FR2316723A1 - Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam - Google Patents
Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beamInfo
- Publication number
- FR2316723A1 FR2316723A1 FR7520942A FR7520942A FR2316723A1 FR 2316723 A1 FR2316723 A1 FR 2316723A1 FR 7520942 A FR7520942 A FR 7520942A FR 7520942 A FR7520942 A FR 7520942A FR 2316723 A1 FR2316723 A1 FR 2316723A1
- Authority
- FR
- France
- Prior art keywords
- ion beam
- feed
- frame
- axis
- housing containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/08—Holders for targets or for other objects to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Physical Vapour Deposition (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
The device housing has a window for ion beam passage, which can be covered by a door with sensors controlling the distribution of the ion current on target surface. The feed is mounted in a frame (35) which is rotatable, together with the feed, in the housing (26) about the frame long axis. The latter passes through the treated workpiece under an angle to the ion beam (3) axis, thus enabling the workpiece to be treated all round without changing the direction of the ion beam. In this manner the other parts and gears driving the feed and frame are kept away from the effective range of the ion beam. Preferably the feed is in the form of a drum (33) mounted on a hub (34) rotatably mounted in the frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7520942A FR2316723A1 (en) | 1975-07-03 | 1975-07-03 | Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7520942A FR2316723A1 (en) | 1975-07-03 | 1975-07-03 | Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2316723A1 true FR2316723A1 (en) | 1977-01-28 |
FR2316723B1 FR2316723B1 (en) | 1978-12-22 |
Family
ID=9157476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7520942A Granted FR2316723A1 (en) | 1975-07-03 | 1975-07-03 | Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2316723A1 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2221815A1 (en) * | 1973-03-16 | 1974-10-11 | Philips Nv |
-
1975
- 1975-07-03 FR FR7520942A patent/FR2316723A1/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2221815A1 (en) * | 1973-03-16 | 1974-10-11 | Philips Nv |
Also Published As
Publication number | Publication date |
---|---|
FR2316723B1 (en) | 1978-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1022094A (en) | De-clutch mechanism for valve operator | |
FR2316723A1 (en) | Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam | |
NL7506133A (en) | Workpiece feed for ion beam processing - has housing containing rotary mounted feed and frame about axis at given angle to ion beam | |
FR2357942A1 (en) | Automatic painting mechanism programming system - uses spray gun held by operator with inertial system attached | |
EP0067786A3 (en) | Apparatus for heating the cylindrical wall of a rotary cylinder of a paper making machine | |
JPS5244478A (en) | Adjustment device for multi-purpose deformed forming | |
CA976669A (en) | Control mechanism for an electron-optical apparatus | |
JPS51143442A (en) | Electric pachinko machine | |
CA1027016A (en) | Variably biased control mechanism | |
ES435257A1 (en) | Feed mechanism for a machine tool | |
JPS5747594A (en) | Laser working device | |
JPS5356094A (en) | Controlling apparatus for coins passage width in coin treating machine | |
JPS528590A (en) | Method and device to adjust the space between spindles for machine too ls | |
JPS5554177A (en) | Device for dressing grindstone | |
JPS528273A (en) | Vibration damping device | |
ES8302352A1 (en) | Method and an apparatus for manufacturing strands from wires or ropes from strands | |
GB1342436A (en) | Apparatus for controlling the energy of a laser beam | |
JPS5224585A (en) | X-ray analysis apparatus | |
JPS55124936A (en) | Control method of beam current in ion drive | |
ES438244A1 (en) | Mechanism of conversion of a continuous movement in another discontinuous with stop between non-parallel axles. (Machine-translation by Google Translate, not legally binding) | |
JPS5269874A (en) | Coating method | |
JPS5237577A (en) | Apparatus for forming coating by ion spattering process | |
AU531720B2 (en) | Shooting-gallery targets | |
JPS53129008A (en) | Rotary magnetic head device | |
JPS5230793A (en) | Method for controlling evaporation rate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |