JPS496562B1 - - Google Patents

Info

Publication number
JPS496562B1
JPS496562B1 JP44082572A JP8257269A JPS496562B1 JP S496562 B1 JPS496562 B1 JP S496562B1 JP 44082572 A JP44082572 A JP 44082572A JP 8257269 A JP8257269 A JP 8257269A JP S496562 B1 JPS496562 B1 JP S496562B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44082572A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE757652D priority Critical patent/BE757652A/xx
Application filed filed Critical
Priority to JP44082572A priority patent/JPS496562B1/ja
Priority to DE19702041989 priority patent/DE2041989A1/de
Priority to US68483A priority patent/US3684516A/en
Priority to GB4315970A priority patent/GB1329873A/en
Publication of JPS496562B1 publication Critical patent/JPS496562B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP44082572A 1969-10-17 1969-10-17 Pending JPS496562B1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
BE757652D BE757652A (fr) 1969-10-17 Composition resineuse photosensible
JP44082572A JPS496562B1 (ja) 1969-10-17 1969-10-17
DE19702041989 DE2041989A1 (de) 1969-10-17 1970-08-25 Lichtempfindliche Harzmasse
US68483A US3684516A (en) 1969-10-17 1970-08-31 Photo-sensitive resin composition
GB4315970A GB1329873A (en) 1969-10-17 1970-09-09 Photo-sensitive polyamide resin compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP44082572A JPS496562B1 (ja) 1969-10-17 1969-10-17

Publications (1)

Publication Number Publication Date
JPS496562B1 true JPS496562B1 (ja) 1974-02-15

Family

ID=13778183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44082572A Pending JPS496562B1 (ja) 1969-10-17 1969-10-17

Country Status (5)

Country Link
US (1) US3684516A (ja)
JP (1) JPS496562B1 (ja)
BE (1) BE757652A (ja)
DE (1) DE2041989A1 (ja)
GB (1) GB1329873A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424171U (ja) * 1977-07-20 1979-02-16
JPS5447163U (ja) * 1977-09-07 1979-04-02
JPS5456269U (ja) * 1977-09-27 1979-04-18

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4145222A (en) * 1974-11-19 1979-03-20 Toyobo Co., Ltd. Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
JPS5823616B2 (ja) * 1976-11-08 1983-05-16 東レ株式会社 感光性ポリマ組成物
CA1179442A (en) * 1980-12-03 1984-12-11 James A. Richards Radiation cross linked polyamide composition
US4975498A (en) * 1988-12-14 1990-12-04 Union Camp Corporation Thermally-curable aminoamide acrylate polymer
US4987160A (en) * 1989-01-31 1991-01-22 Union Camp Corporation Radiation-curable aminoamide acrylate polymer
DE102004061323A1 (de) * 2004-12-20 2006-06-22 Epg (Engineered Nanoproducts Germany)Gmbh Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit hoher lateraler Auflösung und Verfahren zu ihrer Herstellung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424171U (ja) * 1977-07-20 1979-02-16
JPS5447163U (ja) * 1977-09-07 1979-04-02
JPS5456269U (ja) * 1977-09-27 1979-04-18

Also Published As

Publication number Publication date
GB1329873A (en) 1973-09-12
DE2041989A1 (de) 1971-04-29
BE757652A (fr) 1971-04-01
US3684516A (en) 1972-08-15

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