FR2373505B1 - - Google Patents
Info
- Publication number
- FR2373505B1 FR2373505B1 FR7737221A FR7737221A FR2373505B1 FR 2373505 B1 FR2373505 B1 FR 2373505B1 FR 7737221 A FR7737221 A FR 7737221A FR 7737221 A FR7737221 A FR 7737221A FR 2373505 B1 FR2373505 B1 FR 2373505B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
- C07D207/452—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/749,116 US4151175A (en) | 1976-12-09 | 1976-12-09 | Method for making diarylhalonium salts |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2373505A1 FR2373505A1 (fr) | 1978-07-07 |
| FR2373505B1 true FR2373505B1 (esLanguage) | 1984-03-30 |
Family
ID=25012329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7737221A Granted FR2373505A1 (fr) | 1976-12-09 | 1977-12-09 | Procede pour preparer des sels de diaryliodonium |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4151175A (esLanguage) |
| JP (1) | JPS53101331A (esLanguage) |
| DE (1) | DE2754853A1 (esLanguage) |
| FR (1) | FR2373505A1 (esLanguage) |
| GB (1) | GB1572620A (esLanguage) |
| IT (1) | IT1089957B (esLanguage) |
| NL (1) | NL189607C (esLanguage) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4196138A (en) * | 1977-05-20 | 1980-04-01 | General Electric Company | Dicarbonyl chelate salts |
| US4238394A (en) * | 1978-10-30 | 1980-12-09 | General Electric Company | Method for making diaryliodonium salts |
| US4329300A (en) * | 1980-06-27 | 1982-05-11 | General Electric Company | Method for making diaryliodonium polyhalometalloid salts |
| US4537725A (en) * | 1982-09-18 | 1985-08-27 | Ciba-Geigy Corporation | Diaryliodosyl salts |
| JPS59163336A (ja) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | アルデヒドの製造法 |
| JPS59163330A (ja) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | ジアリ−ルヨ−ドニウム塩の製造方法 |
| US4623666A (en) | 1984-11-06 | 1986-11-18 | Kennedy Thomas P | Pharmacological applications of diphenylhalonium ion |
| US5362607A (en) * | 1986-06-13 | 1994-11-08 | Microsi, Inc. | Method for making a patterned resist substrate composite |
| US5310619A (en) * | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
| US4845159A (en) * | 1987-10-01 | 1989-07-04 | General Electric Company | Photoactive and thermally active polymeric iodonium salts, use, and method for making |
| US4840977A (en) * | 1987-10-01 | 1989-06-20 | General Electric Company | Polymeric iodonium salts, method for making, and heat curable compositions |
| DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
| EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| US5488147A (en) * | 1994-07-21 | 1996-01-30 | Minnesota Mining And Manufacturing Company | Diaryliodonium fluoroalkyl sulfonate salts and a method of making |
| JPH0954437A (ja) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | 化学増幅型ポジレジスト組成物 |
| JP4417627B2 (ja) | 2001-03-30 | 2010-02-17 | ジ・アリゾナ・ボード・オブ・リージェンツ・オン・ビハーフ・オブ・ザ・ユニバーシティー・オブ・アリゾナ | 酸および／またはラジカル種を光化学生成するための物質、方法、および使用 |
| US7192681B2 (en) | 2001-07-05 | 2007-03-20 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| KR101129515B1 (ko) | 2004-02-20 | 2012-03-30 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 및 그것을 사용한 패턴형성방법 |
| US7504193B2 (en) | 2004-09-02 | 2009-03-17 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| CN100577671C (zh) * | 2007-09-05 | 2010-01-06 | 武汉工程大学 | 4,4’-双十二烷基苯碘鎓六氟锑酸盐的合成方法 |
| US8975203B2 (en) | 2009-05-08 | 2015-03-10 | Nippon Shokubai Co., Ltd. | Diaryliodonium salt mixture and process for production thereof, and process for production of diaryliodonium compound |
| US8343608B2 (en) | 2010-08-31 | 2013-01-01 | General Electric Company | Use of appended dyes in optical data storage media |
| US8993219B2 (en) | 2011-06-21 | 2015-03-31 | Basf Se | Printing diffraction gratings on paper and board |
| CN104395091A (zh) | 2012-06-14 | 2015-03-04 | 巴斯夫欧洲公司 | 生产安全元件和全息图的方法 |
| AU2013314269B2 (en) | 2012-09-17 | 2017-07-06 | Basf Se | Security elements and method for their manufacture |
| BR112015028902A2 (pt) | 2013-05-21 | 2017-07-25 | Basf Se | elemento de segurança, método para formar um elemento de segurança, produto de segurança, e, uso de um elemento de segurança |
| US10494766B2 (en) | 2013-10-04 | 2019-12-03 | Basf Se | High gloss metal effect papers |
| CN107429491A (zh) | 2015-03-30 | 2017-12-01 | 巴斯夫欧洲公司 | 高光泽金属效应纸和板 |
| JP6942058B2 (ja) | 2015-04-29 | 2021-09-29 | ビーエスエヌ メディカル ゲーエムベーハー | Ｎｏ生成のための多段階プロセス |
| MX375374B (es) | 2015-04-29 | 2025-03-06 | Bsn Medical Gmbh | Dispositivo de baño médico. |
| AU2019260116A1 (en) | 2018-04-25 | 2020-10-01 | Basf Se | Process for the production of strongly adherent (embossed) films on flexible substrates |
| KR102885452B1 (ko) | 2018-09-24 | 2025-11-14 | 바스프 에스이 | 3d 인쇄에 사용하기 위한 uv 경화성 조성물 |
| CN112638968A (zh) | 2018-09-24 | 2021-04-09 | 巴斯夫欧洲公司 | 用于3d打印的可光固化组合物 |
| EP3870381A1 (en) | 2018-10-25 | 2021-09-01 | Basf Se | Compositions, comprising silver nanoplatelets |
| EP3680274A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing |
| EP3680263A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Limonene-based (meth)acrylates for use in 3d printing |
| US11945254B2 (en) | 2019-01-21 | 2024-04-02 | Basf Se | Security element |
| US12296391B2 (en) | 2019-01-29 | 2025-05-13 | Basf Se | Security element |
| US12515253B2 (en) | 2019-05-06 | 2026-01-06 | Basf Se | Compositions, comprising silver nanoplatelets |
| EP4055071A1 (en) | 2019-11-07 | 2022-09-14 | Basf Se | Water-washable compositions for use in 3d printing |
| CN115279518A (zh) | 2020-04-23 | 2022-11-01 | 巴斯夫欧洲公司 | 包含片状过渡金属颗粒的组合物 |
| FR3125055B1 (fr) | 2021-07-12 | 2025-03-14 | Bostik Sa | Composition à base de monomères ( méth )acrylate |
| FR3125056B1 (fr) | 2021-07-12 | 2025-01-17 | Bostik Sa | Composition à base de monomères (méth)acrylate |
| WO2023170132A1 (en) | 2022-03-10 | 2023-09-14 | Basf Se | Casting lacquer for screen printing |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3981897A (en) * | 1975-05-02 | 1976-09-21 | General Electric Company | Method for making certain halonium salt photoinitiators |
-
1976
- 1976-12-09 US US05/749,116 patent/US4151175A/en not_active Expired - Lifetime
-
1977
- 1977-12-07 GB GB51044/77A patent/GB1572620A/en not_active Expired
- 1977-12-07 JP JP14769177A patent/JPS53101331A/ja active Granted
- 1977-12-09 FR FR7737221A patent/FR2373505A1/fr active Granted
- 1977-12-09 IT IT30568/77A patent/IT1089957B/it active
- 1977-12-09 NL NLAANVRAGE7713695,A patent/NL189607C/xx not_active IP Right Cessation
- 1977-12-09 DE DE19772754853 patent/DE2754853A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| US4151175A (en) | 1979-04-24 |
| DE2754853C2 (esLanguage) | 1988-03-17 |
| GB1572620A (en) | 1980-07-30 |
| FR2373505A1 (fr) | 1978-07-07 |
| NL7713695A (nl) | 1978-06-13 |
| IT1089957B (it) | 1985-06-18 |
| NL189607B (nl) | 1993-01-04 |
| JPS6236015B2 (esLanguage) | 1987-08-05 |
| NL189607C (nl) | 1993-06-01 |
| DE2754853A1 (de) | 1978-06-22 |
| JPS53101331A (en) | 1978-09-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |