FR2376439A1 - Matiere photopolymerisable pour la realisation de formes d'impression en relief - Google Patents

Matiere photopolymerisable pour la realisation de formes d'impression en relief

Info

Publication number
FR2376439A1
FR2376439A1 FR7739872A FR7739872A FR2376439A1 FR 2376439 A1 FR2376439 A1 FR 2376439A1 FR 7739872 A FR7739872 A FR 7739872A FR 7739872 A FR7739872 A FR 7739872A FR 2376439 A1 FR2376439 A1 FR 2376439A1
Authority
FR
France
Prior art keywords
relief printing
printing forms
realization
photopolymerisable material
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7739872A
Other languages
English (en)
French (fr)
Other versions
FR2376439B1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of FR2376439A1 publication Critical patent/FR2376439A1/fr
Application granted granted Critical
Publication of FR2376439B1 publication Critical patent/FR2376439B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7739872A 1976-12-31 1977-12-30 Matiere photopolymerisable pour la realisation de formes d'impression en relief Granted FR2376439A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762659699 DE2659699A1 (de) 1976-12-31 1976-12-31 Photopolymerisierbare masse fuer die herstellung von reliefformen

Publications (2)

Publication Number Publication Date
FR2376439A1 true FR2376439A1 (fr) 1978-07-28
FR2376439B1 FR2376439B1 (es) 1982-10-22

Family

ID=5997121

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7739872A Granted FR2376439A1 (fr) 1976-12-31 1977-12-30 Matiere photopolymerisable pour la realisation de formes d'impression en relief

Country Status (6)

Country Link
JP (1) JPS6054665B2 (es)
CH (1) CH632096A5 (es)
DE (1) DE2659699A1 (es)
FR (1) FR2376439A1 (es)
GB (1) GB1590590A (es)
IT (1) IT1092248B (es)

Also Published As

Publication number Publication date
DE2659699A1 (de) 1978-07-20
GB1590590A (en) 1981-06-03
JPS6054665B2 (ja) 1985-11-30
FR2376439B1 (es) 1982-10-22
CH632096A5 (en) 1982-09-15
IT1092248B (it) 1985-07-06
JPS5385418A (en) 1978-07-27

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Legal Events

Date Code Title Description
ST Notification of lapse