FR2402301A1 - Appareil de micro-usinage par erosion ionique utilisant une source de plasma - Google Patents

Appareil de micro-usinage par erosion ionique utilisant une source de plasma

Info

Publication number
FR2402301A1
FR2402301A1 FR7726681A FR7726681A FR2402301A1 FR 2402301 A1 FR2402301 A1 FR 2402301A1 FR 7726681 A FR7726681 A FR 7726681A FR 7726681 A FR7726681 A FR 7726681A FR 2402301 A1 FR2402301 A1 FR 2402301A1
Authority
FR
France
Prior art keywords
source
substrate
magnetron
micro
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7726681A
Other languages
English (en)
Other versions
FR2402301B1 (fr
Inventor
Charles Fremiot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR7726681A priority Critical patent/FR2402301A1/fr
Priority to DE19782837594 priority patent/DE2837594A1/de
Publication of FR2402301A1 publication Critical patent/FR2402301A1/fr
Application granted granted Critical
Publication of FR2402301B1 publication Critical patent/FR2402301B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Appareil de micro-usinage par érosion ionique utilisant une source de plasma. L'appareil est caractérisé en ce qu'il comprend une source de plasma délivrant un jet de plasma neutre qui transite à travers l'enceinte en direction du substrat et une source de tension apte à créer au voisinage du substrat un champ électrique d'extraction. Application en microélectronique.
FR7726681A 1977-09-02 1977-09-02 Appareil de micro-usinage par erosion ionique utilisant une source de plasma Granted FR2402301A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR7726681A FR2402301A1 (fr) 1977-09-02 1977-09-02 Appareil de micro-usinage par erosion ionique utilisant une source de plasma
DE19782837594 DE2837594A1 (de) 1977-09-02 1978-08-29 Vorrichtung zur mikro-bearbeitung mittels ionenerosion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7726681A FR2402301A1 (fr) 1977-09-02 1977-09-02 Appareil de micro-usinage par erosion ionique utilisant une source de plasma

Publications (2)

Publication Number Publication Date
FR2402301A1 true FR2402301A1 (fr) 1979-03-30
FR2402301B1 FR2402301B1 (fr) 1980-08-01

Family

ID=9194988

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7726681A Granted FR2402301A1 (fr) 1977-09-02 1977-09-02 Appareil de micro-usinage par erosion ionique utilisant une source de plasma

Country Status (2)

Country Link
DE (1) DE2837594A1 (fr)
FR (1) FR2402301A1 (fr)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2481838A1 (fr) * 1980-05-02 1981-11-06 Nippon Telegraph & Telephone Appareil de depot de plasma pour former une pellicule sur un substrat
EP0047663A2 (fr) * 1980-09-10 1982-03-17 Hitachi, Ltd. Gravure par plasma à micro-ondes
FR2512623A1 (fr) * 1981-09-10 1983-03-11 Commissariat Energie Atomique Procede de fusion et/ou d'evaporation pulsee d'un materiau solide
EP0076562A2 (fr) * 1981-10-07 1983-04-13 Becton Dickinson and Company Substrats ayant des surfaces modifiées chimiquement et procédé pour leur préparation
EP0171949A2 (fr) * 1984-07-23 1986-02-19 Fujitsu Limited Appareil d'attaque par plasma à ondes hyperfréquences
WO1986006923A1 (fr) * 1985-05-03 1986-11-20 The Australian National University Procede et appareil de production de plasmas magnetiques de grand volume
WO1986007495A1 (fr) * 1985-06-04 1986-12-18 The Dow Chemical Company Batterie secondaire rechargeable
AU577470B2 (en) * 1985-05-03 1988-09-22 Australian National University, The Method and apparatus for producing large volume magnetoplasmas
DE3708717A1 (de) * 1987-03-18 1988-09-29 Hans Prof Dr Rer Nat Oechsner Verfahren und vorrichtung zur bearbeitung von festkoerperoberflaechen durch teilchenbeschuss
DE3830478A1 (de) * 1987-09-21 1989-07-13 Leybold Ag Kathodenzerstaeubungsvorrichtung
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
DE19739894A1 (de) * 1997-09-11 1999-03-25 Muegge Electronic Gmbh Plasmabehandlungsvorrichtung

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423303A (en) * 1980-05-06 1983-12-27 Tokyo Shibaura Denki Kabushiki Kaisha Apparatus for treating powdery materials utilizing microwave plasma
JPS5782955A (en) * 1980-11-12 1982-05-24 Hitachi Ltd Microwave plasma generating apparatus
KR920002864B1 (ko) * 1987-07-20 1992-04-06 가부시기가이샤 히다찌세이사꾸쇼 플라즈마 처리방법 및 그 장치
JP2805009B2 (ja) * 1988-05-11 1998-09-30 株式会社日立製作所 プラズマ発生装置及びプラズマ元素分析装置
DE4031546A1 (de) * 1990-10-05 1992-04-09 Hell Rudolf Dr Ing Gmbh Verfahren und vorrichtung zur herstellung einer texturwalze

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3117252A1 (de) * 1980-05-02 1982-08-12 Nippon Telegraph & Telephone Public Corp., Tokyo Plasmaauftragvorrichtung
FR2481838A1 (fr) * 1980-05-02 1981-11-06 Nippon Telegraph & Telephone Appareil de depot de plasma pour former une pellicule sur un substrat
EP0047663A2 (fr) * 1980-09-10 1982-03-17 Hitachi, Ltd. Gravure par plasma à micro-ondes
EP0047663A3 (en) * 1980-09-10 1982-06-23 Hitachi, Ltd. Microwave plasma etching
FR2512623A1 (fr) * 1981-09-10 1983-03-11 Commissariat Energie Atomique Procede de fusion et/ou d'evaporation pulsee d'un materiau solide
EP0076562A2 (fr) * 1981-10-07 1983-04-13 Becton Dickinson and Company Substrats ayant des surfaces modifiées chimiquement et procédé pour leur préparation
EP0076562A3 (en) * 1981-10-07 1983-11-02 Becton, Dickinson And Company Substrate with chemically modified surface and method of manufacture thereof
EP0171949A3 (en) * 1984-07-23 1987-05-13 Fujitsu Limited Microwave plasma etching apparatus
EP0171949A2 (fr) * 1984-07-23 1986-02-19 Fujitsu Limited Appareil d'attaque par plasma à ondes hyperfréquences
WO1986006923A1 (fr) * 1985-05-03 1986-11-20 The Australian National University Procede et appareil de production de plasmas magnetiques de grand volume
AU577470B2 (en) * 1985-05-03 1988-09-22 Australian National University, The Method and apparatus for producing large volume magnetoplasmas
WO1986007495A1 (fr) * 1985-06-04 1986-12-18 The Dow Chemical Company Batterie secondaire rechargeable
DE3708717A1 (de) * 1987-03-18 1988-09-29 Hans Prof Dr Rer Nat Oechsner Verfahren und vorrichtung zur bearbeitung von festkoerperoberflaechen durch teilchenbeschuss
US5156703A (en) * 1987-03-18 1992-10-20 Hans Oechsner Mthod for the surface treatment of semiconductors by particle bombardment
DE3830478A1 (de) * 1987-09-21 1989-07-13 Leybold Ag Kathodenzerstaeubungsvorrichtung
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
DE19739894A1 (de) * 1997-09-11 1999-03-25 Muegge Electronic Gmbh Plasmabehandlungsvorrichtung
DE19739894C2 (de) * 1997-09-11 2001-07-05 Muegge Electronic Gmbh Plasmabehandlungsvorrichtung

Also Published As

Publication number Publication date
FR2402301B1 (fr) 1980-08-01
DE2837594A1 (de) 1979-03-15

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Legal Events

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