FR2365409B1 - - Google Patents
Info
- Publication number
- FR2365409B1 FR2365409B1 FR7728353A FR7728353A FR2365409B1 FR 2365409 B1 FR2365409 B1 FR 2365409B1 FR 7728353 A FR7728353 A FR 7728353A FR 7728353 A FR7728353 A FR 7728353A FR 2365409 B1 FR2365409 B1 FR 2365409B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/0018—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor for plane optical surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/06—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor grinding of lenses, the tool or work being controlled by information-carrying means, e.g. patterns, punched tapes, magnetic tapes
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/182—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by the machine tool function, e.g. thread cutting, cam making, tool direction control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/41—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by interpolation, e.g. the computation of intermediate points between programmed end points to define the path to be followed and the rate of travel along that path
- G05B19/4103—Digital interpolation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34132—Choosing largest, major coordinate axis
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34146—Helical, spiral interpolation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34167—Coarse fine, macro microinterpolation, preprocessor
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34384—Execute next block after predetermined time
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34385—Execute next block if largest axis distance is reached
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/43—Speed, acceleration, deceleration control ADC
- G05B2219/43187—Vector speed, ratio between axis, without feedback
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45157—Grind optical lens
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45199—Polish
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49256—Epicyclic movement of tool
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49362—Tool, probe at constant height to surface during machining
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49381—Raster, line servo, area machining, cutting, facing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/725,382 US4128968A (en) | 1976-09-22 | 1976-09-22 | Optical surface polisher |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2365409A1 FR2365409A1 (fr) | 1978-04-21 |
FR2365409B1 true FR2365409B1 (fr) | 1983-03-18 |
Family
ID=24914324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7728353A Granted FR2365409A1 (fr) | 1976-09-22 | 1977-09-20 | Appareil perfectionne pour polir ou rectifier des surfaces optiques |
Country Status (5)
Country | Link |
---|---|
US (1) | US4128968A (fr) |
JP (1) | JPS5339593A (fr) |
DE (1) | DE2742307A1 (fr) |
FR (1) | FR2365409A1 (fr) |
GB (1) | GB1560434A (fr) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4512107A (en) * | 1982-11-16 | 1985-04-23 | The Perkin-Elmer Corporation | Automated polisher for cylindrical surfaces |
US5013512A (en) * | 1985-02-19 | 1991-05-07 | Malmstroem Sven E | Method of manufacturing an elongated structural member |
US4768308A (en) * | 1986-12-17 | 1988-09-06 | University Of Rochester | Universal lens polishing tool, polishing apparatus and method of polishing |
DE3801969A1 (de) * | 1988-01-23 | 1989-07-27 | Zeiss Carl Fa | Verfahren und vorrichtung zum laeppen bzw. polieren optischer flaechen |
FR2629746B1 (fr) * | 1988-04-06 | 1991-01-25 | Bertin & Cie | Procede et dispositif de polissage d'un composant optique |
FR2681546B1 (fr) * | 1991-09-20 | 1995-12-08 | Essilor Int | Procede et machine d'usinage a commande numerique multi-axe. |
JP2635485B2 (ja) * | 1992-07-31 | 1997-07-30 | 矢崎総業株式会社 | 電線の方向転換装置 |
US5408407A (en) * | 1993-03-15 | 1995-04-18 | Pentek, Inc. | System and method for positioning a work point |
JP2513426B2 (ja) * | 1993-09-20 | 1996-07-03 | 日本電気株式会社 | ウェ―ハ研磨装置 |
US5938504A (en) | 1993-11-16 | 1999-08-17 | Applied Materials, Inc. | Substrate polishing apparatus |
US5575707A (en) * | 1994-10-11 | 1996-11-19 | Ontrak Systems, Inc. | Polishing pad cluster for polishing a semiconductor wafer |
GB9512262D0 (en) | 1995-06-16 | 1995-08-16 | Bingham Richard G | Tool for computer-controlled machine for optical polishing and figuring |
GB2317131B (en) * | 1995-06-16 | 1999-12-22 | Optical Generics Ltd | Method and apparatus for optical polishing |
JP3850924B2 (ja) * | 1996-02-15 | 2006-11-29 | 財団法人国際科学振興財団 | 化学機械研磨装置及び化学機械研磨方法 |
US6022807A (en) * | 1996-04-24 | 2000-02-08 | Micro Processing Technology, Inc. | Method for fabricating an integrated circuit |
KR100264228B1 (ko) * | 1996-05-10 | 2000-12-01 | 미다라이 후지오 | 화학 기계 연마 장치 및 방법 |
JPH10329012A (ja) | 1997-03-21 | 1998-12-15 | Canon Inc | 研磨装置および研磨方法 |
EP1024925A1 (fr) * | 1997-10-24 | 2000-08-09 | Precitech Inc. | Appareil de polissage servant a former des surfaces aspheriques |
DE19756960B4 (de) * | 1997-12-20 | 2011-06-09 | Asphericon Gmbh | Verfahren zum Bearbeiten von rotationssymmetrischen Funktionsflächen |
US6290578B1 (en) * | 1999-10-13 | 2001-09-18 | Speedfam-Ipec Corporation | Method for chemical mechanical polishing using synergistic geometric patterns |
US6602121B1 (en) * | 1999-10-28 | 2003-08-05 | Strasbaugh | Pad support apparatus for chemical mechanical planarization |
US6705930B2 (en) | 2000-01-28 | 2004-03-16 | Lam Research Corporation | System and method for polishing and planarizing semiconductor wafers using reduced surface area polishing pads and variable partial pad-wafer overlapping techniques |
US6340326B1 (en) | 2000-01-28 | 2002-01-22 | Lam Research Corporation | System and method for controlled polishing and planarization of semiconductor wafers |
EP1251997B2 (fr) * | 2000-02-03 | 2011-06-08 | Carl Zeiss Vision GmbH | Tete de polissage pour une polisseuse |
US7481695B2 (en) | 2000-08-22 | 2009-01-27 | Lam Research Corporation | Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head |
US6652357B1 (en) | 2000-09-22 | 2003-11-25 | Lam Research Corporation | Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
US6640155B2 (en) | 2000-08-22 | 2003-10-28 | Lam Research Corporation | Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head |
US6585572B1 (en) | 2000-08-22 | 2003-07-01 | Lam Research Corporation | Subaperture chemical mechanical polishing system |
US6471566B1 (en) | 2000-09-18 | 2002-10-29 | Lam Research Corporation | Sacrificial retaining ring CMP system and methods for implementing the same |
US6443815B1 (en) | 2000-09-22 | 2002-09-03 | Lam Research Corporation | Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing |
US6561881B2 (en) * | 2001-03-15 | 2003-05-13 | Oriol Inc. | System and method for chemical mechanical polishing using multiple small polishing pads |
US6602110B2 (en) | 2001-06-28 | 2003-08-05 | 3M Innovative Properties Company | Automated polishing apparatus and method of polishing |
US6586336B2 (en) | 2001-08-31 | 2003-07-01 | Oriol, Inc. | Chemical-mechanical-polishing station |
US20030045208A1 (en) * | 2001-09-06 | 2003-03-06 | Neidrich Jason M. | System and method for chemical mechanical polishing using retractable polishing pads |
US6905398B2 (en) * | 2001-09-10 | 2005-06-14 | Oriol, Inc. | Chemical mechanical polishing tool, apparatus and method |
GB0127505D0 (en) * | 2001-11-16 | 2002-01-09 | Neill Michael O | Machining spectacle lenses |
