FR2276625A1 - Procede et dispositif de correction d'une aberration d'un faisceau de particules chargees - Google Patents

Procede et dispositif de correction d'une aberration d'un faisceau de particules chargees

Info

Publication number
FR2276625A1
FR2276625A1 FR7515556A FR7515556A FR2276625A1 FR 2276625 A1 FR2276625 A1 FR 2276625A1 FR 7515556 A FR7515556 A FR 7515556A FR 7515556 A FR7515556 A FR 7515556A FR 2276625 A1 FR2276625 A1 FR 2276625A1
Authority
FR
France
Prior art keywords
wire
over
grid
closed path
pulses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7515556A
Other languages
English (en)
French (fr)
Other versions
FR2276625B1 (enrdf_load_stackoverflow
Inventor
Samuel Doran
Merlyn H Perkins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2276625A1 publication Critical patent/FR2276625A1/fr
Application granted granted Critical
Publication of FR2276625B1 publication Critical patent/FR2276625B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C11/00—Details of pavings
    • E01C11/24—Methods or arrangements for preventing slipperiness or protecting against influences of the weather
    • E01C11/26—Permanently installed heating or blowing devices ; Mounting thereof
    • E01C11/265—Embedded electrical heating elements ; Mounting thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/34—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs
    • H05B3/36—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs heating conductor embedded in insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/026—Heaters specially adapted for floor heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Electron Beam Exposure (AREA)
FR7515556A 1974-06-26 1975-05-09 Procede et dispositif de correction d'une aberration d'un faisceau de particules chargees Granted FR2276625A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US483266A US3924156A (en) 1974-06-26 1974-06-26 Method and system for correcting an aberration of a beam of charged particles

Publications (2)

Publication Number Publication Date
FR2276625A1 true FR2276625A1 (fr) 1976-01-23
FR2276625B1 FR2276625B1 (enrdf_load_stackoverflow) 1977-04-15

Family

ID=23919393

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7515556A Granted FR2276625A1 (fr) 1974-06-26 1975-05-09 Procede et dispositif de correction d'une aberration d'un faisceau de particules chargees

Country Status (8)

Country Link
US (1) US3924156A (enrdf_load_stackoverflow)
JP (1) JPS5420396B2 (enrdf_load_stackoverflow)
DE (1) DE2521591C3 (enrdf_load_stackoverflow)
FR (1) FR2276625A1 (enrdf_load_stackoverflow)
GB (1) GB1505363A (enrdf_load_stackoverflow)
IT (1) IT1038110B (enrdf_load_stackoverflow)
NL (1) NL178732C (enrdf_load_stackoverflow)
SE (1) SE398415B (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444824A (en) * 1977-09-16 1979-04-09 Victor Co Of Japan Ltd Stabilizer circuit for focusing of pickup tube of electromagnetic focusing type
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
DE2937004C2 (de) * 1979-09-13 1984-11-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Chromatisch korrigierte Ablenkvorrichtung für Korpuskularstrahlgeräte
US6864493B2 (en) * 2001-05-30 2005-03-08 Hitachi, Ltd. Charged particle beam alignment method and charged particle beam apparatus
US6533721B1 (en) * 2001-07-27 2003-03-18 Stryker Corporation Endoscopic camera system with automatic non-mechanical focus
US10056224B2 (en) * 2015-08-10 2018-08-21 Kla-Tencor Corporation Method and system for edge-of-wafer inspection and review
WO2021186637A1 (ja) * 2020-03-18 2021-09-23 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection
DE1948153A1 (de) * 1969-09-23 1971-04-01 Siemens Ag Elektronenstrahlroehre als Zeichenschreibroehre

Also Published As

Publication number Publication date
DE2521591B2 (de) 1978-05-03
JPS515694A (enrdf_load_stackoverflow) 1976-01-17
IT1038110B (it) 1979-11-20
FR2276625B1 (enrdf_load_stackoverflow) 1977-04-15
NL178732B (nl) 1985-12-02
DE2521591A1 (de) 1976-01-15
US3924156A (en) 1975-12-02
NL178732C (nl) 1986-05-01
SE398415B (sv) 1977-12-19
GB1505363A (en) 1978-03-30
NL7507428A (nl) 1975-12-30
AU8138075A (en) 1976-11-25
JPS5420396B2 (enrdf_load_stackoverflow) 1979-07-23
DE2521591C3 (de) 1979-02-01
SE7507109L (sv) 1975-12-29

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Legal Events

Date Code Title Description
ST Notification of lapse