BE866789A - Matieres photopolymerisables ameliorees pour la realisation de cliches et de formes d'impression en relief - Google Patents

Matieres photopolymerisables ameliorees pour la realisation de cliches et de formes d'impression en relief

Info

Publication number
BE866789A
BE866789A BE187462A BE187462A BE866789A BE 866789 A BE866789 A BE 866789A BE 187462 A BE187462 A BE 187462A BE 187462 A BE187462 A BE 187462A BE 866789 A BE866789 A BE 866789A
Authority
BE
Belgium
Prior art keywords
cliches
making
improved
forms
relief printing
Prior art date
Application number
BE187462A
Other languages
English (en)
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of BE866789A publication Critical patent/BE866789A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
BE187462A 1977-05-07 1978-05-08 Matieres photopolymerisables ameliorees pour la realisation de cliches et de formes d'impression en relief BE866789A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772720560 DE2720560A1 (de) 1977-05-07 1977-05-07 Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen

Publications (1)

Publication Number Publication Date
BE866789A true BE866789A (fr) 1978-11-08

Family

ID=6008286

Family Applications (1)

Application Number Title Priority Date Filing Date
BE187462A BE866789A (fr) 1977-05-07 1978-05-08 Matieres photopolymerisables ameliorees pour la realisation de cliches et de formes d'impression en relief

Country Status (10)

Country Link
US (1) US4189322A (fr)
JP (1) JPS6032174B2 (fr)
BE (1) BE866789A (fr)
CH (1) CH637412A5 (fr)
DE (1) DE2720560A1 (fr)
DK (1) DK197478A (fr)
FR (1) FR2389923B1 (fr)
GB (1) GB1600925A (fr)
IT (1) IT1102528B (fr)
NL (1) NL7804862A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361640A (en) * 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder
US4542088A (en) * 1982-03-18 1985-09-17 Konishiroku Photo Industry Co., Ltd. Photopolymerizable compositions and image-forming materials using said compositions
DE3744243C2 (de) * 1987-12-24 1995-12-07 Du Pont Deutschland Verbesserte photopolymerisierbare Aufzeichnungsmaterialien
DE4300856A1 (de) * 1993-01-15 1994-07-21 Basf Lacke & Farben Lichtempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Reliefdruckplatte
US6743273B2 (en) * 2000-09-05 2004-06-01 Donaldson Company, Inc. Polymer, polymer microfiber, polymer nanofiber and applications including filter structures
US20100175555A1 (en) * 2008-09-12 2010-07-15 Ismael Ferrer Polyamide Fine Fibers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2670285A (en) * 1951-01-20 1954-02-23 Eastman Kodak Co Photosensitization of polymeric cinnamic acid esters
US3219566A (en) * 1962-02-15 1965-11-23 Dow Chemical Co Cross-linking of polyethylene and polypropylene by ultraviolet irradiation in the presence of anthrone
GB1179866A (en) * 1967-09-08 1970-02-04 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
US3827957A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated polynuclear ketone initiators
US3827956A (en) * 1973-01-12 1974-08-06 Scm Corp Photopolymerizable pigmented vehicles containing chlorosulfonated or alpha-haloalkylated benzanthrone initiators
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
CH597262A5 (fr) * 1976-02-23 1978-03-31 Ciba Geigy Ag

Also Published As

Publication number Publication date
CH637412A5 (de) 1983-07-29
DE2720560A1 (de) 1978-11-09
GB1600925A (en) 1981-10-21
NL7804862A (nl) 1978-11-09
IT7849219A0 (it) 1978-05-05
IT1102528B (it) 1985-10-07
US4189322A (en) 1980-02-19
FR2389923A1 (fr) 1978-12-01
JPS53138486A (en) 1978-12-02
FR2389923B1 (fr) 1983-07-22
JPS6032174B2 (ja) 1985-07-26
DK197478A (da) 1978-11-08
DE2720560C2 (fr) 1987-07-09

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: BASF A.G.

Effective date: 19880531