FR2455076A1 - Composition pour l'elimination des resines photoresistantes - Google Patents
Composition pour l'elimination des resines photoresistantesInfo
- Publication number
- FR2455076A1 FR2455076A1 FR7910291A FR7910291A FR2455076A1 FR 2455076 A1 FR2455076 A1 FR 2455076A1 FR 7910291 A FR7910291 A FR 7910291A FR 7910291 A FR7910291 A FR 7910291A FR 2455076 A1 FR2455076 A1 FR 2455076A1
- Authority
- FR
- France
- Prior art keywords
- cyclohexanone
- compsn
- hydro
- naphthalene
- organic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 title abstract 4
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 title 2
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 title 1
- 150000007524 organic acids Chemical class 0.000 title 1
- 230000002378 acidificating effect Effects 0.000 abstract 2
- -1 alkyl benzenesulphonic acid Chemical compound 0.000 abstract 2
- 229910019142 PO4 Inorganic materials 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000001988 toxicity Effects 0.000 abstract 1
- 231100000419 toxicity Toxicity 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7910291A FR2455076A1 (fr) | 1979-04-24 | 1979-04-24 | Composition pour l'elimination des resines photoresistantes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7910291A FR2455076A1 (fr) | 1979-04-24 | 1979-04-24 | Composition pour l'elimination des resines photoresistantes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2455076A1 true FR2455076A1 (fr) | 1980-11-21 |
| FR2455076B1 FR2455076B1 (cg-RX-API-DMAC7.html) | 1983-02-18 |
Family
ID=9224638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7910291A Granted FR2455076A1 (fr) | 1979-04-24 | 1979-04-24 | Composition pour l'elimination des resines photoresistantes |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2455076A1 (cg-RX-API-DMAC7.html) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0365988A3 (en) * | 1988-10-26 | 1990-12-12 | Hoechst Aktiengesellschaft | Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms |
| US5312719A (en) * | 1988-10-26 | 1994-05-17 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
| US5374500A (en) * | 1993-04-02 | 1994-12-20 | International Business Machines Corporation | Positive photoresist composition containing photoacid generator and use thereof |
| EP0939344A1 (en) * | 1998-02-27 | 1999-09-01 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US11365379B2 (en) | 2018-01-25 | 2022-06-21 | Merck Patent Gmbh | Photoresist remover compositions |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1419726A (fr) * | 1963-10-04 | 1965-12-03 | Kalle Ag | Solutions détersives pour formes d'imprimerie planes |
| FR2021696A1 (en) * | 1968-10-28 | 1970-07-24 | Eastman Kodak Co | Developing solution for use in photomechani- - cal process for removing support of hardened |
| FR2072172A5 (cg-RX-API-DMAC7.html) * | 1969-12-23 | 1971-09-24 | Ibm | |
| US4078102A (en) * | 1976-10-29 | 1978-03-07 | International Business Machines Corporation | Process for stripping resist layers from substrates |
-
1979
- 1979-04-24 FR FR7910291A patent/FR2455076A1/fr active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1419726A (fr) * | 1963-10-04 | 1965-12-03 | Kalle Ag | Solutions détersives pour formes d'imprimerie planes |
| FR2021696A1 (en) * | 1968-10-28 | 1970-07-24 | Eastman Kodak Co | Developing solution for use in photomechani- - cal process for removing support of hardened |
| FR2072172A5 (cg-RX-API-DMAC7.html) * | 1969-12-23 | 1971-09-24 | Ibm | |
| US4078102A (en) * | 1976-10-29 | 1978-03-07 | International Business Machines Corporation | Process for stripping resist layers from substrates |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0365988A3 (en) * | 1988-10-26 | 1990-12-12 | Hoechst Aktiengesellschaft | Developing solvent for layers which are crosslinkable by photopolymerization, and process for the production of relief printing forms |
| US5312719A (en) * | 1988-10-26 | 1994-05-17 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
| US5516623A (en) * | 1988-10-26 | 1996-05-14 | E. I. Du Pont De Nemours And Company | Developing solvent for layers which are crosslinkable by photopolymerization and process for the production of relief forms |
| US5374500A (en) * | 1993-04-02 | 1994-12-20 | International Business Machines Corporation | Positive photoresist composition containing photoacid generator and use thereof |
| EP0939344A1 (en) * | 1998-02-27 | 1999-09-01 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US6231677B1 (en) | 1998-02-27 | 2001-05-15 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US11365379B2 (en) | 2018-01-25 | 2022-06-21 | Merck Patent Gmbh | Photoresist remover compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2455076B1 (cg-RX-API-DMAC7.html) | 1983-02-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |