FR2415823B1 - - Google Patents
Info
- Publication number
- FR2415823B1 FR2415823B1 FR7901909A FR7901909A FR2415823B1 FR 2415823 B1 FR2415823 B1 FR 2415823B1 FR 7901909 A FR7901909 A FR 7901909A FR 7901909 A FR7901909 A FR 7901909A FR 2415823 B1 FR2415823 B1 FR 2415823B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87285278A | 1978-01-27 | 1978-01-27 | |
| US91886578A | 1978-06-26 | 1978-06-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2415823A1 FR2415823A1 (fr) | 1979-08-24 |
| FR2415823B1 true FR2415823B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-04-10 |
Family
ID=27128264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7901909A Granted FR2415823A1 (fr) | 1978-01-27 | 1979-01-25 | Composition photoreticulable contenant un polymere a groupe carbonyle, produit photosensible obtenu a partir de cette composition et procede de formation d'image qui utilise ce produit |
Country Status (4)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4225689A (en) * | 1978-07-26 | 1980-09-30 | Eastman Kodak Company | Aldehyde-containing vinylaryl ethers |
| JPH02173752A (ja) * | 1988-12-27 | 1990-07-05 | Japan Synthetic Rubber Co Ltd | 感放射線性組成物 |
| KR100395904B1 (ko) * | 1999-04-23 | 2003-08-27 | 주식회사 하이닉스반도체 | 유기 반사방지 중합체 및 그의 제조방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE757961A (fr) * | 1969-10-24 | 1971-04-01 | Ici Ltd | Procedes pour enregistrer une image |
| US4045221A (en) * | 1975-09-08 | 1977-08-30 | Eastman Kodak Company | Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex |
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1979
- 1979-01-25 DE DE19792902860 patent/DE2902860A1/de not_active Withdrawn
- 1979-01-25 FR FR7901909A patent/FR2415823A1/fr active Granted
- 1979-01-26 GB GB7902821A patent/GB2013214B/en not_active Expired
- 1979-01-27 JP JP770179A patent/JPS54113326A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2415823A1 (fr) | 1979-08-24 |
| DE2902860A1 (de) | 1979-08-02 |
| JPS54113326A (en) | 1979-09-04 |
| GB2013214A (en) | 1979-08-08 |
| GB2013214B (en) | 1982-08-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |