FR2253843B3 - - Google Patents

Info

Publication number
FR2253843B3
FR2253843B3 FR7439599A FR7439599A FR2253843B3 FR 2253843 B3 FR2253843 B3 FR 2253843B3 FR 7439599 A FR7439599 A FR 7439599A FR 7439599 A FR7439599 A FR 7439599A FR 2253843 B3 FR2253843 B3 FR 2253843B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7439599A
Other versions
FR2253843A1 (fr
Inventor
Nathan Feldstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Surface Technology Corp
Surface Technology Inc
Original Assignee
Surface Technology Corp
Surface Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surface Technology Corp, Surface Technology Inc filed Critical Surface Technology Corp
Publication of FR2253843A1 publication Critical patent/FR2253843A1/fr
Application granted granted Critical
Publication of FR2253843B3 publication Critical patent/FR2253843B3/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073—Multistep pretreatment
    • C23C18/208—Multistep pretreatment with use of metal first

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
FR7439599A 1973-12-07 1974-12-04 Expired FR2253843B3 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42277473A 1973-12-07 1973-12-07
US05/521,901 US3993491A (en) 1973-12-07 1974-11-08 Electroless plating

Publications (2)

Publication Number Publication Date
FR2253843A1 FR2253843A1 (fr) 1975-07-04
FR2253843B3 true FR2253843B3 (fr) 1977-08-26

Family

ID=27025752

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7439599A Expired FR2253843B3 (fr) 1973-12-07 1974-12-04

Country Status (8)

Country Link
US (1) US3993491A (fr)
AU (1) AU7611474A (fr)
BR (1) BR7410198A (fr)
DE (1) DE2457829A1 (fr)
FR (1) FR2253843B3 (fr)
GB (1) GB1482708A (fr)
IT (1) IT1026792B (fr)
NL (1) NL7415956A (fr)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4327125A (en) * 1974-10-04 1982-04-27 Nathan Feldstein Colloidal compositions for electroless deposition comprising colloidal copper-stannic oxide product
US4265942A (en) * 1974-10-04 1981-05-05 Nathan Feldstein Non-noble metal colloidal compositions comprising reaction products for electroless deposition
US4151311A (en) * 1976-01-22 1979-04-24 Nathan Feldstein Post colloid addition of catalytic promoters to non noble metal principal catalytic compounds in electroless plating catalysts
US4150171A (en) * 1976-03-30 1979-04-17 Surface Technology, Inc. Electroless plating
ZA77897B (en) * 1976-04-13 1977-12-28 Kollmorgen Corp Liquid seeders and catalyzation processes for electroless metal deposition
US4322451A (en) * 1978-05-01 1982-03-30 Western Electric Co., Inc. Method of forming a colloidal wetting sensitizer
US4233344A (en) * 1978-07-20 1980-11-11 Learonal, Inc. Method of improving the adhesion of electroless metal deposits employing colloidal copper activator
US4301190A (en) * 1978-08-17 1981-11-17 Nathan Feldstein Pretreatment with complexing agent in process for electroless plating
US4261747A (en) * 1978-12-06 1981-04-14 Nathan Feldstein Dispersions for activating non-conductors for electroless plating
US4384893A (en) * 1979-09-14 1983-05-24 Western Electric Co., Inc. Method of forming a tin-cuprous colloidal wetting sensitizer
WO1983001794A1 (fr) * 1981-11-20 1983-05-26 Learonal Inc Colloide de cuivre et procede d'activation de surfaces isolantes pour effectuer ulterieurement une metallisation electrolytique
CH656401A5 (de) * 1983-07-21 1986-06-30 Suisse Horlogerie Rech Lab Verfahren zur stromlosen abscheidung von metallen.
US4952286A (en) * 1987-07-10 1990-08-28 Shipley Company Inc. Electroplating process
US5007990A (en) * 1987-07-10 1991-04-16 Shipley Company Inc. Electroplating process
US4895739A (en) * 1988-02-08 1990-01-23 Shipley Company Inc. Pretreatment for electroplating process
US5130168A (en) * 1988-11-22 1992-07-14 Technic, Inc. Electroless gold plating bath and method of using same
DE3840199C2 (de) * 1988-11-29 1994-12-01 Heraeus Noblelight Gmbh Verfahren zur Strukturierung von bei der stromlosen Metallisierung katalytisch aktiven Metallschichten mittels UV-Strahlung
US4919768A (en) * 1989-09-22 1990-04-24 Shipley Company Inc. Electroplating process
JP2768390B2 (ja) * 1990-12-11 1998-06-25 インターナショナル・ビジネス・マシーンズ・コーポレイション 無電解金属付着のために基体をコンディショニングする方法
GB0118870D0 (en) * 2001-08-02 2001-09-26 Shipley Co Llc A combined adhesion promotion and direct metallization process
US20030233960A1 (en) * 2002-06-23 2003-12-25 John Grunwald Method for electroless plating without precious metal sensitization
US20040175938A1 (en) * 2002-06-23 2004-09-09 John Grunwald Method for metalizing wafers
US6875260B2 (en) * 2002-12-10 2005-04-05 Enthone Inc. Copper activator solution and method for semiconductor seed layer enhancement
EP2244285A1 (fr) 2009-04-24 2010-10-27 ATOTECH Deutschland GmbH Procédé pour la formation de dépôts de soudure sur des substrats
EP2180770A1 (fr) 2008-10-21 2010-04-28 Atotech Deutschland Gmbh Procédé pour la formation de dépôts de soudure sur des substrats
EP2405469B1 (fr) 2010-07-05 2016-09-21 ATOTECH Deutschland GmbH Procédé pour la formation de dépôts d'alliage de soudure sur des substrats
EP2405468A1 (fr) 2010-07-05 2012-01-11 ATOTECH Deutschland GmbH Procédé pour la formation de dépôts de soudure sur des substrats
EP2506690A1 (fr) 2011-03-28 2012-10-03 Atotech Deutschland GmbH Procédé pour la formation de dépôts de soudure et des structures de bosses non fondantes sur des substrats
PT2601822T (pt) 2010-08-02 2019-10-28 Atotech Deutschland Gmbh Método para formar depósitos de solda e estruturas protuberantes não fundentes sobre substratos
EP2416634A1 (fr) 2010-08-02 2012-02-08 ATOTECH Deutschland GmbH Procédé pour la formation de dépôts de soudure sur des substrats
US9337363B2 (en) 2011-05-11 2016-05-10 International Business Machines Corporation Low resistance, low reflection, and low cost contact grids for photovoltaic cells
EP2709160B1 (fr) 2012-09-14 2016-03-30 ATOTECH Deutschland GmbH Procédé de métallisation de substrats de cellules solaires
CN105593405B (zh) * 2013-09-25 2018-12-21 德国艾托特克公司 在阻障层上沉积铜晶种层的方法和铜电镀浴

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2472393A (en) * 1944-09-25 1949-06-07 American Steel & Wire Co Process and bath for copper coating ferrous metal
US2519672A (en) * 1947-01-13 1950-08-22 Charles F Lawless Composition for bluing metal
US3011920A (en) * 1959-06-08 1961-12-05 Shipley Co Method of electroless deposition on a substrate and catalyst solution therefor
US3671291A (en) * 1969-06-02 1972-06-20 Ppg Industries Inc Electroless process for forming thin metal films
US3682671A (en) * 1970-02-05 1972-08-08 Kollmorgen Corp Novel precious metal sensitizing solutions
BE793769A (fr) * 1972-01-17 1973-05-02 Parker Ste Continentale Solution et procede pour former un depot de cuivre et d'etain sans utilisation de courant electrique

Also Published As

Publication number Publication date
IT1026792B (it) 1978-10-20
BR7410198A (pt) 1976-06-08
US3993491A (en) 1976-11-23
DE2457829A1 (de) 1975-06-12
AU7611474A (en) 1976-06-10
NL7415956A (nl) 1975-06-10
GB1482708A (en) 1977-08-10
FR2253843A1 (fr) 1975-07-04

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Legal Events

Date Code Title Description
ST Notification of lapse