FR2265809B1 - - Google Patents
Info
- Publication number
- FR2265809B1 FR2265809B1 FR7502848A FR7502848A FR2265809B1 FR 2265809 B1 FR2265809 B1 FR 2265809B1 FR 7502848 A FR7502848 A FR 7502848A FR 7502848 A FR7502848 A FR 7502848A FR 2265809 B1 FR2265809 B1 FR 2265809B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/454,058 US3996393A (en) | 1974-03-25 | 1974-03-25 | Positive polymeric electron beam resists of very great sensitivity |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2265809A1 FR2265809A1 (cg-RX-API-DMAC10.html) | 1975-10-24 |
| FR2265809B1 true FR2265809B1 (cg-RX-API-DMAC10.html) | 1978-03-10 |
Family
ID=23803126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7502848A Expired FR2265809B1 (cg-RX-API-DMAC10.html) | 1974-03-25 | 1975-01-24 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3996393A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5135863B2 (cg-RX-API-DMAC10.html) |
| DE (1) | DE2512745A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2265809B1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1500529A (cg-RX-API-DMAC10.html) |
| IT (1) | IT1031239B (cg-RX-API-DMAC10.html) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4103064A (en) * | 1976-01-09 | 1978-07-25 | Dios, Inc. | Microdevice substrate and method for making micropattern devices |
| JPS5350681A (en) * | 1976-10-19 | 1978-05-09 | Matsushita Electric Ind Co Ltd | Solvent for electron beam resist |
| FR2394833A1 (fr) * | 1977-06-17 | 1979-01-12 | Thomson Csf | Resine de masquage positive presentant une sensibilite amelioree a l'irradiation electronique, et methode de fabrication d'une telle resine |
| US4289845A (en) * | 1978-05-22 | 1981-09-15 | Bell Telephone Laboratories, Inc. | Fabrication based on radiation sensitive resists and related products |
| US4208211A (en) * | 1978-05-23 | 1980-06-17 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists and related products |
| JPS5511217A (en) * | 1978-07-10 | 1980-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Pattern forming method using radiation sensitive high polymer |
| JPS5828571B2 (ja) * | 1978-07-20 | 1983-06-16 | 沖電気工業株式会社 | 微細加工用レジスト形成方法 |
| US4262081A (en) * | 1979-11-21 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers |
| NL8101200A (nl) * | 1981-03-12 | 1982-10-01 | Philips Nv | Werkwijze voor het aanbrengen van een resistmateriaal op een drager en resist-materiaal. |
| ES525880A0 (es) * | 1982-09-28 | 1985-03-01 | Exxon Research Engineering Co | Un metodo de aumentar la sensibilidad de una capa protectora positiva de polimero |
| JPH0562431U (ja) * | 1992-01-30 | 1993-08-20 | 日本マタイ株式会社 | 荷物積載用パレット |
| US9002343B2 (en) * | 2007-08-10 | 2015-04-07 | International Business Machines Corporation | Disabling a mobile phone suspected of being a trigger for a bomb |
| US20100203450A1 (en) * | 2009-02-11 | 2010-08-12 | International Business Machines Corporation | Photoresist compositions and methods of use |
| US9625815B2 (en) * | 2013-09-27 | 2017-04-18 | Intel Corporation | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging |
| CN117215150A (zh) * | 2023-08-24 | 2023-12-12 | 道夫新材料(惠州)有限公司 | 电子束光刻胶及其制备方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| US3779806A (en) * | 1972-03-24 | 1973-12-18 | Ibm | Electron beam sensitive polymer t-butyl methacrylate resist |
| US3932352A (en) * | 1974-03-22 | 1976-01-13 | The United States Of America As Represented By The Secretary Of Agriculture | Photodegradable plastic composition containing a N-halo imide |
-
1974
- 1974-03-25 US US05/454,058 patent/US3996393A/en not_active Expired - Lifetime
-
1975
- 1975-01-24 FR FR7502848A patent/FR2265809B1/fr not_active Expired
- 1975-01-29 IT IT19691/75A patent/IT1031239B/it active
- 1975-02-07 JP JP50015525A patent/JPS5135863B2/ja not_active Expired
- 1975-02-19 GB GB6918/75A patent/GB1500529A/en not_active Expired
- 1975-03-22 DE DE19752512745 patent/DE2512745A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| GB1500529A (en) | 1978-02-08 |
| US3996393A (en) | 1976-12-07 |
| FR2265809A1 (cg-RX-API-DMAC10.html) | 1975-10-24 |
| IT1031239B (it) | 1979-04-30 |
| JPS5135863B2 (cg-RX-API-DMAC10.html) | 1976-10-05 |
| JPS50126424A (cg-RX-API-DMAC10.html) | 1975-10-04 |
| DE2512745A1 (de) | 1975-10-09 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |