (1) ZA80506B (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0081964B2 (fr) * 1981-12-10 1993-08-04 Toray Industries, Inc. Composition polymère photosensible

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA987159A (en) * 1972-03-10 1976-04-13 Hercules Incorporated Photopolymer composition
DE2402808C3 (de) * 1972-10-20 1979-06-21 Nippon Paint Co Ltd Verfahren und Vorrichtung zur Herstellung von Polymerplatten
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
US4047963A (en) * 1976-06-17 1977-09-13 Hercules Incorporated Photopolymer compositions

Also Published As

Publication number Publication date
IE49128B1 (en) 1985-08-07
FR2471621A1 (fr) 1981-06-19
DE3003011A1 (de) 1981-06-25
DE3003011C2 (de) 1984-09-13
IT1128755B (it) 1986-06-04
DK155899B (da) 1989-05-29
DK35980A (da) 1981-06-18
ZA80506B (en) 1981-02-25
IT8067222A0 (it) 1980-02-14
DK155899C (da) 1989-10-09
SU1366068A3 (ru) 1988-01-07

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Legal Events

Date Code Title Description
ST Notification of lapse