FR2351500B1 - - Google Patents
Info
- Publication number
- FR2351500B1 FR2351500B1 FR7712473A FR7712473A FR2351500B1 FR 2351500 B1 FR2351500 B1 FR 2351500B1 FR 7712473 A FR7712473 A FR 7712473A FR 7712473 A FR7712473 A FR 7712473A FR 2351500 B1 FR2351500 B1 FR 2351500B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/28537—Deposition of Schottky electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/2633—Bombardment with radiation with high-energy radiation for etching, e.g. sputteretching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/28518—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System the conductive layers comprising silicides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/318—Inorganic layers composed of nitrides
- H01L21/3185—Inorganic layers composed of nitrides of siliconnitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/906—Cleaning of wafer as interim step
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/684,207 US4056642A (en) | 1976-05-14 | 1976-05-14 | Method of fabricating metal-semiconductor interfaces |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2351500A1 FR2351500A1 (fr) | 1977-12-09 |
FR2351500B1 true FR2351500B1 (fr) | 1984-01-06 |
Family
ID=24747103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7712473A Granted FR2351500A1 (fr) | 1976-05-14 | 1977-04-18 | Procede perfectionne pour la fabrication d'interfaces metal-semi-conducteur |
Country Status (7)
Country | Link |
---|---|
US (1) | US4056642A (fr) |
JP (1) | JPS52139366A (fr) |
CA (1) | CA1061915A (fr) |
DE (1) | DE2720893C3 (fr) |
FR (1) | FR2351500A1 (fr) |
GB (1) | GB1530237A (fr) |
NL (1) | NL7705316A (fr) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4307131A (en) * | 1976-01-30 | 1981-12-22 | Thomson-Csf | Method of manufacturing metal-semiconductor contacts exhibiting high injected current density |
US4110488A (en) * | 1976-04-09 | 1978-08-29 | Rca Corporation | Method for making schottky barrier diodes |
EP0072603B1 (fr) * | 1978-06-14 | 1986-10-01 | Fujitsu Limited | Procédé de fabrication d'un dispositif semiconducteur muni d'une couche isolante de dioxyde de silicium couverte d'une couche d'oxynitrure de silicium |
EP0154670B1 (fr) * | 1978-06-14 | 1991-05-08 | Fujitsu Limited | Procédé pour la fabrication d'un dispositif semi-conducteur comportant une couche isolante |
US4201999A (en) * | 1978-09-22 | 1980-05-06 | International Business Machines Corporation | Low barrier Schottky diodes |
US4234622A (en) * | 1979-04-11 | 1980-11-18 | The United States Of American As Represented By The Secretary Of The Army | Vacuum deposition method |
US4277320A (en) * | 1979-10-01 | 1981-07-07 | Rockwell International Corporation | Process for direct thermal nitridation of silicon semiconductor devices |
US4247579A (en) * | 1979-11-30 | 1981-01-27 | General Electric Company | Method for metallizing a semiconductor element |
US4292093A (en) * | 1979-12-28 | 1981-09-29 | The United States Of America As Represented By The United States Department Of Energy | Method using laser irradiation for the production of atomically clean crystalline silicon and germanium surfaces |
USRE32613E (en) * | 1980-04-17 | 1988-02-23 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device |
US4343082A (en) * | 1980-04-17 | 1982-08-10 | Bell Telephone Laboratories, Incorporated | Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device |
US4758528A (en) * | 1980-07-08 | 1988-07-19 | International Business Machines Corporation | Self-aligned metal process for integrated circuit metallization |
US4608589A (en) * | 1980-07-08 | 1986-08-26 | International Business Machines Corporation | Self-aligned metal structure for integrated circuits |
US4315782A (en) * | 1980-07-21 | 1982-02-16 | Rca Corporation | Method of making semiconductor device with passivated rectifying junctions having hydrogenated amorphous regions |
US4328080A (en) * | 1980-10-24 | 1982-05-04 | General Electric Company | Method of making a catalytic electrode |
US4397079A (en) * | 1981-03-30 | 1983-08-09 | International Business Machines Corp. | Process for improving the yield of integrated devices including Schottky barrier diodes |
IT1171402B (it) * | 1981-07-20 | 1987-06-10 | Selenia Ind Eletroniche Associ | Transistor ad effeto di campo a barriera metallo-semiconduttorre conzona svuotata modificata |
US4395322A (en) * | 1981-11-18 | 1983-07-26 | General Electric Company | Catalytic electrode |
US4582564A (en) * | 1982-01-04 | 1986-04-15 | At&T Technologies, Inc. | Method of providing an adherent metal coating on an epoxy surface |
US4444848A (en) * | 1982-01-04 | 1984-04-24 | Western Electric Co., Inc. | Adherent metal coatings on rubber-modified epoxy resin surfaces |
US4402998A (en) * | 1982-01-04 | 1983-09-06 | Western Electric Co., Inc. | Method for providing an adherent electroless metal coating on an epoxy surface |
JPS59179152A (ja) * | 1983-03-31 | 1984-10-11 | Agency Of Ind Science & Technol | アモルファスシリコン半導体薄膜の製造方法 |
US4545116A (en) * | 1983-05-06 | 1985-10-08 | Texas Instruments Incorporated | Method of forming a titanium disilicide |
US4585517A (en) * | 1985-01-31 | 1986-04-29 | Motorola, Inc. | Reactive sputter cleaning of semiconductor wafer |
US4692991A (en) * | 1985-07-19 | 1987-09-15 | Signetics Corporation | Method of controlling forward voltage across Schottky diode |
US4842376A (en) * | 1985-07-25 | 1989-06-27 | Hughes Aircraft Company | Double-schottky diode liquid crystal light valve |
US4881110A (en) * | 1985-07-25 | 1989-11-14 | Hughes Aircraft Company | Double-Schottky diode liquid crystal light valve |
IT1185964B (it) * | 1985-10-01 | 1987-11-18 | Sgs Microelettronica Spa | Procedimento e relativa apparecchiatura per realizzare contatti metallo-semiconduttore di tipo ohmico |
US4687537A (en) * | 1986-04-15 | 1987-08-18 | Rca Corporation | Epitaxial metal silicide layers |
US4963523A (en) * | 1987-11-06 | 1990-10-16 | The United States Of America As Represented By The Secretary Of The Commerce | High-Tc superconducting unit having low contact surface resistivity and method of making. |
US5149686A (en) * | 1987-11-06 | 1992-09-22 | The United States Of America As Represented By The Secretary Of Commerce | High Tc superconducting unit having low contact surface resistivity |
US4894701A (en) * | 1988-05-09 | 1990-01-16 | General Electric Company | Semiconductor device detector and method of forming same |
US4981811A (en) * | 1990-04-12 | 1991-01-01 | At&T Bell Laboratories | Process for fabricating low defect polysilicon |
JPH0719777B2 (ja) * | 1990-08-10 | 1995-03-06 | 株式会社半導体プロセス研究所 | 半導体装置の製造方法 |
JP3568385B2 (ja) * | 1998-03-16 | 2004-09-22 | 沖電気工業株式会社 | 半導体装置の製造方法 |
US6613695B2 (en) * | 2000-11-24 | 2003-09-02 | Asm America, Inc. | Surface preparation prior to deposition |
US6960537B2 (en) | 2001-10-02 | 2005-11-01 | Asm America, Inc. | Incorporation of nitrogen into high k dielectric film |
US6833556B2 (en) * | 2002-08-12 | 2004-12-21 | Acorn Technologies, Inc. | Insulated gate field effect transistor having passivated schottky barriers to the channel |
US7176483B2 (en) * | 2002-08-12 | 2007-02-13 | Acorn Technologies, Inc. | Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions |
US7902029B2 (en) * | 2002-08-12 | 2011-03-08 | Acorn Technologies, Inc. | Process for fabricating a self-aligned deposited source/drain insulated gate field-effect transistor |
US7084423B2 (en) | 2002-08-12 | 2006-08-01 | Acorn Technologies, Inc. | Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions |
US7974119B2 (en) | 2008-07-10 | 2011-07-05 | Seagate Technology Llc | Transmission gate-based spin-transfer torque memory unit |
US9030867B2 (en) | 2008-10-20 | 2015-05-12 | Seagate Technology Llc | Bipolar CMOS select device for resistive sense memory |
US7825478B2 (en) | 2008-11-07 | 2010-11-02 | Seagate Technology Llc | Polarity dependent switch for resistive sense memory |
US8178864B2 (en) | 2008-11-18 | 2012-05-15 | Seagate Technology Llc | Asymmetric barrier diode |
US8203869B2 (en) | 2008-12-02 | 2012-06-19 | Seagate Technology Llc | Bit line charge accumulation sensing for resistive changing memory |
US8557702B2 (en) | 2009-02-02 | 2013-10-15 | Asm America, Inc. | Plasma-enhanced atomic layers deposition of conductive material over dielectric layers |
US8159856B2 (en) | 2009-07-07 | 2012-04-17 | Seagate Technology Llc | Bipolar select device for resistive sense memory |
US8158964B2 (en) | 2009-07-13 | 2012-04-17 | Seagate Technology Llc | Schottky diode switch and memory units containing the same |
US7911833B2 (en) * | 2009-07-13 | 2011-03-22 | Seagate Technology Llc | Anti-parallel diode structure and method of fabrication |
US8648426B2 (en) | 2010-12-17 | 2014-02-11 | Seagate Technology Llc | Tunneling transistors |
US9620611B1 (en) | 2016-06-17 | 2017-04-11 | Acorn Technology, Inc. | MIS contact structure with metal oxide conductor |
US10170627B2 (en) | 2016-11-18 | 2019-01-01 | Acorn Technologies, Inc. | Nanowire transistor with source and drain induced by electrical contacts with negative schottky barrier height |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2144851B1 (fr) * | 1971-07-07 | 1978-04-28 | Mitsubishi Electric Corp | |
JPS5547952B2 (fr) * | 1971-12-29 | 1980-12-03 | ||
US3855612A (en) * | 1972-01-03 | 1974-12-17 | Signetics Corp | Schottky barrier diode semiconductor structure and method |
US3795557A (en) * | 1972-05-12 | 1974-03-05 | Lfe Corp | Process and material for manufacturing semiconductor devices |
US3983264A (en) * | 1972-07-20 | 1976-09-28 | Texas Instruments Incorporated | Metal-semiconductor ohmic contacts and methods of fabrication |
US3956527A (en) * | 1973-04-16 | 1976-05-11 | Ibm Corporation | Dielectrically isolated Schottky Barrier structure and method of forming the same |
JPS50153577A (fr) * | 1974-05-29 | 1975-12-10 | ||
US3879597A (en) * | 1974-08-16 | 1975-04-22 | Int Plasma Corp | Plasma etching device and process |
-
1976
- 1976-05-14 US US05/684,207 patent/US4056642A/en not_active Expired - Lifetime
-
1977
- 1977-02-14 GB GB6112/77A patent/GB1530237A/en not_active Expired
- 1977-03-11 CA CA273,809A patent/CA1061915A/fr not_active Expired
- 1977-03-22 JP JP3147177A patent/JPS52139366A/ja active Pending
- 1977-04-18 FR FR7712473A patent/FR2351500A1/fr active Granted
- 1977-05-10 DE DE2720893A patent/DE2720893C3/de not_active Expired
- 1977-05-13 NL NL7705316A patent/NL7705316A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US4056642A (en) | 1977-11-01 |
CA1061915A (fr) | 1979-09-04 |
DE2720893B2 (fr) | 1979-07-12 |
FR2351500A1 (fr) | 1977-12-09 |
DE2720893A1 (de) | 1977-11-17 |
DE2720893C3 (de) | 1982-01-14 |
NL7705316A (nl) | 1977-11-16 |
JPS52139366A (en) | 1977-11-21 |
GB1530237A (en) | 1978-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |