US3671291A - Electroless process for forming thin metal films - Google Patents
Electroless process for forming thin metal films Download PDFInfo
- Publication number
- US3671291A US3671291A US829705A US3671291DA US3671291A US 3671291 A US3671291 A US 3671291A US 829705 A US829705 A US 829705A US 3671291D A US3671291D A US 3671291DA US 3671291 A US3671291 A US 3671291A
- Authority
- US
- United States
- Prior art keywords
- solution
- nickel
- metal
- films
- cobalt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title abstract description 65
- 239000002184 metal Substances 0.000 title abstract description 65
- 238000000034 method Methods 0.000 title abstract description 42
- 230000008569 process Effects 0.000 title abstract description 29
- 239000000243 solution Substances 0.000 abstract description 65
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 60
- 239000000758 substrate Substances 0.000 abstract description 40
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 34
- 229910052759 nickel Inorganic materials 0.000 abstract description 29
- 239000003638 chemical reducing agent Substances 0.000 abstract description 20
- 239000010941 cobalt Substances 0.000 abstract description 20
- 229910017052 cobalt Inorganic materials 0.000 abstract description 20
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 20
- 150000003839 salts Chemical class 0.000 abstract description 20
- 229910052742 iron Inorganic materials 0.000 abstract description 17
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052796 boron Inorganic materials 0.000 abstract description 16
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 abstract description 12
- 239000004327 boric acid Substances 0.000 abstract description 12
- 150000002739 metals Chemical class 0.000 abstract description 11
- 238000005507 spraying Methods 0.000 abstract description 8
- 229910052783 alkali metal Inorganic materials 0.000 abstract description 5
- 150000001340 alkali metals Chemical class 0.000 abstract description 5
- 239000012670 alkaline solution Substances 0.000 abstract description 4
- 230000000737 periodic effect Effects 0.000 abstract description 4
- 239000004033 plastic Substances 0.000 abstract description 4
- 230000002378 acidificating effect Effects 0.000 abstract description 3
- 239000012736 aqueous medium Substances 0.000 abstract description 3
- 239000003929 acidic solution Substances 0.000 abstract description 2
- 230000009467 reduction Effects 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 52
- 239000011521 glass Substances 0.000 description 20
- 229940124024 weight reducing agent Drugs 0.000 description 19
- 239000007921 spray Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000012266 salt solution Substances 0.000 description 9
- -1 that is Substances 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 230000003197 catalytic effect Effects 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 150000007522 mineralic acids Chemical class 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 5
- 239000000080 wetting agent Substances 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000007772 electroless plating Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 241001156002 Anthonomus pomorum Species 0.000 description 3
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000007859 condensation product Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 239000001119 stannous chloride Substances 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XRLUJVFOGKUSMQ-ZVGUSBNCSA-L (2r,3r)-2,3-dihydroxybutanedioate;nickel(2+) Chemical compound [Ni+2].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O XRLUJVFOGKUSMQ-ZVGUSBNCSA-L 0.000 description 1
- BHIJGQUZXXURRH-ODZAUARKSA-N (z)-but-2-enedioic acid;nickel Chemical compound [Ni].OC(=O)\C=C/C(O)=O BHIJGQUZXXURRH-ODZAUARKSA-N 0.000 description 1
- UPPLJLAHMKABPR-UHFFFAOYSA-H 2-hydroxypropane-1,2,3-tricarboxylate;nickel(2+) Chemical compound [Ni+2].[Ni+2].[Ni+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O UPPLJLAHMKABPR-UHFFFAOYSA-H 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 235000010469 Glycine max Nutrition 0.000 description 1
- 244000068988 Glycine max Species 0.000 description 1
- 239000005569 Iron sulphate Substances 0.000 description 1
- 239000012448 Lithium borohydride Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- VDTVZBCTOQDZSH-UHFFFAOYSA-N borane N-ethylethanamine Chemical compound B.CCNCC VDTVZBCTOQDZSH-UHFFFAOYSA-N 0.000 description 1
- WVMHLYQJPRXKLC-UHFFFAOYSA-N borane;n,n-dimethylmethanamine Chemical compound B.CN(C)C WVMHLYQJPRXKLC-UHFFFAOYSA-N 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 125000005619 boric acid group Chemical group 0.000 description 1
- VEWFZHAHZPVQES-UHFFFAOYSA-N boron;n,n-diethylethanamine Chemical compound [B].CCN(CC)CC VEWFZHAHZPVQES-UHFFFAOYSA-N 0.000 description 1
- NNTOJPXOCKCMKR-UHFFFAOYSA-N boron;pyridine Chemical compound [B].C1=CC=NC=C1 NNTOJPXOCKCMKR-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004653 carbonic acids Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- MPMSMUBQXQALQI-UHFFFAOYSA-N cobalt phthalocyanine Chemical compound [Co+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 MPMSMUBQXQALQI-UHFFFAOYSA-N 0.000 description 1
- YKHVABIDAYRQJF-UHFFFAOYSA-L cobalt(2+) 2-methylidenebutanedioate Chemical compound C(C(=C)CC(=O)[O-])(=O)[O-].[Co+2] YKHVABIDAYRQJF-UHFFFAOYSA-L 0.000 description 1
- SCNCIXKLOBXDQB-UHFFFAOYSA-K cobalt(3+);2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Co+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O SCNCIXKLOBXDQB-UHFFFAOYSA-K 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- BZRRQSJJPUGBAA-UHFFFAOYSA-L cobalt(ii) bromide Chemical compound Br[Co]Br BZRRQSJJPUGBAA-UHFFFAOYSA-L 0.000 description 1
- YCYBZKSMUPTWEE-UHFFFAOYSA-L cobalt(ii) fluoride Chemical compound F[Co]F YCYBZKSMUPTWEE-UHFFFAOYSA-L 0.000 description 1
- 229940097267 cobaltous chloride Drugs 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- UQGFMSUEHSUPRD-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound [Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 UQGFMSUEHSUPRD-UHFFFAOYSA-N 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical compound [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- UQPSGBZICXWIAG-UHFFFAOYSA-L nickel(2+);dibromide;trihydrate Chemical compound O.O.O.Br[Ni]Br UQPSGBZICXWIAG-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- BFSQJYRFLQUZKX-UHFFFAOYSA-L nickel(ii) iodide Chemical compound I[Ni]I BFSQJYRFLQUZKX-UHFFFAOYSA-L 0.000 description 1
- NAVSKFYJNZQECG-UHFFFAOYSA-N nickel;propanoic acid Chemical compound [Ni].CCC(O)=O NAVSKFYJNZQECG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- XWGJFPHUCFXLBL-UHFFFAOYSA-M rongalite Chemical compound [Na+].OCS([O-])=O XWGJFPHUCFXLBL-UHFFFAOYSA-M 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/10—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/52—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
Definitions
- the invention relates to a method of spraying two solutions, one, an acidic solution containing a metal salt and the other, an alkaline solution containing a boron reducing agent, onto a reactive substrate to form a metal film by reduction of the metal salt. More particularly, the invention relates to an electroless process for forming metal films of metals contained in Group Ib and Group VIII of the Periodic Table,
- the invention has been found to be particularly useful for forming transparent films of cobalt, nickel, iron, and the like on sensitized transparent substrates such as glass and plastic.
- Electroless plating of metals such as nickel, cobalt, iron, and the like on metallic substrates or on sensitized non-metallic substrates is an important process in the electro-chemieal industry.
- An electroless process generally involves an aqueous media having dissolved therein a metal salt and an appropriate reducing agent.
- a metallic article or a sensitized non-metallic article is immersed in an electroless plating bath whereupon a metal film is deposited upon the article by an autocatalytic mechanism.
- immersion processes are not especially adaptable to forming transparent films inasmuch as the rate of deposition is difficult to control and film non-uniformity results since a heavier coating is deposited upon that portion of the article which is the first to enter and last to leave the plating bath.
- Both opaque and transparent films may be produced by the method of this invention. Best uniformity of transparent films is achieved when the film is deposited to a thickness having light transmission of about 30% or less.
- the films produced by this invention are continuous and adherent to the substrate.
- Sheets of glass filmed with transparent metal films of this invention are useful as solar control windows, reflecting much of the solar radiation impinging thereon.
- Opaque metal films can be utilized on metal or other substrates as mirrors or to provide corrosion resistance.
- a solution containing a metal of Groups Ib and VIII of the Periodic Table consists generally of a metal salt of an inorganic or organic acid and a small amount of an organic or inorganic acid, preferably boric acid, to maintain a solution pH of less than 7.
- boric acid is to be included in the solution as well and is to be employed in an amount which is effective to promote film uniformity.
- the preferred metals are nickel, cobalt, and iron, although copper, lead, antimony, tin, bismuth, and noble metals such as palladium, platinum, osmium, gold, silver, and the like, and alloys of the above, may be utilized according to the practice of this invention.
- metal salts of inorganic and organic acids soluble in aqueous solutions may be utilized.
- Metal salts having only slight solubility in aqueous solutions may be utilized inasmuch as active concentrations of metal range from about 0.1% by weight to about 20% by weight of the solution.
- a preferred concentration is about 0.5% by Weight to about by weight of the metal ion per unit weight of solution.
- the valence state of the soluble metal ion is unimportant, for example, cobaltous or cobaltic salts are equally effective.
- Typical metal salts useful in this invention include: nickel chloride, nickel bromide, nickel iodide, nickel sulphate, cobalt bromide, cobalt chloride, cobalt fluoride, iron chloride, iron bromide, iron sulphate, and the like.
- halides especially chlorides, nitrates, and like salts of copper, lead, antimony, tin, bismuth, and the above-mentioned noble metals.
- Typical salts of organic acids useful in this invention include: nickel acetate, nickel propionate, nickel fluorborate, nickel citrate, nickel tartrate, nickel maleate, cobalt acetate, cobalt citrate, cobalt itaconate, and the like. Similar organic salts of a copper, lead, tin, antimony, bismuth, and the above-mentioned noble metals are also useful.
- the metal containing solution contains sufficient quantity of an acid to maintain a pH of less than 7.
- a pH range of 1 to 7 is effective, a preferred pH range is from about 4 to about 5.
- Numerous acids can be utilized to maintain an effective pH range, for example, inorganic acids such as hydrochloric, nitric, sulphuric, boric, and carbonic acids, and the like, may be utilized as well as organic acids such as acetic acid, propionic acid, citric acid, tartaric acid, and the like, may be utilized.
- inorganic acids such as hydrochloric, nitric, sulphuric, boric, and carbonic acids, and the like
- organic acids such as acetic acid, propionic acid, citric acid, tartaric acid, and the like, may be utilized.
- boric acid is preferred in maintaining a pH range of between 4 and 5.
- boric acid has been found to promote film uniformity and to reduce the tendency of the metal film to peel from the substrate during spraying. These features are especially desirable in the formation of transparent metal films.
- boric acid is essential in the metal containing solution even though additional acids may be utilized and to aid in pH control.
- the metal-containing solution may contain an appropriate wetting agent.
- Wetting agents which have been found particularly effective in a spray process for deposition of transparent films of nickel, cobalt, iron, and the like, are non-ionic and cationic wetting agents which are known not to precipitate heavy metals from solution.
- Wetting agents particularly useful for this purpose include:
- Cationic agents such as:
- quaternary ammonium salts for example tetramethyl ammonium chloride dipropyl dimethyl ammonium chloride
- alkylene oxide condensation products of organic amines for example wherein R is a fatty alkyl group preferably having about 12 to 18 carbon atoms and x and y represent whole numbers from 1 to about 20, typical products of this type being ethylene oxide condensation products of coco amines, soybean amines, and the like, having an average molecular Weight of about 200 to about 3000.
- Non-ionic agents such as:
- Alkylene oxide condensates of amides for example hydrogenated tallow amides having a molecular weight of about 200 to about 3-00, and oleyl amides wherein a typical structure is I where R, x and y have the same significance as set forth immediately hereinabove for organic amine condensates;
- wetting agents of the above types are useful in promoting film uniformity.
- alkylene oxide condensation products of organic amines which have been found to promote substantially mottle-free transparent films of nickel, cobalt, iron and the like formed by the spray process described herein.
- Coco amine-ethylene oxide condensates having a molecular weight of greater than about 300 have been found especially elfective for this purpose.
- a typical coco amine is Ethomeen C-15 of Armour and Company, described hereinafter in the examples.
- the reducing solution comprises an aqueous solution of a boron-containing reducing agent, said solution having a pH of 7 to 14, and preferably of about 8 to 10.
- the boron-containing reducing agent may be present in solution as about 0.01% by Weight to about 5% by weight of the solution. While boron-containing reducing agents are effective in the aforementioned range, a preferred concentration of 0.05% by weight to about 2% by weight is preferred. Exceptionally useful boron-containing reducing agents are the alkali metal borohydrides such as sodium borohydride, lithium borohydride, and potassium borohydride. Other boron-containing reducing agents, however, are effective although frequently unavailable in commercial quantities.
- Exemplary boron-containing reducing agents other than borohydrides are the boron-containing compounds listed in U.S. Patent 3,140,188 of Zirngiebl et al., incorporated herein by reference.
- Amine boranes such as diethylamine borane, trimethylamine borane, triethylamine borane, and pyridine borane may also be used.
- Other effective boron-containing compounds include substituted borohydrides such as sodium trimethoxy borohydride and the like.
- the reducing solution is preferably alkaline inasmuch as boron-containing reducing agents oxidize very rapidly in acid and neutral solutions.
- the alkalinity of the reducing solution should not be so great that the pH of the intermixed metal-containing solution and reducing solution is above 7. It is preferred that the pH of the intermixed solution, that is, the solution formed by the impingement of the two spray solutions at the surface of the object to be coated, be 7 or less.
- the metal-containing solution and reducing solution are each passed through separate spray nozzles so that the sprays intermix and contact the surface of the article to be coated.
- Single nozzle guns may also be used where the solutions intermix in the gun or outside the gun.
- the flow rates of each solution may be approximately equal or may vary greatly.
- the flow rates of the respective solutions are not critical, however, it is desirable to maintain a weight ratio of reducing agent to metal contained in the metalcontaining solution of about 10:1 to about 1:2000 parts per Weight reducing agent to parts per Weight of metal.
- the temperature of the article to be coated is not material although the temperature of the article should be uniform in order to promote film uniformity. The process is quite effective at room temperature, although a preferred temperature range is from 40 F. to about 200 F.
- the substrate must be receptive to metal deposition.
- a reactive metal substrate for example, in the formation of a transparent article, an appropriate substrate is a transparent glass article coated with a transparent metal film of copper, aluminum, tungsten, cobalt, platinum, silver, boron, thallium, vanadium, titanium nickel, gold, germanium, silicon, chromium, molybdenum, iron, tin, palladium, lead, indium, cadmium, zinc, and the like.
- These metals are known as catalytic metals for electroless deposition of films of cobalt, nickel, iron, and the like.
- a transparent copper film could be deposited on a transparent glass or plastic substrate by means of vacuum deposition or sputtering and thereafter sprayed according to the teaching of this invention with a transparent coating of nickel, cobalt, iron, or the like.
- a further method of preparing the substrate for electroless deposition according to this invention may be accomplished in accordance with the teaching of US. Patent 2,702,253 or US. Patent 3,011,920, the teachings therein being incorporated herein by reference.
- Example I A glass sheet was washed with a commercial detergent until the glass was completely and uniformly wetted by water. The sheet was rinsed with tap water and then rinsed with demineralized water.
- the glass surface was then contacted with a dilute solution of stannous chloride (about 0.1 percent by weight of SnCl).
- stannous chloride about 0.1 percent by weight of SnCl
- the glass was thoroughly rinsed with demineralized water and then contacted with a dilute solution of palladium chloride (about 0.025 percent by weight of PdClz). The glass was completely rinsed with demineralized water.
- the glass was contacted with two sprays, one of nickel solution, the other of reducing solution, to form a nickel film.
- the sprays intermingled at the glass surface.
- Each spray had a fiow rate which ranged from 50 to 500 ml./ min., however, the rates were maintained in a balanced condition.
- Ethomeen C-l5 (trademark of Armour and Company) is a cocoamine having an average molecular weight of 422 and the following generalized formula:
- R is derived from a cocoamine and x plus y equals 5.
- Example II A glass sheet was coated with cobalt in substantially the same manner as in Example I, being cleaned, sensitized, and super-sensitized in the same manner as Example I.
- the cobalt solution was indentical to Example I with 5 grams cobaltous chloride replacing the nickel chloride.
- the reducing solution had the same composition.
- the spray rates were also the same.
- a 12" x 12" glass sample was coated with cobalt metal.
- the film had a slight brownish tint but was uniformly transparent and had light transmission of percent after spraying for two minutes at a flow rate of about 60-70 milliliters/minute for each solution.
- a nickel film was formed having a transmission of 14 to 30 percent at a flow rate of 60 to 70 milliliters per minute after one minute.
- a non-uniform film having good adhesion was formed.
- Example IV To determine the elfectiveness of acids other than boric acid, an experiment was conducted where the following nickel containing solution was utilized:
- Example V When citric acid was substituted in the above experiment for sodium tartrate, a trace film was formed.
- the sodium hydrosulfite solutions were found to be unstable; stability was enhanced by addition of zinc sulfate and sodium tetraborate.
- a process for forming thin metallic films of metals of Group VIII and Group Ib of the Periodic Table on a catalytic sensitized substrate comprising contacting said substrate substantially simultaneously with a spray of a metal salt solution of the selected metal of Groups VIII and Ib having a pH of less than 7 and a spray of a reducing solution having a pH greater than 7:
- said metal salt solution comprising water, a metal salt of an organic or inorganic acid, and an effective amount of boric acid to provide an observably uniform metallic film on the substrate;
- said reducing solution comprising water and a boron-containing reducing agent.
- metal salt is selected from the class of salts of nickel, cobalt, and iron and mixtures thereof.
- a method of forming transparent metal films of nickel, cobalt, and iron on a glass substrate by (a) contacting said substrate with an aqueous stannous chloride sensitizing solution;
- said metal salt solution comprising salt of metals selected from the class consisting of nickel, cobalt, and iron, and mixtures thereof, and an effective amount of boric acid to provide an observably uniform metallic film on the substrate, and
- the metal salt solution contains from about 0.5 to about 10 percent by weight of metal ion based on the weight of the metal salt solution.
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Abstract
THE INVENTION DESCRIBED HEREIN RELATES TO AN ELECTROLESS PROCESS FOR FORMING THIN METAL FILMS, PARTICULARLY TRANSPARENT FILMS, ON A REACTIVE SUBSTRATE. IT PARTICULARLY RELATES TO A METHOD OF SPRAYING TWO SOLUTIONS, ONE, AN ACIDIC SOLUTION CONTAINING A METAL SALT AND THE OTHER, AN ALKALINE SOLUTION CONTAINING A BORON REDUCING AGENT, ONTO A REACTIVE SUBSTRATE TO FORM A METAL FILM BY REDUCTION OF THE METAL SALT. MORE PARTICULARLY, THE INVENTION RELATES TO AN ELECTROLESS PROCESS FOR FORMING METAL FILMS OF METALS CONTAINED IN GROUP IB AND GROUP VIII OF THE PERIODIC TABLE, ESPECIALLY IRON, COBALT, AND NICKEL, BY FORMING A SOLUTION OF SOLUBLE SALTS OF SAID METALS IN AN ACIDIC, AQUEOUS MEDIA, PREFERABLY INCLUDING BORIC ACID AND SPRAYING SAID SOLUTION ON A REACTIVE SUBSTRATE AT SUBSTANTIALLY THE SAME TIME THAT AN ALKALINE SOLUTION OF A BORON-CONTAINING REDUCING AGENT, ESPECIALLY ALKALI METAL BOROHYDRIDES, IS SPRAYED ON THE SUBSTRATE. THE INVENTION HAS BEEN FOUND TO BE PARTICULARLY USEFUL FOR FORMING TRANSPARENT FILMS OF COBALT, NICKEL, IRON, AND THE LIKE ON SENSITIZED TRANSPARENT SUBSTRATES SUCH AS GLASS AND PLASTIC.
Description
United States Patent fire 3,671,291 Patented June 20, 1972 3,671,291 ELECTROLESS PROCESS FOR FORMING THIN METAL FILMS Richard G. Miller, Pittsburgh, and Roy L. Cavltt, New Kensington, Pa., assignors to PPG Industries, Inc., Pittsburgh, Pa. No Drawing. Filed June 2, 1969, Ser. No. 829,705 Int. Cl. B44d 1/20, 1/092; C23c 3/02 US. Cl. 117-54 8 Clanns ABSTRACT OF THE DISCLOSURE The invention described herein relates to an electroless process for forming thin metal films, particularly transparent films, on a reactive substrate. It particularly relates to a method of spraying two solutions, one, an acidic solution containing a metal salt and the other, an alkaline solution containing a boron reducing agent, onto a reactive substrate to form a metal film by reduction of the metal salt. More particularly, the invention relates to an electroless process for forming metal films of metals contained in Group Ib and Group VIII of the Periodic Table,
especially iron, cobalt, and nickel, by forming a solution.
of soluble salts of said metals in an acidic, aqueous media, preferably including boric acid and spraying said solution on a reactive substrate at substantially the same time that an alkaline solution of a boron-containing reducing agent, especially alkali metal borohydrides, is sprayed on the substrate. The invention has been found to be particularly useful for forming transparent films of cobalt, nickel, iron, and the like on sensitized transparent substrates such as glass and plastic.
BACKGROUND Techniques of electroless plating of metal films on various types of substrates are well known in the art. Electroless plating of metals such as nickel, cobalt, iron, and the like on metallic substrates or on sensitized non-metallic substrates is an important process in the electro-chemieal industry. An electroless process generally involves an aqueous media having dissolved therein a metal salt and an appropriate reducing agent. A metallic article or a sensitized non-metallic article is immersed in an electroless plating bath whereupon a metal film is deposited upon the article by an autocatalytic mechanism.
Although the electroless process is an old and established one, improvements are constantly being sought. For example, Brenner and Riddell discovered in 1944 that nickel could be auto-catalytically deposited upon metallic substrates from a nickel salt solution containing sodium hypophosphite. US. Patents 2,532,283 and 2,532,284 were issued to Brenner and Riddell upon their discoveries. The Brenner process, however, proceeds satisfactorily only at elevated temperatures which is disadvantageous for certain substrates such as the thermoplastic organic polymeric materials. Recent improvements in electroless immersion plating involve the use of boron-containing reducing agents which are efiective at room temperature. U.S. Patent 3,140,188 and US. Patent 3,045,334 are representative of improved electroless plating processes of this type.
Although immersion plating of the so-called catalytic metals, that is, iron, platinum, silver, nickel, gold, cobalt, palladium, and copper, on sensitized non-metallic materials, as, for example, materials sensitized in accordance with the method described in U.S. Patent 2,702,253, are quite efiicient for certain purposes, such processes do have disadvantages. An immersion process is not especially adaptable to coating extremely large articles. Also, the composition of the plating bath changes during use, thereby requiring frequent chemical analysis and addition of materials to maintain a constant bath composition. If a constant bath composition is not maintained, the metal films formed therein are non-uniform.
Furthermore, immersion processes are not especially adaptable to forming transparent films inasmuch as the rate of deposition is difficult to control and film non-uniformity results since a heavier coating is deposited upon that portion of the article which is the first to enter and last to leave the plating bath.
Some of the above-mentioned objections can be overcome with a spraying process. One type of spraying process is described in US. Patent 2,956,900 of Carlson et al. wherein two separate solutions are sprayed upon substrates to form nickel coatings. This process uses sodium hydrosulfite and sodium hypophosphite as reducing agents. One disadvantage of the process is the sulphurous fumes which are emitted when hydrosulfite reducing agents are utilized. Another disadvantage is the inability of the process to form uniform, transparent films upon a sensitized glass or plastic substrate.
Although considerable elfort has been expended in the development of an electroless process for deposition of metal coatings, there is no described process which is entirely satisfactory for the formation of uniform, thin films, especially transparent films, upon reactive substrates.
INVENTION It has now been discovered that uniform, thin films can be developed by spraying upon a reactive substrate, an acidic metal salt solution, preferably containing boric acid, and an alkaline reducing solution containing a boroncontaining reducing agent, preferably an alkali metal borohydride. This process has been found to be largely independent of temperature and is effective for coating any of the so-called catalytic metal substrates or non-catalytic substrates sensitized in a manner to promote deposition of continuous, adherent metal films. Catalytic substrates and processes for rendering inert substrates catalytic are well known.
Both opaque and transparent films may be produced by the method of this invention. Best uniformity of transparent films is achieved when the film is deposited to a thickness having light transmission of about 30% or less. The films produced by this invention are continuous and adherent to the substrate.
Sheets of glass filmed with transparent metal films of this invention, especially nickel, cobalt and iron films, are useful as solar control windows, reflecting much of the solar radiation impinging thereon. Opaque metal films can be utilized on metal or other substrates as mirrors or to provide corrosion resistance.
METAL SALT SOLUTION A solution containing a metal of Groups Ib and VIII of the Periodic Table consists generally of a metal salt of an inorganic or organic acid and a small amount of an organic or inorganic acid, preferably boric acid, to maintain a solution pH of less than 7. When an acid other than boric acid is used to adjust solution pH, boric acid is to be included in the solution as well and is to be employed in an amount which is effective to promote film uniformity. The preferred metals are nickel, cobalt, and iron, although copper, lead, antimony, tin, bismuth, and noble metals such as palladium, platinum, osmium, gold, silver, and the like, and alloys of the above, may be utilized according to the practice of this invention.
As mentioned above, various metal salts of inorganic and organic acids soluble in aqueous solutions may be utilized. Metal salts having only slight solubility in aqueous solutions may be utilized inasmuch as active concentrations of metal range from about 0.1% by weight to about 20% by weight of the solution. A preferred concentration is about 0.5% by Weight to about by weight of the metal ion per unit weight of solution. Furthermore, the valence state of the soluble metal ion is unimportant, for example, cobaltous or cobaltic salts are equally effective.
Typical metal salts useful in this invention include: nickel chloride, nickel bromide, nickel iodide, nickel sulphate, cobalt bromide, cobalt chloride, cobalt fluoride, iron chloride, iron bromide, iron sulphate, and the like. Also useful are the halides, especially chlorides, nitrates, and like salts of copper, lead, antimony, tin, bismuth, and the above-mentioned noble metals.
Typical salts of organic acids useful in this invention include: nickel acetate, nickel propionate, nickel fluorborate, nickel citrate, nickel tartrate, nickel maleate, cobalt acetate, cobalt citrate, cobalt itaconate, and the like. Similar organic salts of a copper, lead, tin, antimony, bismuth, and the above-mentioned noble metals are also useful.
As mentioned hereinabove, the metal containing solution contains sufficient quantity of an acid to maintain a pH of less than 7. Although a pH range of 1 to 7 is effective, a preferred pH range is from about 4 to about 5. Numerous acids, of course, can be utilized to maintain an effective pH range, for example, inorganic acids such as hydrochloric, nitric, sulphuric, boric, and carbonic acids, and the like, may be utilized as well as organic acids such as acetic acid, propionic acid, citric acid, tartaric acid, and the like, may be utilized. Although the above acids are effective in maintaining a proper pH range, it has been found that boric acid is preferred in maintaining a pH range of between 4 and 5. Moreover, boric acid has been found to promote film uniformity and to reduce the tendency of the metal film to peel from the substrate during spraying. These features are especially desirable in the formation of transparent metal films. In order to obtain improved film uniformity boric acid is essential in the metal containing solution even though additional acids may be utilized and to aid in pH control.
The metal-containing solution may contain an appropriate wetting agent. Wetting agents which have been found particularly effective in a spray process for deposition of transparent films of nickel, cobalt, iron, and the like, are non-ionic and cationic wetting agents which are known not to precipitate heavy metals from solution. Wetting agents particularly useful for this purpose include:
Cationic agents such as:
( 1) quaternary ammonium salts, for example tetramethyl ammonium chloride dipropyl dimethyl ammonium chloride (2) alkylene oxide condensation products of organic amines, for example wherein R is a fatty alkyl group preferably having about 12 to 18 carbon atoms and x and y represent whole numbers from 1 to about 20, typical products of this type being ethylene oxide condensation products of coco amines, soybean amines, and the like, having an average molecular Weight of about 200 to about 3000.
Non-ionic agents such as:
( 1) Alkylene oxide condensates of amides, for example hydrogenated tallow amides having a molecular weight of about 200 to about 3-00, and oleyl amides wherein a typical structure is I where R, x and y have the same significance as set forth immediately hereinabove for organic amine condensates;
(2) Alkylene oxide condensates of fatty acids.
Wetting agents of the above types are useful in promoting film uniformity. Of particular utility are the alkylene oxide condensation products of organic amines which have been found to promote substantially mottle-free transparent films of nickel, cobalt, iron and the like formed by the spray process described herein. Coco amine-ethylene oxide condensates having a molecular weight of greater than about 300 have been found especially elfective for this purpose. A typical coco amine is Ethomeen C-15 of Armour and Company, described hereinafter in the examples.
REDUCING SOLUTION The reducing solution comprises an aqueous solution of a boron-containing reducing agent, said solution having a pH of 7 to 14, and preferably of about 8 to 10. The boron-containing reducing agent may be present in solution as about 0.01% by Weight to about 5% by weight of the solution. While boron-containing reducing agents are effective in the aforementioned range, a preferred concentration of 0.05% by weight to about 2% by weight is preferred. Exceptionally useful boron-containing reducing agents are the alkali metal borohydrides such as sodium borohydride, lithium borohydride, and potassium borohydride. Other boron-containing reducing agents, however, are effective although frequently unavailable in commercial quantities. Exemplary boron-containing reducing agents other than borohydrides are the boron-containing compounds listed in U.S. Patent 3,140,188 of Zirngiebl et al., incorporated herein by reference. Amine boranes such as diethylamine borane, trimethylamine borane, triethylamine borane, and pyridine borane may also be used. Other effective boron-containing compounds include substituted borohydrides such as sodium trimethoxy borohydride and the like.
The reducing solution is preferably alkaline inasmuch as boron-containing reducing agents oxidize very rapidly in acid and neutral solutions. The alkalinity of the reducing solution should not be so great that the pH of the intermixed metal-containing solution and reducing solution is above 7. It is preferred that the pH of the intermixed solution, that is, the solution formed by the impingement of the two spray solutions at the surface of the object to be coated, be 7 or less.
PROCESS The metal-containing solution and reducing solution are each passed through separate spray nozzles so that the sprays intermix and contact the surface of the article to be coated. Single nozzle guns may also be used where the solutions intermix in the gun or outside the gun. The flow rates of each solution may be approximately equal or may vary greatly. The flow rates of the respective solutions are not critical, however, it is desirable to maintain a weight ratio of reducing agent to metal contained in the metalcontaining solution of about 10:1 to about 1:2000 parts per Weight reducing agent to parts per Weight of metal. The temperature of the article to be coated is not material although the temperature of the article should be uniform in order to promote film uniformity. The process is quite effective at room temperature, although a preferred temperature range is from 40 F. to about 200 F.
The substrate must be receptive to metal deposition. For the deposition of films of nickel, cobalt, iron, and the like, it is preferred to have a reactive metal substrate, for example, in the formation of a transparent article, an appropriate substrate is a transparent glass article coated with a transparent metal film of copper, aluminum, tungsten, cobalt, platinum, silver, boron, thallium, vanadium, titanium nickel, gold, germanium, silicon, chromium, molybdenum, iron, tin, palladium, lead, indium, cadmium, zinc, and the like. These metals are known as catalytic metals for electroless deposition of films of cobalt, nickel, iron, and the like. For example, a transparent copper film could be deposited on a transparent glass or plastic substrate by means of vacuum deposition or sputtering and thereafter sprayed according to the teaching of this invention with a transparent coating of nickel, cobalt, iron, or the like.
A further method of preparing the substrate for electroless deposition according to this invention may be accomplished in accordance with the teaching of US. Patent 2,702,253 or US. Patent 3,011,920, the teachings therein being incorporated herein by reference.
Example I A glass sheet was washed with a commercial detergent until the glass was completely and uniformly wetted by water. The sheet was rinsed with tap water and then rinsed with demineralized water.
The glass surface was then contacted with a dilute solution of stannous chloride (about 0.1 percent by weight of SnCl The glass was thoroughly rinsed with demineralized water and then contacted with a dilute solution of palladium chloride (about 0.025 percent by weight of PdClz). The glass was completely rinsed with demineralized water.
The glass was contacted with two sprays, one of nickel solution, the other of reducing solution, to form a nickel film. The sprays intermingled at the glass surface. Each spray had a fiow rate which ranged from 50 to 500 ml./ min., however, the rates were maintained in a balanced condition.
Nickel solution composition:
NiCl -2H O5.0 grams Boric acid-2.5 grams Water-1 liter Ethomeen C-15--2 drops Ethomeen C-l5 (trademark of Armour and Company) is a cocoamine having an average molecular weight of 422 and the following generalized formula:
wherein R is derived from a cocoamine and x plus y equals 5.
