FR2304400A1 - Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium - Google Patents

Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium

Info

Publication number
FR2304400A1
FR2304400A1 FR7508614A FR7508614A FR2304400A1 FR 2304400 A1 FR2304400 A1 FR 2304400A1 FR 7508614 A FR7508614 A FR 7508614A FR 7508614 A FR7508614 A FR 7508614A FR 2304400 A1 FR2304400 A1 FR 2304400A1
Authority
FR
France
Prior art keywords
obtd
reaction
monocrystals
gallium
gacl3
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7508614A
Other languages
English (en)
French (fr)
Other versions
FR2304400B1 (enrdf_load_stackoverflow
Inventor
Guy Jacob
Jean Hallais
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7508614A priority Critical patent/FR2304400A1/fr
Publication of FR2304400A1 publication Critical patent/FR2304400A1/fr
Application granted granted Critical
Publication of FR2304400B1 publication Critical patent/FR2304400B1/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00Compounds of gallium, indium or thallium
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR7508614A 1975-03-19 1975-03-19 Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium Granted FR2304400A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7508614A FR2304400A1 (fr) 1975-03-19 1975-03-19 Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7508614A FR2304400A1 (fr) 1975-03-19 1975-03-19 Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium

Publications (2)

Publication Number Publication Date
FR2304400A1 true FR2304400A1 (fr) 1976-10-15
FR2304400B1 FR2304400B1 (enrdf_load_stackoverflow) 1977-11-18

Family

ID=9152783

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7508614A Granted FR2304400A1 (fr) 1975-03-19 1975-03-19 Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium

Country Status (1)

Country Link
FR (1) FR2304400A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110809A (en) * 1998-03-26 2000-08-29 Sze; Simon M. Method for manufacturing an epitaxial wafer with a group III metal nitride epitaxial layer

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"JOURNAL OF THE ELECTROCHEMICAL SOCIETY: SOLID STATE SCIENCE AND TECHNOLOGY". 1972, VOLUME 119, NO.6, PAGES 761-765, ARTICLE "MASS SPECTROMETRIC STUDIES OF VAPOR-PHASE CRYSTAL GROWTH II GAN" PAR V.S.BAN.) *
JOURNAL OF CRISTAL GROWTH". 1974, VOLUME 22, PAGES 1-5, ARTICLE "KINETICS OF THE EPITAXIAL GROWTH OF GAN USING GA, HCL AND NH3" PAR A.SHINTANI. *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110809A (en) * 1998-03-26 2000-08-29 Sze; Simon M. Method for manufacturing an epitaxial wafer with a group III metal nitride epitaxial layer

Also Published As

Publication number Publication date
FR2304400B1 (enrdf_load_stackoverflow) 1977-11-18

Similar Documents

Publication Publication Date Title
Ban Mass Spectrometric Studies of Vapor‐Phase Crystal Growth: II.
Ho et al. MOVPE of AlN and GaN by using novel precursors
EP0801156A3 (en) Process for vapor phase epitaxy of compound semiconductor
US10741380B2 (en) Method for washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus
FR2304400A1 (fr) Procede de fabrication par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium
GB1497457A (en) Semiconductor-liquid phase epitaxial growth method and semiconductor device manufactured using the same
JPS5815480B2 (ja) チツカガリウムタンケツシヨウノ セイチヨウホウホウ
GB1328170A (en) Epitaxial deposition
JP2687371B2 (ja) 化合物半導体の気相成長法
JPS52113157A (en) Process for growing gallium arsenide and method of making semiconductor devices
Zhou et al. Growth mechanisms in excimer laser photolytic deposition of gallium nitride at 500 C
JPS63178516A (ja) 化合物半導体単結晶膜の成長方法
JPS53126263A (en) Method of epitaxially growing gallium arsenide layer on gallium arsenide body
JP4034261B2 (ja) Iii族窒化物の製造方法
Keller et al. Flow modulation epitaxy of indium gallium nitride
JPS60222127A (ja) ガスの純化装置
Avigal et al. Low Carbon Contamination of Epitaxial Germanium Films Produced by Pyrolysis of Alkyl Germanium Compounds
JPS63103894A (ja) 窒化ガリウム結晶の成長方法
GB1285686A (en) A method of doping a gas-phase semiconductor layer
TW377476B (en) Method of selective epitaxis of compound film on semiconductors
JPS6021518A (ja) 3−5族化合物半導体の気相成長方法
NAGATOMO et al. Growth of GaN Films on Sapphire Substrates by Low Pressure Metalorganic Vapor-Phase Epitaxy--Effect of Surface Treatment--
GB1165037A (en) Method of Manufacturing Crystals.
FR2304398A1 (fr) Procede d'obtention par heteroepitaxie en phase vapeur de monocristaux de nitrure de gallium
FR2304399A1 (fr) Procede d'obtention par croissance cristalline en phase vapeur de monocristaux de nitrure de gallium

Legal Events

Date Code Title Description
ST Notification of lapse