FR2327569A1 - Composition resineuse photosensible - Google Patents

Composition resineuse photosensible

Info

Publication number
FR2327569A1
FR2327569A1 FR7344539A FR7344539A FR2327569A1 FR 2327569 A1 FR2327569 A1 FR 2327569A1 FR 7344539 A FR7344539 A FR 7344539A FR 7344539 A FR7344539 A FR 7344539A FR 2327569 A1 FR2327569 A1 FR 2327569A1
Authority
FR
France
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7344539A
Other languages
English (en)
French (fr)
Other versions
FR2327569B1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of FR2327569A1 publication Critical patent/FR2327569A1/fr
Application granted granted Critical
Publication of FR2327569B1 publication Critical patent/FR2327569B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Polyurethanes Or Polyureas (AREA)
FR7344539A 1972-12-14 1973-12-13 Composition resineuse photosensible Granted FR2327569A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (2)

Publication Number Publication Date
FR2327569A1 true FR2327569A1 (fr) 1977-05-06
FR2327569B1 FR2327569B1 (de) 1978-03-24

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7344539A Granted FR2327569A1 (fr) 1972-12-14 1973-12-13 Composition resineuse photosensible

Country Status (9)

Country Link
JP (1) JPS543727B2 (de)
BR (1) BR7309820D0 (de)
CH (1) CH587500A5 (de)
DE (1) DE2361931A1 (de)
FR (1) FR2327569A1 (de)
GB (1) GB1463818A (de)
IT (1) IT1000315B (de)
NL (1) NL7317180A (de)
SE (1) SE404094B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU75749A1 (de) * 1976-09-08 1978-04-27
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
DE2948554A1 (de) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
JPS584421U (ja) * 1981-07-02 1983-01-12 東海興業株式会社 カーテンレール付ウェザストリップ
JPS5938747A (ja) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk 感光性平版印刷版
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor
DE3824146A1 (de) * 1988-07-16 1990-02-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
ES2320561T3 (es) * 2005-11-18 2009-05-25 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382A1 (de) * 1970-01-19 1971-09-09 Dainippon Ink & Chemicals Photopolymensierbare Zusammen Setzungen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382A1 (de) * 1970-01-19 1971-09-09 Dainippon Ink & Chemicals Photopolymensierbare Zusammen Setzungen

Also Published As

Publication number Publication date
GB1463818A (en) 1977-02-09
NL7317180A (de) 1974-06-18
SE404094B (sv) 1978-09-18
BR7309820D0 (pt) 1974-09-24
IT1000315B (it) 1976-03-30
FR2327569B1 (de) 1978-03-24
JPS5018585A (de) 1975-02-27
DE2361931A1 (de) 1974-06-20
CH587500A5 (de) 1977-05-13
AU6328473A (en) 1975-06-12
JPS543727B2 (de) 1979-02-26

Similar Documents

Publication Publication Date Title
BR7302555D0 (pt) Composicao fotopolimerizavel
SE409451B (sv) Gasalstrande komposition
AT320685B (de) Lichtempfindliches Material
IT1007742B (it) Composizione fotosensibile
BE822344A (fr) Raies pseudo-subsuperficielles
BE798440A (nl) Fotografisch materiaal
FR2327569A1 (fr) Composition resineuse photosensible
BR7309613D0 (pt) Composicao polimerica termoselavel
AT336282B (de) Formmassen
AT333051B (de) Pankratisches objektiv
BE757652A (fr) Composition resineuse photosensible
AT326365B (de) Kunststoffzusammensetzung
IT995173B (it) Composizione polimerica termoindupente
SE386908B (sv) Kemiluminescent komposition
AR204983A1 (es) Composicion de revelado
IT977330B (it) Composizioni fotopolimerizzabili migliorate
FI55926B (fi) Herbicidkompositioner
RO68498A (ro) Compozitie erbicida sinergetica
IT987267B (it) Proietto decalibrato
BE798863A (fr) Compositions thermoplastiques ameliorees
BE794825A (fr) Materiau photosensible
SE405048B (sv) Fotopolymeriserbar komposition
IT976804B (it) Meccanismo divisorio
SE386622B (sv) Typmekanism
RO69047A (ro) Compozitie erbicida sinergetica

Legal Events

Date Code Title Description
ST Notification of lapse