FR2346429A1 - Composition pour la gravure chimique notamment du cuivre et de ses alliages - Google Patents

Composition pour la gravure chimique notamment du cuivre et de ses alliages

Info

Publication number
FR2346429A1
FR2346429A1 FR7538475A FR7538475A FR2346429A1 FR 2346429 A1 FR2346429 A1 FR 2346429A1 FR 7538475 A FR7538475 A FR 7538475A FR 7538475 A FR7538475 A FR 7538475A FR 2346429 A1 FR2346429 A1 FR 2346429A1
Authority
FR
France
Prior art keywords
etchant
cold
printed circuits
nitric acid
ferric chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7538475A
Other languages
English (en)
French (fr)
Other versions
FR2346429B1 (OSRAM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR7538475A priority Critical patent/FR2346429A1/fr
Publication of FR2346429A1 publication Critical patent/FR2346429A1/fr
Application granted granted Critical
Publication of FR2346429B1 publication Critical patent/FR2346429B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
FR7538475A 1975-12-16 1975-12-16 Composition pour la gravure chimique notamment du cuivre et de ses alliages Granted FR2346429A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7538475A FR2346429A1 (fr) 1975-12-16 1975-12-16 Composition pour la gravure chimique notamment du cuivre et de ses alliages

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7538475A FR2346429A1 (fr) 1975-12-16 1975-12-16 Composition pour la gravure chimique notamment du cuivre et de ses alliages

Publications (2)

Publication Number Publication Date
FR2346429A1 true FR2346429A1 (fr) 1977-10-28
FR2346429B1 FR2346429B1 (OSRAM) 1978-08-18

Family

ID=9163791

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7538475A Granted FR2346429A1 (fr) 1975-12-16 1975-12-16 Composition pour la gravure chimique notamment du cuivre et de ses alliages

Country Status (1)

Country Link
FR (1) FR2346429A1 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4220706A (en) * 1978-05-10 1980-09-02 Rca Corporation Etchant solution containing HF-HnO3 -H2 SO4 -H2 O2

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4220706A (en) * 1978-05-10 1980-09-02 Rca Corporation Etchant solution containing HF-HnO3 -H2 SO4 -H2 O2

Also Published As

Publication number Publication date
FR2346429B1 (OSRAM) 1978-08-18

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Legal Events

Date Code Title Description
ST Notification of lapse