FR2349157B1 - - Google Patents

Info

Publication number
FR2349157B1
FR2349157B1 FR7711658A FR7711658A FR2349157B1 FR 2349157 B1 FR2349157 B1 FR 2349157B1 FR 7711658 A FR7711658 A FR 7711658A FR 7711658 A FR7711658 A FR 7711658A FR 2349157 B1 FR2349157 B1 FR 2349157B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7711658A
Other versions
FR2349157A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2349157A1 publication Critical patent/FR2349157A1/fr
Application granted granted Critical
Publication of FR2349157B1 publication Critical patent/FR2349157B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/10—The polymethine chain containing an even number of >CH- groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60—Processes for obtaining vesicular images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
FR7711658A 1976-04-21 1977-04-19 Nouvelle composition photosensible de sensibilite amelioree Granted FR2349157A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/678,805 US4062686A (en) 1976-04-21 1976-04-21 Sensitizers for photocrosslinkable polymers

Publications (2)

Publication Number Publication Date
FR2349157A1 FR2349157A1 (fr) 1977-11-18
FR2349157B1 true FR2349157B1 (fr) 1981-01-02

Family

ID=24724358

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7711658A Granted FR2349157A1 (fr) 1976-04-21 1977-04-19 Nouvelle composition photosensible de sensibilite amelioree

Country Status (8)

Country Link
US (2) US4062686A (fr)
JP (1) JPS52129791A (fr)
AU (1) AU516725B2 (fr)
BE (1) BE853806A (fr)
CA (1) CA1065178A (fr)
DE (1) DE2717778C3 (fr)
FR (1) FR2349157A1 (fr)
GB (1) GB1584741A (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
JPS5664335A (en) * 1979-10-29 1981-06-01 Fuji Photo Film Co Ltd Photosensitive composition
US4454218A (en) * 1982-09-13 1984-06-12 E. I. Du Pont De Nemours And Company N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
US4876175A (en) * 1988-05-09 1989-10-24 Eastman Kodak Company Dye sensitized photographic imaging systems
JP2589558B2 (ja) * 1988-11-11 1997-03-12 富士写真フイルム株式会社 感光性組成物
US5202221A (en) * 1988-11-11 1993-04-13 Fuji Photo Film Co., Ltd. Light-sensitive composition
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
DE3912652A1 (de) * 1989-04-18 1990-10-25 Hoechst Ag Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US5047116A (en) * 1989-05-31 1991-09-10 Union Carbide Coatings Service Technology Corporation Method for producing liquid transfer articles
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
JP2552550B2 (ja) * 1989-07-24 1996-11-13 富士写真フイルム株式会社 感光性組成物
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5230986A (en) * 1991-02-01 1993-07-27 Stereographics Limited Partnership Photosensitive compositions containing benzospiropyrans and uses thereof
DE69329964T2 (de) * 1992-11-19 2001-09-13 Eastman Kodak Co., Rochester Furan-oder pyrrolsubstituierte Farbstoffverbindungen und solche Farbstoffe enthaltende fotografische Silberhalogenid-Elemente
JP3588160B2 (ja) * 1994-05-18 2004-11-10 イーストマン コダック カンパニー 複素環式置換基を有する青色増感色素
US5866296A (en) * 1996-01-25 1999-02-02 Toyo Gosei Co., Ltd. Photosensitive resin composition
US5962189A (en) * 1996-12-19 1999-10-05 Kodak Polychrome Graphics Llc Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element
US5879858A (en) * 1996-12-19 1999-03-09 Kodak Polychrome Graphics, Llc Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element
US5925498A (en) * 1997-06-16 1999-07-20 Kodak Polychrome Graphics Llc Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates
WO2002002533A1 (fr) * 2000-07-05 2002-01-10 Yamanouchi Pharmaceutical Co., Ltd. Derives de propane-1,3-dione
DE10358461B4 (de) * 2003-12-13 2008-09-11 Man Roland Druckmaschinen Ag Gummierungsmedium
CN1964950A (zh) 2004-06-04 2007-05-16 安斯泰来制药有限公司 丙烷－1,3－二酮衍生物或其盐
DE602004011046T2 (de) * 2004-07-30 2009-01-02 Agfa Graphics N.V. Divinylfluorene
US7439537B2 (en) * 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
SI1864976T1 (sl) * 2005-03-31 2012-12-31 Astellas Pharma Inc. Propan-1,3-dionski derivat ali njegova sol

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
BE549814A (fr) * 1955-07-29
US3072485A (en) * 1960-08-24 1963-01-08 Eastman Kodak Co Optically sensitized azido polymers for photomechanical resist compositions
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
BE759079A (nl) * 1969-12-23 1971-05-18 Agfa Gevaert Nv Verknoping onder invloed van licht van lichtgevoelige polymere samenstellingen die azidogroepen bevatten
UST900011I4 (en) 1971-09-13 1972-07-18 Defensive publication
US3782938A (en) * 1971-11-30 1974-01-01 Eastman Kodak Co Photosensitive element comprising polymers with cyclopropenyl groups and process
JPS5148516B2 (fr) * 1973-02-07 1976-12-21
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol

Also Published As

Publication number Publication date
AU516725B2 (en) 1981-06-18
BE853806A (fr) 1977-10-21
CA1065178A (fr) 1979-10-30
FR2349157A1 (fr) 1977-11-18
US4119466A (en) 1978-10-10
AU2440577A (en) 1978-10-26
GB1584741A (en) 1981-02-18
US4062686A (en) 1977-12-13
DE2717778A1 (de) 1977-11-03
JPS52129791A (en) 1977-10-31
DE2717778C3 (de) 1981-03-26
DE2717778B2 (de) 1980-08-07

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Legal Events

Date Code Title Description
ST Notification of lapse