GB0508695D0 (en) * | 2005-04-29 | 2005-06-08 | Univ Cranfield | Apparatus and method |
JP4939840B2 (ja) * | 2006-05-31 | 2012-05-30 | オリンパス株式会社 | ガスクラスターイオンビームによる超精密研磨方法 |
JP5402391B2 (ja) | 2009-01-27 | 2014-01-29 | 信越化学工業株式会社 | 半導体用合成石英ガラス基板の加工方法 |
EP2628061B1 (fr) | 2010-10-13 | 2020-03-04 | MBDA UK Limited | Procédé de positionnement d'une pièce de travail et appareil |
EP2503420A1 (fr) * | 2011-03-23 | 2012-09-26 | Mbda Uk Limited | Procédé de positionnement d'une pièce de travail et appareil |
TWI532565B (zh) * | 2011-03-21 | 2016-05-11 | 智勝科技股份有限公司 | 研磨方法以及研磨系統 |
JP5797145B2 (ja) * | 2012-03-29 | 2015-10-21 | 三菱重工業株式会社 | 研磨装置及びその方法 |
CN102873628B (zh) * | 2012-09-26 | 2015-02-18 | 清华大学 | 一种用于数控小工具抛光的螺旋线式加工路径的生成方法 |
US9718164B2 (en) * | 2012-12-06 | 2017-08-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing system and polishing method |
US9162339B2 (en) * | 2013-09-24 | 2015-10-20 | Stmicroelectronics, Inc. | Adaptive uniform polishing system |
KR102211533B1 (ko) * | 2013-10-23 | 2021-02-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 국소 영역 레이트 제어를 구비하는 폴리싱 시스템 |
RU2609610C1 (ru) * | 2015-08-03 | 2017-02-02 | Акционерное общество "Научно-производственное объединение "Оптика" (АО "НПО "Оптика") | Способ формообразования асферических поверхностей крупногабаритных оптических деталей и устройство для его реализации |
JP6831835B2 (ja) * | 2015-08-14 | 2021-02-17 | エム キューブド テクノロジーズ, インコーポレイテッド | 被加工物を仕上げるための、高度に制御可能な処理ツールを有する機械 |
US20180161955A1 (en) * | 2016-12-12 | 2018-06-14 | Benjamin Grossman | Random Walk Polishing Machine |
DE102017216033A1 (de) * | 2017-09-12 | 2019-03-14 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements |
DE102018101293A1 (de) * | 2018-01-22 | 2019-07-25 | Rud. Starcke Gmbh & Co. Kg | Verfahren zum Schleifen und/oder Polieren einer Fehlstelle sowie Vorrichtung zur Durchführung des Verfahrens |
WO2020006053A1 (fr) * | 2018-06-26 | 2020-01-02 | Dimitri Protopsaltis | Dispositif de traitement de tissu |
US20220250202A1 (en) * | 2021-02-08 | 2022-08-11 | Benjamin Grossman | Random Walk Polishing Machine |
CN115415886B (zh) * | 2022-08-30 | 2023-09-26 | 天津大学 | 一种内壁光学表面抛光路径计算方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1281001A (en) * | 1916-04-20 | 1918-10-08 | Charles R Hazel | Grinding and polishing machine. |
US2909871A (en) * | 1955-09-08 | 1959-10-27 | Saint Gobain | Apparatus for polishing glass and the like |
US2799975A (en) * | 1955-09-26 | 1957-07-23 | Northrop Aircraft Inc | Surface generator |
US3254454A (en) * | 1964-02-24 | 1966-06-07 | Dolivio L Cetrangolo | Automatic surface treating machine |
US3587195A (en) * | 1968-04-08 | 1971-06-28 | Itek Corp | Optical surface generating method |
US3589078A (en) * | 1968-07-26 | 1971-06-29 | Itek Corp | Surface generating apparatus |
US3564776A (en) * | 1969-04-16 | 1971-02-23 | Itek Corp | Optical surface generating method and apparatus |
US3769762A (en) * | 1972-03-07 | 1973-11-06 | Altair Scient Inc | Method for controlled lapping of optical surfaces to correct deviations from desired contours |
US3874123A (en) * | 1973-10-11 | 1975-04-01 | Mwa Company | Metal conditioning planetary grinder |
-
1976
- 1976-09-22 US US05/725,382 patent/US4128968A/en not_active Expired - Lifetime
-
1977
- 1977-09-20 DE DE19772742307 patent/DE2742307A1/de not_active Ceased
- 1977-09-20 FR FR7728353A patent/FR2365409A1/fr active Granted
- 1977-09-21 JP JP11387177A patent/JPS5339593A/ja active Granted
- 1977-09-21 GB GB39357/77A patent/GB1560434A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US4128968A (en) | 1978-12-12 |
DE2742307A1 (de) | 1978-03-23 |
JPS6327148B2 (fr) | 1988-06-01 |
JPS5339593A (en) | 1978-04-11 |
FR2365409A1 (fr) | 1978-04-21 |
GB1560434A (en) | 1980-02-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |