FR2342783A1 - Procede et appareil de reaction chimique dans une decharge luminescente - Google Patents

Procede et appareil de reaction chimique dans une decharge luminescente

Info

Publication number
FR2342783A1
FR2342783A1 FR7706112A FR7706112A FR2342783A1 FR 2342783 A1 FR2342783 A1 FR 2342783A1 FR 7706112 A FR7706112 A FR 7706112A FR 7706112 A FR7706112 A FR 7706112A FR 2342783 A1 FR2342783 A1 FR 2342783A1
Authority
FR
France
Prior art keywords
chemical reaction
luminescent discharge
luminescent
discharge
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7706112A
Other languages
English (en)
French (fr)
Other versions
FR2342783B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Plasma Corp
INT PLASMA CORP
Original Assignee
International Plasma Corp
INT PLASMA CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Plasma Corp, INT PLASMA CORP filed Critical International Plasma Corp
Publication of FR2342783A1 publication Critical patent/FR2342783A1/fr
Application granted granted Critical
Publication of FR2342783B1 publication Critical patent/FR2342783B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
FR7706112A 1976-03-03 1977-03-02 Procede et appareil de reaction chimique dans une decharge luminescente Granted FR2342783A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66327176A 1976-03-03 1976-03-03
US76187977A 1977-01-24 1977-01-24

Publications (2)

Publication Number Publication Date
FR2342783A1 true FR2342783A1 (fr) 1977-09-30
FR2342783B1 FR2342783B1 (enExample) 1982-06-11

Family

ID=27098713

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7706112A Granted FR2342783A1 (fr) 1976-03-03 1977-03-02 Procede et appareil de reaction chimique dans une decharge luminescente

Country Status (6)

Country Link
JP (1) JPS52116785A (enExample)
CH (1) CH620314A5 (enExample)
DE (1) DE2708720C2 (enExample)
FR (1) FR2342783A1 (enExample)
GB (1) GB1544172A (enExample)
NL (1) NL7702232A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2433590A1 (fr) * 1978-07-27 1980-03-14 Eaton Corp Procede d'attaque chimique en phase gazeuse
EP0045858A3 (en) * 1980-08-11 1983-01-12 Eaton Corporation Plasma etching electrode
EP1012863A4 (en) * 1997-03-18 2000-11-15 Stevens Inst Technology GLIMMENT CHARGE PLASMA DEVICE
WO2001011658A1 (de) * 1999-08-10 2001-02-15 Unaxis Trading Ag Plasmareaktor zur behandlung von grossflächigen substraten
US6879103B1 (en) 1997-03-18 2005-04-12 The Trustees Of The Stevens Institute Of Technology Glow plasma discharge device
US6900592B2 (en) 1997-03-18 2005-05-31 The Trustees Of The Stevens Institute Of Technology Method and apparatus for stabilizing of the glow plasma discharges

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4183781A (en) * 1978-09-25 1980-01-15 International Business Machines Corporation Stabilization process for aluminum microcircuits which have been reactive-ion etched
GB2144669B (en) * 1982-12-07 1986-02-26 Standard Telephones Cables Ltd Cleaning electrical contacts
DE3476818D1 (en) * 1983-12-16 1989-03-30 Showa Aluminum Corp Process for producing aluminum material for use in vacuum
JPS60211061A (ja) * 1984-04-05 1985-10-23 Toyota Central Res & Dev Lab Inc アルミニウム材のイオン窒化方法
US4749589A (en) * 1984-12-13 1988-06-07 Stc Plc Method of surface treatment

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3616403A (en) * 1968-10-25 1971-10-26 Ibm Prevention of inversion of p-type semiconductor material during rf sputtering of quartz
US3661761A (en) * 1969-06-02 1972-05-09 Ibm Rf sputtering apparatus for promoting resputtering of film during deposition
US3757733A (en) * 1971-10-27 1973-09-11 Texas Instruments Inc Radial flow reactor
DE2241229C2 (de) * 1972-08-22 1983-01-20 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum Ätzen von Substraten durch eine Glimmentladung
JPS5740650B2 (enExample) * 1973-08-11 1982-08-28

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2433590A1 (fr) * 1978-07-27 1980-03-14 Eaton Corp Procede d'attaque chimique en phase gazeuse
EP0045858A3 (en) * 1980-08-11 1983-01-12 Eaton Corporation Plasma etching electrode
EP1012863A4 (en) * 1997-03-18 2000-11-15 Stevens Inst Technology GLIMMENT CHARGE PLASMA DEVICE
US6879103B1 (en) 1997-03-18 2005-04-12 The Trustees Of The Stevens Institute Of Technology Glow plasma discharge device
US6900592B2 (en) 1997-03-18 2005-05-31 The Trustees Of The Stevens Institute Of Technology Method and apparatus for stabilizing of the glow plasma discharges
WO2001011658A1 (de) * 1999-08-10 2001-02-15 Unaxis Trading Ag Plasmareaktor zur behandlung von grossflächigen substraten
US6228438B1 (en) 1999-08-10 2001-05-08 Unakis Balzers Aktiengesellschaft Plasma reactor for the treatment of large size substrates

Also Published As

Publication number Publication date
CH620314A5 (en) 1980-11-14
FR2342783B1 (enExample) 1982-06-11
NL7702232A (nl) 1977-09-06
JPS52116785A (en) 1977-09-30
GB1544172A (en) 1979-04-11
JPS5347664B2 (enExample) 1978-12-22
DE2708720C2 (de) 1982-08-26
DE2708720A1 (de) 1977-09-15

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Legal Events

Date Code Title Description
ST Notification of lapse