BE757652A - Composition resineuse photosensible - Google Patents

Composition resineuse photosensible

Info

Publication number
BE757652A
BE757652A BE757652DA BE757652A BE 757652 A BE757652 A BE 757652A BE 757652D A BE757652D A BE 757652DA BE 757652 A BE757652 A BE 757652A
Authority
BE
Belgium
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Application number
Other languages
English (en)
Inventor
M Ishii
Original Assignee
Mitsui Mining & Smelting Cy Lt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE757652A publication Critical patent/BE757652A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BE757652D 1969-10-17 Composition resineuse photosensible BE757652A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP44082572A JPS496562B1 (fr) 1969-10-17 1969-10-17

Publications (1)

Publication Number Publication Date
BE757652A true BE757652A (fr) 1971-04-01

Family

ID=13778183

Family Applications (1)

Application Number Title Priority Date Filing Date
BE757652D BE757652A (fr) 1969-10-17 Composition resineuse photosensible

Country Status (5)

Country Link
US (1) US3684516A (fr)
JP (1) JPS496562B1 (fr)
BE (1) BE757652A (fr)
DE (1) DE2041989A1 (fr)
GB (1) GB1329873A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4145222A (en) * 1974-11-19 1979-03-20 Toyobo Co., Ltd. Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
JPS5823616B2 (ja) * 1976-11-08 1983-05-16 東レ株式会社 感光性ポリマ組成物
JPS5424171U (fr) * 1977-07-20 1979-02-16
JPS5447163U (fr) * 1977-09-07 1979-04-02
JPS5456269U (fr) * 1977-09-27 1979-04-18
CA1179442A (fr) * 1980-12-03 1984-12-11 James A. Richards Composition de polyamide reticulable a la lumiere
US4975498A (en) * 1988-12-14 1990-12-04 Union Camp Corporation Thermally-curable aminoamide acrylate polymer
US4987160A (en) * 1989-01-31 1991-01-22 Union Camp Corporation Radiation-curable aminoamide acrylate polymer
DE102004061323A1 (de) * 2004-12-20 2006-06-22 Epg (Engineered Nanoproducts Germany)Gmbh Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit hoher lateraler Auflösung und Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
US3684516A (en) 1972-08-15
DE2041989A1 (de) 1971-04-29
JPS496562B1 (fr) 1974-02-15
GB1329873A (en) 1973-09-12

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