FR2334962A1 - Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity - Google Patents

Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity

Info

Publication number
FR2334962A1
FR2334962A1 FR7537574A FR7537574A FR2334962A1 FR 2334962 A1 FR2334962 A1 FR 2334962A1 FR 7537574 A FR7537574 A FR 7537574A FR 7537574 A FR7537574 A FR 7537574A FR 2334962 A1 FR2334962 A1 FR 2334962A1
Authority
FR
France
Prior art keywords
film
vacuum deposition
rate
deposition
determining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7537574A
Other languages
French (fr)
Other versions
FR2334962B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sierracin Corp
Original Assignee
Sierracin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sierracin Corp filed Critical Sierracin Corp
Priority to FR7537574A priority Critical patent/FR2334962A1/en
Priority to DE19752555428 priority patent/DE2555428A1/en
Publication of FR2334962A1 publication Critical patent/FR2334962A1/en
Application granted granted Critical
Publication of FR2334962B1 publication Critical patent/FR2334962B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by vapour deposition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/013—Heaters using resistive films or coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating

Abstract

Vacuum deposition of silver, gold, or copper on a transparent plastics film is monitored by applying electro magnetic radiation of 1.5 to 4 micron wave-length to the metallised film and detecting the signal transmitted through the film. The value of the detected signal is correlated to the surface resistivity of the film. Used for vacuum deposition of resistance heater elements for deciding and demisting. It allows detection and close control of the rate of deposition by control of rate of film transport, power to the electron gun, rate feed to the electron gun crucible or other control of the rate of deposition.
FR7537574A 1975-12-09 1975-12-09 Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity Granted FR2334962A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR7537574A FR2334962A1 (en) 1975-12-09 1975-12-09 Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity
DE19752555428 DE2555428A1 (en) 1975-12-09 1975-12-10 METHOD FOR DETERMINING THE AREA RESISTANCE OF METAL FILMS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7537574A FR2334962A1 (en) 1975-12-09 1975-12-09 Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity
DE19752555428 DE2555428A1 (en) 1975-12-09 1975-12-10 METHOD FOR DETERMINING THE AREA RESISTANCE OF METAL FILMS

Publications (2)

Publication Number Publication Date
FR2334962A1 true FR2334962A1 (en) 1977-07-08
FR2334962B1 FR2334962B1 (en) 1981-09-25

Family

ID=25769718

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7537574A Granted FR2334962A1 (en) 1975-12-09 1975-12-09 Monitoring vacuum deposition process - by determining the electromagnetic wave transmissivity

Country Status (2)

Country Link
DE (1) DE2555428A1 (en)
FR (1) FR2334962A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0151737A2 (en) * 1984-02-16 1985-08-21 Siemens Aktiengesellschaft Process for controlling and monitoring the incorporation of a doping material into conductive metallic layers during their manufacture

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4123249C2 (en) * 1991-07-13 1993-10-14 Mannesmann Ag Method of making a variety of matched metallic thin film resistor structures
FR2698166B1 (en) * 1992-11-13 1994-12-16 Renault Method for measuring the temperature on the surface of a window pane, in particular with a heating resistance of a motor vehicle.
CN108592777A (en) * 2018-04-19 2018-09-28 钱立文 Moveable metallized film sheet resistance in-service monitoring device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0151737A2 (en) * 1984-02-16 1985-08-21 Siemens Aktiengesellschaft Process for controlling and monitoring the incorporation of a doping material into conductive metallic layers during their manufacture
EP0151737A3 (en) * 1984-02-16 1988-03-30 Siemens Aktiengesellschaft Berlin Und Munchen Process for controlling and monitoring the incorporation of a doping material into conductive metallic layers during their manufacture

Also Published As

Publication number Publication date
DE2555428A1 (en) 1977-06-16
FR2334962B1 (en) 1981-09-25

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Legal Events

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