FR2376439A1 - Matiere photopolymerisable pour la realisation de formes d'impression en relief - Google Patents
Matiere photopolymerisable pour la realisation de formes d'impression en reliefInfo
- Publication number
- FR2376439A1 FR2376439A1 FR7739872A FR7739872A FR2376439A1 FR 2376439 A1 FR2376439 A1 FR 2376439A1 FR 7739872 A FR7739872 A FR 7739872A FR 7739872 A FR7739872 A FR 7739872A FR 2376439 A1 FR2376439 A1 FR 2376439A1
- Authority
- FR
- France
- Prior art keywords
- relief printing
- printing forms
- realization
- photopolymerisable material
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 150000001408 amides Chemical class 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920006305 unsaturated polyester Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762659699 DE2659699A1 (de) | 1976-12-31 | 1976-12-31 | Photopolymerisierbare masse fuer die herstellung von reliefformen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2376439A1 true FR2376439A1 (fr) | 1978-07-28 |
| FR2376439B1 FR2376439B1 (enrdf_load_stackoverflow) | 1982-10-22 |
Family
ID=5997121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7739872A Granted FR2376439A1 (fr) | 1976-12-31 | 1977-12-30 | Matiere photopolymerisable pour la realisation de formes d'impression en relief |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS6054665B2 (enrdf_load_stackoverflow) |
| CH (1) | CH632096A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2659699A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2376439A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1590590A (enrdf_load_stackoverflow) |
| IT (1) | IT1092248B (enrdf_load_stackoverflow) |
-
1976
- 1976-12-31 DE DE19762659699 patent/DE2659699A1/de not_active Withdrawn
-
1977
- 1977-12-27 JP JP15663077A patent/JPS6054665B2/ja not_active Expired
- 1977-12-27 IT IT5238077A patent/IT1092248B/it active
- 1977-12-28 CH CH1613077A patent/CH632096A5/de not_active IP Right Cessation
- 1977-12-30 FR FR7739872A patent/FR2376439A1/fr active Granted
- 1977-12-30 GB GB5425977A patent/GB1590590A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1092248B (it) | 1985-07-06 |
| JPS5385418A (en) | 1978-07-27 |
| CH632096A5 (en) | 1982-09-15 |
| FR2376439B1 (enrdf_load_stackoverflow) | 1982-10-22 |
| GB1590590A (en) | 1981-06-03 |
| JPS6054665B2 (ja) | 1985-11-30 |
| DE2659699A1 (de) | 1978-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |