IT1128755B - Lastra di resina fotosensibile particolarmente per stampa a rilievo e procedimento per la sua fabbricazione - Google Patents

Lastra di resina fotosensibile particolarmente per stampa a rilievo e procedimento per la sua fabbricazione

Info

Publication number
IT1128755B
IT1128755B IT67222/80A IT6722280A IT1128755B IT 1128755 B IT1128755 B IT 1128755B IT 67222/80 A IT67222/80 A IT 67222/80A IT 6722280 A IT6722280 A IT 6722280A IT 1128755 B IT1128755 B IT 1128755B
Authority
IT
Italy
Prior art keywords
procedure
manufacture
photosensitive resin
resin sheet
relief printing
Prior art date
Application number
IT67222/80A
Other languages
English (en)
Other versions
IT8067222A0 (it
Inventor
Hoshii Hideyasu
Arimatsu Seiji
Haruta Yasuo
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of IT8067222A0 publication Critical patent/IT8067222A0/it
Application granted granted Critical
Publication of IT1128755B publication Critical patent/IT1128755B/it

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IT67222/80A 1979-12-17 1980-02-14 Lastra di resina fotosensibile particolarmente per stampa a rilievo e procedimento per la sua fabbricazione IT1128755B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IE2441/79A IE49128B1 (en) 1979-12-17 1979-12-17 Process for the preparation of a photosensitive printing plate and use of the printing plate thereby obtained for the preparation of relief printing blocks

Publications (2)

Publication Number Publication Date
IT8067222A0 IT8067222A0 (it) 1980-02-14
IT1128755B true IT1128755B (it) 1986-06-04

Family

ID=11034812

Family Applications (1)

Application Number Title Priority Date Filing Date
IT67222/80A IT1128755B (it) 1979-12-17 1980-02-14 Lastra di resina fotosensibile particolarmente per stampa a rilievo e procedimento per la sua fabbricazione

Country Status (7)

Country Link
DE (1) DE3003011C2 (it)
DK (1) DK155899C (it)
FR (1) FR2471621B1 (it)
IE (1) IE49128B1 (it)
IT (1) IT1128755B (it)
SU (1) SU1366068A3 (it)
ZA (1) ZA80506B (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0081964B2 (en) * 1981-12-10 1993-08-04 Toray Industries, Inc. Photosensitive polymer composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA987159A (en) * 1972-03-10 1976-04-13 Hercules Incorporated Photopolymer composition
DE2402808C3 (de) * 1972-10-20 1979-06-21 Nippon Paint Co Ltd Verfahren und Vorrichtung zur Herstellung von Polymerplatten
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
US4047963A (en) * 1976-06-17 1977-09-13 Hercules Incorporated Photopolymer compositions

Also Published As

Publication number Publication date
IE49128B1 (en) 1985-08-07
FR2471621A1 (fr) 1981-06-19
DE3003011A1 (de) 1981-06-25
FR2471621B1 (fr) 1985-06-28
DE3003011C2 (de) 1984-09-13
DK155899B (da) 1989-05-29
DK35980A (da) 1981-06-18
ZA80506B (en) 1981-02-25
IT8067222A0 (it) 1980-02-14
DK155899C (da) 1989-10-09
SU1366068A3 (ru) 1988-01-07

Similar Documents

Publication Publication Date Title
NO893462D0 (no) Lysfoelsomt materiale for reliefftrykkplater og anvendelseav dette.
IT1168802B (it) Lastra da stampa a struttura multistrato
FR2525144B1 (fr) Presse a platines
IT1176148B (it) Lastra termoplastica protetta da un film conduttivo
GB2099730B (en) Developing photopolymer printing plates
JPS54135004A (en) Photosensitive flat printing plate
IT8112491A0 (it) Foglio riproducente a caldo
FR2514693B1 (fr) Presse a poinconner a tourelles
BE882654A (fr) Presse a comprimes
FI782374A (fi) Tork foer pappersark
FR2475751B1 (fr) Materiau photosensible lithographique a contraste eleve
IT8324127A0 (it) Foglio a rilascio e procedimento per la sua fabbricazione.
EP0129901A3 (en) Light-sensitive water-developable registration material for producing printing or relief forms, and resists
JPS5492402A (en) Photosensitive resin relief printing and fabrication
IT1162298B (it) Procedimento per preparare una lastra da stampa litografica
DE3270758D1 (en) Photosensitive lithographic plate
DK107879A (da) Litografisk trykkeplade og dens fremstilling
IT1129893B (it) Lastra fotosensibile da stampa
IT1107064B (it) Lastra da stampa in rilievo e procedimento per la sua fabbricazione
ES493510A0 (es) Un metodo de preparar una placa litografica
GB2092322B (en) Photosensitive lithographic printing plate material
GB2081465B (en) A photographic element for planography and a method for producing a planographic printing plate
DE3169226D1 (en) Aqueous developable photosensitive composition and printing plate
DE3060420D1 (en) Method for hardening a photographic material, and photosensitive material
IT1128755B (it) Lastra di resina fotosensibile particolarmente per stampa a rilievo e procedimento per la sua fabbricazione

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940225