FR2446507B3 - - Google Patents
Info
- Publication number
- FR2446507B3 FR2446507B3 FR8000480A FR8000480A FR2446507B3 FR 2446507 B3 FR2446507 B3 FR 2446507B3 FR 8000480 A FR8000480 A FR 8000480A FR 8000480 A FR8000480 A FR 8000480A FR 2446507 B3 FR2446507 B3 FR 2446507B3
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2900921A DE2900921C2 (de) | 1979-01-11 | 1979-01-11 | Verfahren zum Projektionskopieren von Masken auf ein Werkstück |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2446507A1 FR2446507A1 (fr) | 1980-08-08 |
| FR2446507B3 true FR2446507B3 (US07569232-20090804-C00002.png) | 1981-10-16 |
Family
ID=6060372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8000480A Granted FR2446507A1 (fr) | 1979-01-11 | 1980-01-10 | Dispositif pour produire par projection des masques sur une piece |
Country Status (6)
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3318980C2 (de) * | 1982-07-09 | 1986-09-18 | Perkin-Elmer Censor Anstalt, Vaduz | Vorrichtung zum Justieren beim Projektionskopieren von Masken |
| JPS5950518A (ja) * | 1982-09-01 | 1984-03-23 | パ−キン−エルマ−・ツエンゾ−ル・アンシュタルト | 投影プリント方法 |
| JPS5946026A (ja) * | 1982-09-09 | 1984-03-15 | Toshiba Corp | 試料位置測定方法 |
| JPS5972728A (ja) * | 1982-10-20 | 1984-04-24 | Canon Inc | 自動整合装置 |
| JPS59101829A (ja) * | 1982-12-01 | 1984-06-12 | Canon Inc | アライメントマ−クの配置方法 |
| DE3485022D1 (de) * | 1983-12-26 | 1991-10-10 | Hitachi Ltd | Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck. |
| DE3402178A1 (de) * | 1984-01-23 | 1985-07-25 | Werner Dr. Vaduz Tabarelli | Vorrichtung zum projektionskopieren von masken auf ein werkstueck |
| DE3402177A1 (de) * | 1984-01-23 | 1985-07-25 | Werner Dr. Vaduz Tabarelli | Einrichtung zum kopieren einer maske auf ein halbleitersubstrat |
| JPH0722097B2 (ja) * | 1984-06-11 | 1995-03-08 | 株式会社ニコン | 投影露光方法 |
| US4682037A (en) * | 1984-07-10 | 1987-07-21 | Canon Kabushiki Kaisha | Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light |
| US4701050A (en) * | 1984-08-10 | 1987-10-20 | Hitachi, Ltd. | Semiconductor exposure apparatus and alignment method therefor |
| US4725737A (en) * | 1984-11-13 | 1988-02-16 | Hitachi, Ltd. | Alignment method and apparatus for reduction projection type aligner |
| JPS61183928A (ja) * | 1985-02-12 | 1986-08-16 | Nippon Kogaku Kk <Nikon> | 投影光学装置 |
| JPS61123139A (ja) * | 1985-10-11 | 1986-06-11 | Canon Inc | アライメント装置 |
| JPH0685387B2 (ja) * | 1986-02-14 | 1994-10-26 | 株式会社東芝 | 位置合わせ方法 |
| JPS62281422A (ja) * | 1986-05-30 | 1987-12-07 | Canon Inc | 露光装置 |
| JPS62293718A (ja) * | 1986-06-13 | 1987-12-21 | Canon Inc | 露光装置 |
| US5137363A (en) * | 1986-06-04 | 1992-08-11 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| JPS63187729U (US07569232-20090804-C00002.png) * | 1987-05-26 | 1988-12-01 | ||
| JPS63153821A (ja) * | 1987-10-27 | 1988-06-27 | Nikon Corp | 位置合わせ装置 |
| US5631731A (en) * | 1994-03-09 | 1997-05-20 | Nikon Precision, Inc. | Method and apparatus for aerial image analyzer |
| US5917332A (en) * | 1996-05-09 | 1999-06-29 | Advanced Micro Devices, Inc. | Arrangement for improving defect scanner sensitivity and scanning defects on die of a semiconductor wafer |
| SE540184C2 (en) | 2016-07-29 | 2018-04-24 | Exeger Operations Ab | A light absorbing layer and a photovoltaic device including a light absorbing layer |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3695758A (en) * | 1969-06-30 | 1972-10-03 | Nippon Kogaku Kk | Illumination device for projector type ic printer |
| US3844655A (en) * | 1973-07-27 | 1974-10-29 | Kasper Instruments | Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask |
| US3865483A (en) * | 1974-03-21 | 1975-02-11 | Ibm | Alignment illumination system |
| DE2539206A1 (de) * | 1975-09-03 | 1977-03-17 | Siemens Ag | Verfahren zur automatischen justierung von halbleiterscheiben |
| JPS52109875A (en) * | 1976-02-25 | 1977-09-14 | Hitachi Ltd | Position matching system for mask and wafer and its unit |
-
1979
- 1979-01-11 DE DE2900921A patent/DE2900921C2/de not_active Expired
-
1980
- 1980-01-02 US US06/109,169 patent/US4357100A/en not_active Expired - Lifetime
- 1980-01-08 JP JP55000327A patent/JPS5924537B2/ja not_active Expired
- 1980-01-10 FR FR8000480A patent/FR2446507A1/fr active Granted
- 1980-01-10 NL NL8000166A patent/NL8000166A/nl not_active Application Discontinuation
- 1980-01-11 GB GB8000969A patent/GB2041554A/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| GB2041554A (en) | 1980-09-10 |
| JPS55108743A (en) | 1980-08-21 |
| DE2900921B1 (de) | 1980-07-24 |
| US4357100A (en) | 1982-11-02 |
| NL8000166A (nl) | 1980-07-15 |
| DE2900921C2 (de) | 1981-06-04 |
| FR2446507A1 (fr) | 1980-08-08 |
| JPS5924537B2 (ja) | 1984-06-09 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CD | Change of name or company name |