FR2416920A1 - Compositions photopolymerisables sulfonium epoxydes inodores - Google Patents

Compositions photopolymerisables sulfonium epoxydes inodores

Info

Publication number
FR2416920A1
FR2416920A1 FR7903068A FR7903068A FR2416920A1 FR 2416920 A1 FR2416920 A1 FR 2416920A1 FR 7903068 A FR7903068 A FR 7903068A FR 7903068 A FR7903068 A FR 7903068A FR 2416920 A1 FR2416920 A1 FR 2416920A1
Authority
FR
France
Prior art keywords
odorless
epoxides
sulfonium
organic material
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7903068A
Other languages
English (en)
Other versions
FR2416920B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of FR2416920A1 publication Critical patent/FR2416920A1/fr
Application granted granted Critical
Publication of FR2416920B1 publication Critical patent/FR2416920B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

L'invention est relative à des compositions photopolymérisables. Ces compositions photopolymérisables, qui sont du type comprenant une première matière organique comportant un ou plusieurs groupements fonctionnels époxydes et polymérisables à un poids moléculaire supérieur, et un sel complexe de sulfonium aromatique, comprenant une seconde matière organique comportant au moins un site d'insaturation carbone-carbone non aromatique. Ces compositions ne présentent pas l'odeur caractéristique des composés organiques du soufre en raison de la présence de la seconde matière organique.
FR7903068A 1978-02-08 1979-02-07 Compositions photopolymerisables sulfonium epoxydes inodores Granted FR2416920A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/876,113 US4218531A (en) 1978-02-08 1978-02-08 Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions

Publications (2)

Publication Number Publication Date
FR2416920A1 true FR2416920A1 (fr) 1979-09-07
FR2416920B1 FR2416920B1 (fr) 1983-07-18

Family

ID=25367022

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7903068A Granted FR2416920A1 (fr) 1978-02-08 1979-02-07 Compositions photopolymerisables sulfonium epoxydes inodores

Country Status (12)

Country Link
US (1) US4218531A (fr)
JP (1) JPS54117599A (fr)
AU (1) AU527513B2 (fr)
BE (1) BE874003A (fr)
BR (1) BR7900746A (fr)
CA (1) CA1134536A (fr)
CH (1) CH642387A5 (fr)
DE (1) DE2904625A1 (fr)
FR (1) FR2416920A1 (fr)
GB (2) GB2074595B (fr)
IN (1) IN150880B (fr)
SE (1) SE443794C (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4362263A (en) * 1980-04-24 1982-12-07 Westinghouse Electric Corp. Solderable solventless UV curable enamel
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
JPS5943015A (ja) * 1982-09-02 1984-03-09 Toyobo Co Ltd 硬化型樹脂組成物
US4818776A (en) * 1983-02-07 1989-04-04 Union Carbide Corporation Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content
US4814361A (en) * 1983-02-07 1989-03-21 Union Carbide Corporation Blends of epoxides and monoepoxides
US4593051A (en) * 1983-02-07 1986-06-03 Union Carbide Corporation Photocopolymerizable compositons based on epoxy and polymer/hydroxyl-containing organic materials
US4812488A (en) * 1983-02-07 1989-03-14 Union Carbide Corporation Photocopolymerizable compositions based on hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents
US4874798A (en) * 1983-02-07 1989-10-17 Union Carbide Corporation Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents
US4622349A (en) * 1983-02-07 1986-11-11 Union Carbide Corporation Blends of epoxides and monoepoxides
JPS6014729U (ja) * 1983-07-08 1985-01-31 小瀬木 勇 ナイフケ−ス等の吊下係止具
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
US4892894A (en) * 1985-11-07 1990-01-09 Union Carbide Chemical And Plastics Company Inc. Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4657779A (en) * 1986-03-19 1987-04-14 Desoto, Inc. Shrinkage-resistant ultraviolet-curing coatings
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
US5059512A (en) * 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
DE4421623A1 (de) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen
US20030108810A1 (en) * 2001-08-22 2003-06-12 Williamson Sue Ellen Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators
JP5837590B2 (ja) 2010-06-28 2015-12-24 ダウ グローバル テクノロジーズ エルエルシー 硬化性樹脂組成物
WO2012009120A2 (fr) 2010-06-28 2012-01-19 Dow Global Technologies Llc Compositions de résines durcissables
WO2013188070A1 (fr) 2012-06-15 2013-12-19 Dow Global Technologies Llc Compositions durcissables

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1411267A (fr) * 1963-08-20 1965-09-17 Denki Kagaku Kogyo Kk Perfectionnements aux caoutchoucs au polychloroprène
FR2285423A1 (fr) * 1974-09-18 1976-04-16 Ici Ltd Compositions photopolymerisables

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL128404C (fr) * 1959-12-24
US4058400A (en) * 1974-05-02 1977-11-15 General Electric Company Cationically polymerizable compositions containing group VIa onium salts
US4058401A (en) * 1974-05-02 1977-11-15 General Electric Company Photocurable compositions containing group via aromatic onium salts
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4138255A (en) * 1977-06-27 1979-02-06 General Electric Company Photo-curing method for epoxy resin using group VIa onium salt
US4156035A (en) * 1978-05-09 1979-05-22 W. R. Grace & Co. Photocurable epoxy-acrylate compositions

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1411267A (fr) * 1963-08-20 1965-09-17 Denki Kagaku Kogyo Kk Perfectionnements aux caoutchoucs au polychloroprène
FR2285423A1 (fr) * 1974-09-18 1976-04-16 Ici Ltd Compositions photopolymerisables

Also Published As

Publication number Publication date
GB2014151A (en) 1979-08-22
IN150880B (fr) 1983-01-08
AU4402679A (en) 1979-08-16
US4218531A (en) 1980-08-19
SE443794B (sv) 1986-03-10
BR7900746A (pt) 1979-08-28
JPS54117599A (en) 1979-09-12
DE2904625C2 (fr) 1988-08-11
DE2904625A1 (de) 1979-08-09
GB2074595B (en) 1982-12-22
CA1134536A (fr) 1982-10-26
SE443794C (sv) 1991-10-21
GB2074595A (en) 1981-11-04
FR2416920B1 (fr) 1983-07-18
GB2014151B (en) 1982-07-07
CH642387A5 (de) 1984-04-13
AU527513B2 (en) 1983-03-10
SE7900979L (sv) 1979-08-09
JPS6357450B2 (fr) 1988-11-11
BE874003A (fr) 1979-08-07

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