FR2315763A1 - Installation de realisation de micro-canaux dans un corps semi-conducteur, en particulier de micro-canaux multiplicateurs d'electrons - Google Patents
Installation de realisation de micro-canaux dans un corps semi-conducteur, en particulier de micro-canaux multiplicateurs d'electronsInfo
- Publication number
- FR2315763A1 FR2315763A1 FR7520398A FR7520398A FR2315763A1 FR 2315763 A1 FR2315763 A1 FR 2315763A1 FR 7520398 A FR7520398 A FR 7520398A FR 7520398 A FR7520398 A FR 7520398A FR 2315763 A1 FR2315763 A1 FR 2315763A1
- Authority
- FR
- France
- Prior art keywords
- micro
- channels
- semiconductor body
- electron multiplier
- particular electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/32—Secondary emission electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7520398A FR2315763A1 (fr) | 1975-06-27 | 1975-06-27 | Installation de realisation de micro-canaux dans un corps semi-conducteur, en particulier de micro-canaux multiplicateurs d'electrons |
DE19762628381 DE2628381B2 (de) | 1975-06-27 | 1976-06-24 | Vorrichtung zum Bohren von Mikrokanälen zwischen zwei einander gegenüberliegenden Flächen eines n-leitenden Halbleiterkörpers |
GB2642276A GB1530509A (en) | 1975-06-27 | 1976-06-24 | Installation for producing electrolytically microscopic passages in a semiconductor body in particular microscopic passages for electronmultiplication applications and operating process of the same |
JP7630576A JPS524785A (en) | 1975-06-27 | 1976-06-28 | Apparatus making fine holes between opposing two faces of semiconductors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7520398A FR2315763A1 (fr) | 1975-06-27 | 1975-06-27 | Installation de realisation de micro-canaux dans un corps semi-conducteur, en particulier de micro-canaux multiplicateurs d'electrons |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2315763A1 true FR2315763A1 (fr) | 1977-01-21 |
FR2315763B1 FR2315763B1 (fr) | 1979-02-02 |
Family
ID=9157238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7520398A Granted FR2315763A1 (fr) | 1975-06-27 | 1975-06-27 | Installation de realisation de micro-canaux dans un corps semi-conducteur, en particulier de micro-canaux multiplicateurs d'electrons |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS524785A (fr) |
DE (1) | DE2628381B2 (fr) |
FR (1) | FR2315763A1 (fr) |
GB (1) | GB1530509A (fr) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5488772A (en) * | 1977-12-26 | 1979-07-14 | Nec Corp | Local etching method for semiconductor device |
JPS5513960A (en) * | 1978-07-17 | 1980-01-31 | Nec Corp | Mesa forming method |
US6387247B1 (en) | 1999-09-03 | 2002-05-14 | Shell Oil Company | Feed injection system for catalytic cracking process |
JPWO2002075800A1 (ja) * | 2001-03-19 | 2004-07-08 | 三菱電機株式会社 | 電気化学エッチング装置及びその方法並びにその製造物 |
EP1881890A2 (fr) | 2005-05-18 | 2008-01-30 | Matsushita Electric Works, Ltd. | Procede de fabrication d'une lentille optique |
JP4743102B2 (ja) * | 2005-05-18 | 2011-08-10 | パナソニック電工株式会社 | 曲面の形成方法 |
JP4862642B2 (ja) * | 2005-05-18 | 2012-01-25 | パナソニック電工株式会社 | 曲面の形成方法 |
US7749868B2 (en) | 2005-05-18 | 2010-07-06 | Panasonic Electric Works Co., Ltd. | Process of forming a curved profile on a semiconductor substrate |
JP4586798B2 (ja) * | 2005-08-26 | 2010-11-24 | パナソニック電工株式会社 | 半導体レンズの製造方法 |
JP4586797B2 (ja) * | 2005-08-26 | 2010-11-24 | パナソニック電工株式会社 | 半導体レンズの製造方法 |
JP4586796B2 (ja) * | 2005-08-26 | 2010-11-24 | パナソニック電工株式会社 | 半導体レンズの製造方法 |
JP4862407B2 (ja) * | 2006-01-26 | 2012-01-25 | パナソニック電工株式会社 | 半導体レンズの製造方法 |
JP5010253B2 (ja) * | 2006-03-28 | 2012-08-29 | パナソニック株式会社 | 半導体レンズおよびそれを用いた赤外線検出装置、半導体レンズの製造方法 |
JP5010252B2 (ja) * | 2006-11-27 | 2012-08-29 | パナソニック株式会社 | 半導体レンズの製造方法 |
JP5427062B2 (ja) * | 2010-02-25 | 2014-02-26 | 東京エレクトロン株式会社 | 基板のエッチング方法、プログラム及びコンピュータ記憶媒体 |
-
1975
- 1975-06-27 FR FR7520398A patent/FR2315763A1/fr active Granted
-
1976
- 1976-06-24 DE DE19762628381 patent/DE2628381B2/de active Granted
- 1976-06-24 GB GB2642276A patent/GB1530509A/en not_active Expired
- 1976-06-28 JP JP7630576A patent/JPS524785A/ja active Pending
Non-Patent Citations (1)
Title |
---|
NEANT * |
Also Published As
Publication number | Publication date |
---|---|
DE2628381A1 (de) | 1976-12-30 |
DE2628381B2 (de) | 1978-11-16 |
GB1530509A (en) | 1978-11-01 |
JPS524785A (en) | 1977-01-14 |
FR2315763B1 (fr) | 1979-02-02 |
DE2628381C3 (fr) | 1979-07-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |