FR2273303A1 - - Google Patents
Info
- Publication number
- FR2273303A1 FR2273303A1 FR7510345A FR7510345A FR2273303A1 FR 2273303 A1 FR2273303 A1 FR 2273303A1 FR 7510345 A FR7510345 A FR 7510345A FR 7510345 A FR7510345 A FR 7510345A FR 2273303 A1 FR2273303 A1 FR 2273303A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/473,603 US4078098A (en) | 1974-05-28 | 1974-05-28 | High energy radiation exposed positive resist mask process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2273303A1 true FR2273303A1 (US07652168-20100126-C00068.png) | 1975-12-26 |
| FR2273303B1 FR2273303B1 (US07652168-20100126-C00068.png) | 1977-04-15 |
Family
ID=23880244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7510345A Expired FR2273303B1 (US07652168-20100126-C00068.png) | 1974-05-28 | 1975-03-25 |
Country Status (5)
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
| JPS53123929A (en) * | 1977-04-05 | 1978-10-28 | Tokyo Ouka Kougiyou Kk | Developing liquid for use in radiant ray positive type resist |
| US4211834A (en) * | 1977-12-30 | 1980-07-08 | International Business Machines Corporation | Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask |
| JPS56101148A (en) * | 1980-01-16 | 1981-08-13 | Toshiba Corp | Photoresist developing method |
| US4321317A (en) * | 1980-04-28 | 1982-03-23 | General Motors Corporation | High resolution lithography system for microelectronic fabrication |
| NL8006947A (nl) * | 1980-12-22 | 1982-07-16 | Philips Nv | Werkwijze voor de vervaardiging van een optisch uitleesbare informatiedrager. |
| CA1164261A (en) * | 1981-04-21 | 1984-03-27 | Tsukasa Tada | PROCESS FOR FORMING RESIST PATTERNS BY DEVELOPING A POLYMER CONTAINING TRIFLUOROETHYL-.alpha.- CHLOROCRYLATE UNITS WITH SPECIFIC KETONE COMPOUNDS |
| US4410611A (en) * | 1981-08-31 | 1983-10-18 | General Motors Corporation | Hard and adherent layers from organic resin coatings |
| US4608281A (en) * | 1982-09-28 | 1986-08-26 | Exxon Research And Engineering Co. | Improvements in sensitivity of a positive polymer resist having a glass transition temperature through control of a molecular weight distribution and prebaked temperature |
| US4604305A (en) * | 1982-09-28 | 1986-08-05 | Exxon Research And Engineering Co. | Improvements in contrast of a positive polymer resist having a glass transition temperature through control of the molecular weight distribution and prebaked temperature |
| JPS59181536A (ja) * | 1983-03-31 | 1984-10-16 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
| US4540636A (en) * | 1983-12-27 | 1985-09-10 | General Motors Corporation | Metal bearing element with a score-resistant coating |
| JPH01177539A (ja) * | 1988-01-07 | 1989-07-13 | Matsushita Electron Corp | レジストの現像方法 |
| JPH0757867A (ja) * | 1993-07-19 | 1995-03-03 | Samsung Electron Co Ltd | 誘導加熱調理器 |
| JPH11289103A (ja) * | 1998-02-05 | 1999-10-19 | Canon Inc | 半導体装置および太陽電池モジュ―ル及びその解体方法 |
| US6436605B1 (en) | 1999-07-12 | 2002-08-20 | International Business Machines Corporation | Plasma resistant composition and use thereof |
| KR102699733B1 (ko) * | 2019-04-12 | 2024-08-27 | 인프리아 코포레이션 | 유기금속 포토레지스트 현상제 조성물 및 처리 방법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2892712A (en) * | 1954-04-23 | 1959-06-30 | Du Pont | Process for preparing relief images |
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| US3770433A (en) * | 1972-03-22 | 1973-11-06 | Bell Telephone Labor Inc | High sensitivity negative electron resist |
| US3779806A (en) * | 1972-03-24 | 1973-12-18 | Ibm | Electron beam sensitive polymer t-butyl methacrylate resist |
-
1974
- 1974-05-28 US US05/473,603 patent/US4078098A/en not_active Expired - Lifetime
-
1975
- 1975-03-25 FR FR7510345A patent/FR2273303B1/fr not_active Expired
- 1975-04-25 DE DE19752518479 patent/DE2518479A1/de active Pending
- 1975-04-30 GB GB1789975A patent/GB1459170A/en not_active Expired
- 1975-05-21 JP JP50059782A patent/JPS512430A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1459170A (en) | 1976-12-22 |
| US4078098A (en) | 1978-03-07 |
| DE2518479A1 (de) | 1975-12-11 |
| JPS512430A (en) | 1976-01-10 |
| FR2273303B1 (US07652168-20100126-C00068.png) | 1977-04-15 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |