FR2362419B3 - - Google Patents

Info

Publication number
FR2362419B3
FR2362419B3 FR7725193A FR7725193A FR2362419B3 FR 2362419 B3 FR2362419 B3 FR 2362419B3 FR 7725193 A FR7725193 A FR 7725193A FR 7725193 A FR7725193 A FR 7725193A FR 2362419 B3 FR2362419 B3 FR 2362419B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7725193A
Other versions
FR2362419A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of FR2362419A1 publication Critical patent/FR2362419A1/fr
Application granted granted Critical
Publication of FR2362419B3 publication Critical patent/FR2362419B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/55—Details of cameras or camera bodies; Accessories therefor with provision for heating or cooling, e.g. in aircraft
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
FR7725193A 1976-08-17 1977-08-17 Installation pour compenser l'effet de la chaleur dans des installations d'ajustage et d'eclairage Granted FR2362419A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (de) 1976-08-17 1976-08-17 Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen

Publications (2)

Publication Number Publication Date
FR2362419A1 FR2362419A1 (fr) 1978-03-17
FR2362419B3 true FR2362419B3 (fr) 1980-07-11

Family

ID=5505450

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7725193A Granted FR2362419A1 (fr) 1976-08-17 1977-08-17 Installation pour compenser l'effet de la chaleur dans des installations d'ajustage et d'eclairage

Country Status (6)

Country Link
CS (1) CS206603B1 (fr)
DD (1) DD127137B1 (fr)
DE (1) DE2735043A1 (fr)
FR (1) FR2362419A1 (fr)
GB (1) GB1534450A (fr)
SU (1) SU664245A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
DE2922642C2 (de) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von Platten für den Aufbau von Trenndüsenelementen
DD150263A1 (de) * 1980-05-02 1981-08-19 Schneider Hans Joachim Temperiervorrichtung,insbesondere fuer lithografische geraete
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
DD160756A3 (de) * 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
DE3306999A1 (de) * 1982-03-31 1983-10-06 Censor Patent Versuch Einrichtung zum festhalten eines werkstueckes
US4864356A (en) * 1987-04-21 1989-09-05 Brother Kogyo Kabushiki Kaisha Exposure device for image recording apparatus
KR910002215A (ko) * 1988-06-27 1991-01-31 하라 레이노스께 영상 형성 장치 및 방법
DE68921687T2 (de) * 1988-09-02 1995-08-03 Canon Kk Belichtungseinrichtung.
JPH0276212A (ja) * 1988-09-13 1990-03-15 Canon Inc 多重露光方法
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
IT1235478B (it) * 1989-09-26 1992-08-19 Achille Fiorentini Dorso con elementi riscaldanti per pellicola a sviluppo immediato.
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
DE29704681U1 (de) * 1997-03-14 1998-07-16 Wuendsch Dieter Kühlvorrichtung für Filmprojektoren
KR20120003511A (ko) 2004-02-04 2012-01-10 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법

Also Published As

Publication number Publication date
GB1534450A (en) 1978-12-06
CS206603B1 (en) 1981-06-30
FR2362419A1 (fr) 1978-03-17
DD127137B1 (de) 1979-11-28
DD127137A1 (de) 1977-09-07
SU664245A1 (ru) 1979-05-25
DE2735043A1 (de) 1978-02-23

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Legal Events

Date Code Title Description
ST Notification of lapse