FR2452784B1 - - Google Patents
Info
- Publication number
- FR2452784B1 FR2452784B1 FR8007106A FR8007106A FR2452784B1 FR 2452784 B1 FR2452784 B1 FR 2452784B1 FR 8007106 A FR8007106 A FR 8007106A FR 8007106 A FR8007106 A FR 8007106A FR 2452784 B1 FR2452784 B1 FR 2452784B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
- H10D12/212—Gated diodes having PN junction gates, e.g. field controlled diodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/60—Gate-turn-off devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/343—Gate regions of field-effect devices having PN junction gates
-
- H10P14/271—
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- H10P14/2905—
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- H10P14/3411—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/026—Deposition thru hole in mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/088—J-Fet, i.e. junction field effect transistor
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3703479A JPS55130176A (en) | 1979-03-30 | 1979-03-30 | Field effect semiconductor element and method of fabricating the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2452784A1 FR2452784A1 (fr) | 1980-10-24 |
| FR2452784B1 true FR2452784B1 (OSRAM) | 1985-03-08 |
Family
ID=12486334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8007106A Granted FR2452784A1 (fr) | 1979-03-30 | 1980-03-28 | Procede de fabrication d'un dispositif semi-conducteur et particulierement d'un thyristor |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4329772A (OSRAM) |
| JP (1) | JPS55130176A (OSRAM) |
| DE (1) | DE3012119C2 (OSRAM) |
| FR (1) | FR2452784A1 (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2480502A1 (fr) * | 1980-04-14 | 1981-10-16 | Thomson Csf | Dispositif semi-conducteur a grille profonde, son application a une diode blocable, et procede de fabrication |
| US4637127A (en) * | 1981-07-07 | 1987-01-20 | Nippon Electric Co., Ltd. | Method for manufacturing a semiconductor device |
| US4375124A (en) * | 1981-11-12 | 1983-03-01 | Gte Laboratories Incorporated | Power static induction transistor fabrication |
| US4403396A (en) * | 1981-12-24 | 1983-09-13 | Gte Laboratories Incorporated | Semiconductor device design and process |
| US4503451A (en) * | 1982-07-30 | 1985-03-05 | Motorola, Inc. | Low resistance buried power bus for integrated circuits |
| US4615746A (en) * | 1983-09-29 | 1986-10-07 | Kenji Kawakita | Method of forming isolated island regions in a semiconductor substrate by selective etching and oxidation and devices formed therefrom |
| US4651410A (en) * | 1984-12-18 | 1987-03-24 | Semiconductor Division Thomson-Csf Components Corporation | Method of fabricating regions of a bipolar microwave integratable transistor |
| US4835586A (en) * | 1987-09-21 | 1989-05-30 | Siliconix Incorporated | Dual-gate high density fet |
| FR2658952A1 (fr) * | 1990-02-27 | 1991-08-30 | Thomson Csf | Procede de realisation de memoires haute densite. |
| DK170189B1 (da) * | 1990-05-30 | 1995-06-06 | Yakov Safir | Fremgangsmåde til fremstilling af halvlederkomponenter, samt solcelle fremstillet deraf |
| EP1372196A1 (de) * | 2002-06-10 | 2003-12-17 | ABB Schweiz AG | Verfahren zum Ansteuern einer Leistungsdiode und Schaltungsanordnung zum Durchführen dieses Verfahrens |
| CN103594490A (zh) * | 2012-08-13 | 2014-02-19 | 无锡维赛半导体有限公司 | 晶闸管及晶闸管封装件 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
| US3404450A (en) * | 1966-01-26 | 1968-10-08 | Westinghouse Electric Corp | Method of fabricating an integrated circuit structure including unipolar transistor and bipolar transistor portions |
| US3716422A (en) * | 1970-03-30 | 1973-02-13 | Ibm | Method of growing an epitaxial layer by controlling autodoping |
| US3938241A (en) * | 1972-10-24 | 1976-02-17 | Motorola, Inc. | Vertical channel junction field-effect transistors and method of manufacture |
| JPS50138777A (OSRAM) * | 1974-04-22 | 1975-11-05 | ||
| JPS5150581A (en) * | 1974-10-29 | 1976-05-04 | Mitsubishi Electric Corp | Tategata 4 kyokusetsugogatadenkaikokatoranjisuta |
| FR2296263A1 (fr) * | 1974-12-24 | 1976-07-23 | Radiotechnique Compelec | Procede de fabrication d'un dispositif semi-conducteur a effet de champ a canaux verticaux |
| JPS51135385A (en) * | 1975-03-06 | 1976-11-24 | Texas Instruments Inc | Method of producing semiconductor device |
| JPS51132779A (en) * | 1975-05-14 | 1976-11-18 | Hitachi Ltd | Production method of vertical-junction type field-effect transistor |
| JPS5220769A (en) * | 1975-08-09 | 1977-02-16 | Nippon Gakki Seizo Kk | Longitudinal semi-conductor unit |
| US3999281A (en) * | 1976-01-16 | 1976-12-28 | The United States Of America As Represented By The Secretary Of The Air Force | Method for fabricating a gridded Schottky barrier field effect transistor |
| US4181542A (en) * | 1976-10-25 | 1980-01-01 | Nippon Gakki Seizo Kabushiki Kaisha | Method of manufacturing junction field effect transistors |
| JPS5368178A (en) * | 1976-11-30 | 1978-06-17 | Handotai Kenkyu Shinkokai | Fet transistor |
-
1979
- 1979-03-30 JP JP3703479A patent/JPS55130176A/ja active Pending
-
1980
- 1980-03-27 US US06/134,673 patent/US4329772A/en not_active Expired - Lifetime
- 1980-03-28 FR FR8007106A patent/FR2452784A1/fr active Granted
- 1980-03-28 DE DE3012119A patent/DE3012119C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US4329772A (en) | 1982-05-18 |
| JPS55130176A (en) | 1980-10-08 |
| DE3012119A1 (de) | 1980-10-02 |
| FR2452784A1 (fr) | 1980-10-24 |
| DE3012119C2 (de) | 1985-11-07 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |