FR2407567B1 - - Google Patents
Info
- Publication number
- FR2407567B1 FR2407567B1 FR7830899A FR7830899A FR2407567B1 FR 2407567 B1 FR2407567 B1 FR 2407567B1 FR 7830899 A FR7830899 A FR 7830899A FR 7830899 A FR7830899 A FR 7830899A FR 2407567 B1 FR2407567 B1 FR 2407567B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/847,485 US4147937A (en) | 1977-11-01 | 1977-11-01 | Electron beam exposure system method and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2407567A1 FR2407567A1 (fr) | 1979-05-25 |
| FR2407567B1 true FR2407567B1 (fr) | 1981-07-17 |
Family
ID=25300745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7830899A Granted FR2407567A1 (fr) | 1977-11-01 | 1978-10-31 | Procede et appareil de fabrication de dispositifs electroniques microminiaturises par exposition a un faisceau electronique |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4147937A (fr) |
| JP (1) | JPS5472683A (fr) |
| CA (1) | CA1094668A (fr) |
| DE (1) | DE2847369A1 (fr) |
| FR (1) | FR2407567A1 (fr) |
| NL (1) | NL183682C (fr) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5493364A (en) * | 1977-12-30 | 1979-07-24 | Fujitsu Ltd | Exposure system for electron beam |
| US4280186A (en) * | 1978-07-07 | 1981-07-21 | Tokyo Shibaura Denki Kabushiki Kaisha | Exposure apparatus using electron beams |
| JPS55165632A (en) * | 1979-06-12 | 1980-12-24 | Fujitsu Ltd | Method for electron-beam exposure |
| DE3069060D1 (en) * | 1979-06-08 | 1984-10-04 | Fujitsu Ltd | Electron beam projecting system |
| US4484077A (en) * | 1979-06-08 | 1984-11-20 | Fujitsu Limited | Exposure system and method using an electron beam |
| JPS5753938A (en) * | 1980-09-17 | 1982-03-31 | Toshiba Corp | Electron beam exposure apparatus |
| DE3169257D1 (en) * | 1980-11-28 | 1985-04-18 | Ibm | Electron beam system and method |
| JPS57204125A (en) * | 1981-06-10 | 1982-12-14 | Hitachi Ltd | Electron-ray drawing device |
| US4477729A (en) * | 1982-10-01 | 1984-10-16 | International Business Machines Corporation | Continuously writing electron beam stitched pattern exposure system |
| JPS59124719A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | 電子ビ−ム露光装置 |
| JPH0793250B2 (ja) * | 1984-09-21 | 1995-10-09 | 株式会社東芝 | パタ−ン形成方法 |
| US4698509A (en) * | 1985-02-14 | 1987-10-06 | Varian Associates, Inc. | High speed pattern generator for electron beam lithography |
| US4837447A (en) * | 1986-05-06 | 1989-06-06 | Research Triangle Institute, Inc. | Rasterization system for converting polygonal pattern data into a bit-map |
| JPS62277724A (ja) * | 1986-05-27 | 1987-12-02 | Fujitsu Ltd | 電子ビ−ム露光装置 |
| JP2880284B2 (ja) * | 1990-11-30 | 1999-04-05 | 株式会社日立製作所 | 電子ビーム描画法および装置 |
| US5251140A (en) * | 1991-07-26 | 1993-10-05 | International Business Machines Corporation | E-beam control data compaction system and method |
| US5159201A (en) * | 1991-07-26 | 1992-10-27 | International Business Machines Corporation | Shape decompositon system and method |
| US5294800A (en) * | 1992-07-31 | 1994-03-15 | International Business Machines Corporation | E-beam control data compaction system and method |
| RU2164718C1 (ru) * | 2000-07-04 | 2001-03-27 | Общество с ограниченной ответственностью "Агентство маркетинга научных разработок" | Установка для формирования наноструктур на поверхности полупроводниковых пластин ионными пучками |
| DE102004055149B4 (de) * | 2004-11-16 | 2007-07-19 | Leica Microsystems Lithography Gmbh | Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3866013A (en) * | 1973-09-19 | 1975-02-11 | Ibm | Method and apparatus for controlling movable means such as an electron beam |
| US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
| JPS5148313A (ja) * | 1974-10-23 | 1976-04-26 | Hitachi Ltd | Fudogatajikihetsudoroodeingukiko |
| JPS51147967A (en) * | 1975-06-14 | 1976-12-18 | Fujitsu Ltd | Method of controlling spot exposure |
| JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
-
1977
- 1977-11-01 US US05/847,485 patent/US4147937A/en not_active Expired - Lifetime
-
1978
- 1978-09-28 CA CA312,283A patent/CA1094668A/fr not_active Expired
- 1978-10-31 DE DE19782847369 patent/DE2847369A1/de active Granted
- 1978-10-31 NL NLAANVRAGE7810809,A patent/NL183682C/xx not_active IP Right Cessation
- 1978-10-31 FR FR7830899A patent/FR2407567A1/fr active Granted
- 1978-11-01 JP JP13384578A patent/JPS5472683A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| CA1094668A (fr) | 1981-01-27 |
| US4147937A (en) | 1979-04-03 |
| FR2407567A1 (fr) | 1979-05-25 |
| DE2847369C2 (fr) | 1990-08-30 |
| NL183682B (nl) | 1988-07-18 |
| JPS5472683A (en) | 1979-06-11 |
| NL183682C (nl) | 1988-12-16 |
| DE2847369A1 (de) | 1979-05-03 |
| JPS5728946B2 (fr) | 1982-06-19 |
| NL7810809A (nl) | 1979-05-03 |