FR2316626A1 - Couche barriere protegeant de l'oxygene pour planches d'impression lithographique - Google Patents

Couche barriere protegeant de l'oxygene pour planches d'impression lithographique

Info

Publication number
FR2316626A1
FR2316626A1 FR7619854A FR7619854A FR2316626A1 FR 2316626 A1 FR2316626 A1 FR 2316626A1 FR 7619854 A FR7619854 A FR 7619854A FR 7619854 A FR7619854 A FR 7619854A FR 2316626 A1 FR2316626 A1 FR 2316626A1
Authority
FR
France
Prior art keywords
barrier layer
lithographic printing
oxygen protecting
protecting barrier
printing boards
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7619854A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2316626A1 publication Critical patent/FR2316626A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7619854A 1975-07-03 1976-06-30 Couche barriere protegeant de l'oxygene pour planches d'impression lithographique Withdrawn FR2316626A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2809275A GB1553823A (en) 1975-07-03 1975-07-03 Photographic material

Publications (1)

Publication Number Publication Date
FR2316626A1 true FR2316626A1 (fr) 1977-01-28

Family

ID=10270134

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7619854A Withdrawn FR2316626A1 (fr) 1975-07-03 1976-06-30 Couche barriere protegeant de l'oxygene pour planches d'impression lithographique

Country Status (5)

Country Link
JP (1) JPS5224703A (fr)
BE (1) BE843755A (fr)
DE (1) DE2629883A1 (fr)
FR (1) FR2316626A1 (fr)
GB (1) GB1553823A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0529789A1 (fr) * 1991-08-30 1993-03-03 Minnesota Mining And Manufacturing Company Système d'épreuve en couleurs à feuille unique travaillant en négatif et basé sur des oligomères photosensibles développables en milieu aqueux

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515155A (en) * 1978-07-19 1980-02-02 Kansai Paint Co Ltd Production of screen printing plate
JPS5515178A (en) * 1978-07-20 1980-02-02 Kansai Paint Co Ltd Production of screen printing plate
JPS59177544A (ja) * 1983-03-29 1984-10-08 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法
JPS6127547A (ja) * 1984-07-17 1986-02-07 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JPH0389349A (ja) * 1989-09-01 1991-04-15 Riso Kagaku Corp 凹凸画像の形成方法
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0529789A1 (fr) * 1991-08-30 1993-03-03 Minnesota Mining And Manufacturing Company Système d'épreuve en couleurs à feuille unique travaillant en négatif et basé sur des oligomères photosensibles développables en milieu aqueux
US5248583A (en) * 1991-08-30 1993-09-28 Minnesota Mining And Manufacturing Company Negative single sheet color proofing system based on aqueous developable photo-oligomers

Also Published As

Publication number Publication date
GB1553823A (en) 1979-10-10
JPS5224703A (en) 1977-02-24
DE2629883A1 (de) 1977-01-13
BE843755A (fr) 1977-01-03

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Legal Events

Date Code Title Description
ST Notification of lapse