FR2354632B1 - - Google Patents
Info
- Publication number
- FR2354632B1 FR2354632B1 FR7717867A FR7717867A FR2354632B1 FR 2354632 B1 FR2354632 B1 FR 2354632B1 FR 7717867 A FR7717867 A FR 7717867A FR 7717867 A FR7717867 A FR 7717867A FR 2354632 B1 FR2354632 B1 FR 2354632B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6910376A JPS52151568A (en) | 1976-06-11 | 1976-06-11 | Electron beam exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2354632A1 FR2354632A1 (fr) | 1978-01-06 |
| FR2354632B1 true FR2354632B1 (US08197722-20120612-C00042.png) | 1981-07-31 |
Family
ID=13392941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7717867A Granted FR2354632A1 (fr) | 1976-06-11 | 1977-06-10 | Systeme d'exposition a un faisceau d'electrons |
Country Status (5)
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4182958A (en) * | 1977-05-31 | 1980-01-08 | Rikagaku Kenkyusho | Method and apparatus for projecting a beam of electrically charged particles |
| JPS5412675A (en) * | 1977-06-30 | 1979-01-30 | Jeol Ltd | Electon beam exposure method |
| US4167676A (en) * | 1978-02-21 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
| JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
| US4246640A (en) * | 1979-02-26 | 1981-01-20 | The Perkin-Elmer Corporation | Automatic recorder abscissa scaling |
| JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
| US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
| EP0053225B1 (en) * | 1980-11-28 | 1985-03-13 | International Business Machines Corporation | Electron beam system and method |
| US4494004A (en) * | 1980-11-28 | 1985-01-15 | International Business Machines Corporation | Electron beam system |
| WO1982002623A1 (en) * | 1981-01-23 | 1982-08-05 | Veeco Instr Inc | Parallel charged particle beam exposure system |
| DE3138896A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen |
| US4469950A (en) * | 1982-03-04 | 1984-09-04 | Varian Associates, Inc. | Charged particle beam exposure system utilizing variable line scan |
| JPS5958586A (ja) * | 1982-09-28 | 1984-04-04 | Toshiba Mach Co Ltd | マスクの検査方法および装置 |
| JPH0732110B2 (ja) * | 1984-05-18 | 1995-04-10 | 株式会社日立製作所 | 電子線露光装置 |
| JP2619565B2 (ja) * | 1990-11-05 | 1997-06-11 | 株式会社日立製作所 | 電子ビーム描画装置 |
| US5194741A (en) * | 1991-03-20 | 1993-03-16 | Fujitsu Limited | Method for writing a pattern on an object by a focused electron beam with an improved efficiency |
| DE19638109A1 (de) * | 1995-09-25 | 1997-03-27 | Jeol Ltd | Elektronenstrahl-Lithographie-System |
| US6110318A (en) * | 1997-11-26 | 2000-08-29 | Science Research Laboratory | System for selective electron beam irradiation |
| EP1865538A4 (en) * | 2005-03-29 | 2012-03-07 | Advantest Corp | MULTI-COLUMN ELECTRON BEAM EXPOSURE DEVICE |
| JP5243912B2 (ja) * | 2008-01-24 | 2013-07-24 | 日本電子株式会社 | 荷電粒子ビーム装置におけるビーム位置較正方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1100835B (de) * | 1952-03-01 | 1961-03-02 | Zeiss Carl Fa | Einrichtung zum Fraesen von Profilen, zum Schneiden von Schablonen oder zum Bohren von Duesenkanaelen mittels eines Ladungstraegerstrahles |
| FR919297A (US08197722-20120612-C00042.png) * | 1959-09-04 | 1947-04-01 | ||
| NL6807439A (US08197722-20120612-C00042.png) * | 1968-05-27 | 1969-12-01 | ||
| DE1765852C3 (de) * | 1968-07-26 | 1979-03-01 | Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln | Vorrichtung zur Bearbeitung von Werkstoffen mit magnetisch fokussierten Ladungsträgerstrahlen |
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3922546A (en) * | 1972-04-14 | 1975-11-25 | Radiant Energy Systems | Electron beam pattern generator |
| US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
| US4017403A (en) * | 1974-07-31 | 1977-04-12 | United Kingdom Atomic Energy Authority | Ion beam separators |
| JPS5148313A (ja) * | 1974-10-23 | 1976-04-26 | Hitachi Ltd | Fudogatajikihetsudoroodeingukiko |
| JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
| JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
| US4393312A (en) * | 1976-02-05 | 1983-07-12 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
-
1976
- 1976-06-11 JP JP6910376A patent/JPS52151568A/ja active Granted
-
1977
- 1977-05-18 GB GB20952/77A patent/GB1546533A/en not_active Expired
- 1977-05-31 US US05/801,812 patent/US4117340A/en not_active Expired - Lifetime
- 1977-06-08 DE DE2725959A patent/DE2725959C3/de not_active Expired
- 1977-06-10 FR FR7717867A patent/FR2354632A1/fr active Granted
-
1982
- 1982-07-06 US US06/395,853 patent/USRE31630E/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52151568A (en) | 1977-12-16 |
| JPS5337711B2 (US08197722-20120612-C00042.png) | 1978-10-11 |
| DE2725959A1 (de) | 1977-12-15 |
| GB1546533A (en) | 1979-05-23 |
| US4117340A (en) | 1978-09-26 |
| FR2354632A1 (fr) | 1978-01-06 |
| USRE31630E (en) | 1984-07-17 |
| DE2725959C3 (de) | 1982-02-18 |
| DE2725959B2 (de) | 1981-06-04 |
