FR2458142B1 - - Google Patents

Info

Publication number
FR2458142B1
FR2458142B1 FR8012082A FR8012082A FR2458142B1 FR 2458142 B1 FR2458142 B1 FR 2458142B1 FR 8012082 A FR8012082 A FR 8012082A FR 8012082 A FR8012082 A FR 8012082A FR 2458142 B1 FR2458142 B1 FR 2458142B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8012082A
Other languages
French (fr)
Other versions
FR2458142A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2458142A1 publication Critical patent/FR2458142A1/fr
Application granted granted Critical
Publication of FR2458142B1 publication Critical patent/FR2458142B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04756—Changing particle velocity decelerating with electrostatic means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Sources, Ion Sources (AREA)
FR8012082A 1979-06-01 1980-05-30 Perfectionnement au microscrope electronique a balayage Granted FR2458142A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792922325 DE2922325A1 (de) 1979-06-01 1979-06-01 Rasterelektronenmikroskop

Publications (2)

Publication Number Publication Date
FR2458142A1 FR2458142A1 (fr) 1980-12-26
FR2458142B1 true FR2458142B1 (enrdf_load_stackoverflow) 1983-12-16

Family

ID=6072234

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8012082A Granted FR2458142A1 (fr) 1979-06-01 1980-05-30 Perfectionnement au microscrope electronique a balayage

Country Status (6)

Country Link
US (1) US4330707A (enrdf_load_stackoverflow)
JP (1) JPS55161344A (enrdf_load_stackoverflow)
CA (1) CA1141481A (enrdf_load_stackoverflow)
DE (1) DE2922325A1 (enrdf_load_stackoverflow)
FR (1) FR2458142A1 (enrdf_load_stackoverflow)
GB (1) GB2052147A (enrdf_load_stackoverflow)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56501070A (enrdf_load_stackoverflow) * 1979-08-20 1981-07-30
JPS57165943A (en) * 1981-04-02 1982-10-13 Akashi Seisakusho Co Ltd Acceleration controlling method for charged particle beams in electron microscope and similar device
JPS5891643A (ja) * 1981-11-26 1983-05-31 Fujitsu Ltd 電子ビ−ムアニ−ル方法
DE3204897A1 (de) * 1982-02-12 1983-08-25 Siemens AG, 1000 Berlin und 8000 München Korpuskularstrahlerzeugendes system und verfahren zu seinem betrieb
US4713543A (en) * 1984-08-13 1987-12-15 Siemens Aktiengesellschaft Scanning particle microscope
US4675524A (en) * 1985-03-11 1987-06-23 Siemens Aktiengesellschaft Scanning particle microscope with diminished boersch effect
GB2215907B (en) * 1987-07-14 1992-04-15 Jeol Ltd Apparatus using a charged-particle beam
US4933552A (en) * 1988-10-06 1990-06-12 International Business Machines Corporation Inspection system utilizing retarding field back scattered electron collection
GB8920344D0 (en) * 1989-09-08 1989-10-25 Isis Innovation Method and apparatus for imaging dislocations in materials
JPH05192782A (ja) * 1992-01-21 1993-08-03 Fanuc Ltd レーザ加工装置
JP3323021B2 (ja) * 1994-12-28 2002-09-09 株式会社日立製作所 走査形電子顕微鏡及びそれを用いた試料像観察方法
JP3341226B2 (ja) * 1995-03-17 2002-11-05 株式会社日立製作所 走査電子顕微鏡
JP3372138B2 (ja) * 1995-06-26 2003-01-27 株式会社日立製作所 走査形電子顕微鏡
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
DE19605855A1 (de) * 1996-02-16 1997-08-21 Act Advanced Circuit Testing Detektorobjektiv für Korpuskularstrahlgeräte
DE19732093B4 (de) * 1997-07-25 2008-09-25 Carl Zeiss Nts Gmbh Korpuskularstrahlgerät
US20050103272A1 (en) * 2002-02-25 2005-05-19 Leo Elektronenmikroskopie Gmbh Material processing system and method
DE10233002B4 (de) * 2002-07-19 2006-05-04 Leo Elektronenmikroskopie Gmbh Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem
DE10317894B9 (de) 2003-04-17 2007-03-22 Leo Elektronenmikroskopie Gmbh Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
JP4519567B2 (ja) * 2004-08-11 2010-08-04 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびこれを用いた試料観察方法
JP4504344B2 (ja) * 2006-12-04 2010-07-14 国立大学法人 東京大学 Ｘ線源

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
DE2005682C3 (de) * 1970-02-07 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum Absaugen der Sekundärelektronen in einem Rasterelektronenmikroskop oder einem Elektronenstrahl-Mikroanalysator
JPS5025587Y2 (enrdf_load_stackoverflow) * 1971-08-20 1975-07-31
DE2151167C3 (de) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Mikroanalysator mit Auger-Elektronen-Nachweis
US3792263A (en) * 1972-09-13 1974-02-12 Jeol Ltd Scanning electron microscope with means to remove low energy electrons from the primary electron beam
JPS5135285A (enrdf_load_stackoverflow) * 1974-09-20 1976-03-25 Hitachi Ltd

Also Published As

Publication number Publication date
US4330707A (en) 1982-05-18
CA1141481A (en) 1983-02-15
DE2922325C2 (enrdf_load_stackoverflow) 1990-09-06
FR2458142A1 (fr) 1980-12-26
JPS55161344A (en) 1980-12-15
GB2052147A (en) 1981-01-21
DE2922325A1 (de) 1980-12-11
JPS6334588B2 (enrdf_load_stackoverflow) 1988-07-11

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Legal Events

Date Code Title Description
CD Change of name or company name
CD Change of name or company name
ST Notification of lapse