Reducing solution composition:
Sodium borohydride0.5 grams Waterl liter Ethomeen C15-1 drop Adjusted pH to 9-10 with NaOH The nickel coated glass has a light transmission of about 12 percent after being contacted for about 1 min. at a flow rate of about 70 milliliters/min. Film formation occurred in about one to two minues and the film was clear, uniform and substantially mettle-free.
Example II A glass sheet was coated with cobalt in substantially the same manner as in Example I, being cleaned, sensitized, and super-sensitized in the same manner as Example I.
The cobalt solution was indentical to Example I with 5 grams cobaltous chloride replacing the nickel chloride. The reducing solution had the same composition. The spray rates were also the same.
A 12" x 12" glass sample was coated with cobalt metal. The film had a slight brownish tint but was uniformly transparent and had light transmission of percent after spraying for two minutes at a flow rate of about 60-70 milliliters/minute for each solution.
Example III NiCl -2H O-7.5 grams Water-l liter pH4.0-5 .0 (no adjustment necessary) Reducing solution composition:
Sodium borohydride0.5 gram Waterl liter pH adjusted to 9-10 with aqueous NaOH solution of about 0.1 N
A nickel film was formed having a transmission of 14 to 30 percent at a flow rate of 60 to 70 milliliters per minute after one minute. A non-uniform film having good adhesion was formed.
When nickel sulfate was substituted for nickel chloride in the above examples, comparable films are obtained.
When potassium borohydride was substituted in the above examples, comparable results are obtained.
Example IV To determine the elfectiveness of acids other than boric acid, an experiment was conducted where the following nickel containing solution was utilized:
NiSO 25 grams Sodium tartrate25 grams Water-1 liter pH adjusted to 5 with NaOH solution A standard sodium borohydride reducing solution of the type described in Example I was utilized; only a trace of nickel film was formed on the glass.
In another variation of this experiment, 10 grams of sodium hypophosphite was added to the nickel solution but no film was formed.
Example V When citric acid was substituted in the above experiment for sodium tartrate, a trace film was formed.
Example VI Test tube experiments were conducted to determine the effectiveness of the following compounds for reducing nickel ions:
Hydrazine tartrate Hydrazine sulfate Hydroxyl ammonium sulfate Sodium hydrosulfite The only reducing agent which reduced nickel ion to nickel metal was sodium hydrosulfite.
The following solutions were admixed on a glass surface to determine the type of nickel film which might result:
Nickel solution composition:
NiSO 20 grams Citric acid-10 grams Sodium hypophosphite-10 grams NaOH8 grams Water1 liter Reducing solution composition:
10 grams per liter of water of sodium hydrosulfite (sodium dithionite) The above solutions gave no film when simultaneously sprayed upon cleaned, sensitized, supersensitized glass.
The sodium hydrosulfite solutions were found to be unstable; stability was enhanced by addition of zinc sulfate and sodium tetraborate.
Sodium formaldehyde sulfoxalate grams per liter) was found to reduce nickel salts, but did not give a nickel film when used in a spray formulation.
Although specific embodiments of the instant inventions have been set forth hereinabove, the invention is not intended to be limited thereo, but to include all of the modifications and variations falling within the scope of the following claims.
We claim:
1. A process for forming thin metallic films of metals of Group VIII and Group Ib of the Periodic Table on a catalytic sensitized substrate comprising contacting said substrate substantially simultaneously with a spray of a metal salt solution of the selected metal of Groups VIII and Ib having a pH of less than 7 and a spray of a reducing solution having a pH greater than 7:
(a) said metal salt solution comprising water, a metal salt of an organic or inorganic acid, and an effective amount of boric acid to provide an observably uniform metallic film on the substrate; and
'(b) said reducing solution comprising water and a boron-containing reducing agent.
2. The method of claim 1 wherein the metal salt is selected from the class of salts of nickel, cobalt, and iron and mixtures thereof.
3. The method of claim 2 wherein the metal salt is a nickel salt.
4. The method of claim 1 wherein the boron-containing reducing agent is a alkali metal borohydride.
5. The method of claim 1 wherein the metal films and the substrate are transparent.
6. The method of claim 1 wherein the process is carried out at a temperature of about 40 F. to 200 F.
7. A method of forming transparent metal films of nickel, cobalt, and iron on a glass substrate by (a) contacting said substrate with an aqueous stannous chloride sensitizing solution;
(b) contacting said sensitized substrate with an aqueous. super-sensitizing solution of a noble metal selected from the group consisting of salts of palladium and platinum;
(c) contacting said super-sensitized substrate substantially simultaneously with a spray of an aqueous metal salt solution having a pH of less than 7 and a spray of an aqueous reducing solution having a pH greater than 7 said solution intermixing at the glass surface to form a coating solution having a pH of less than 7;
(1) said metal salt solution comprising salt of metals selected from the class consisting of nickel, cobalt, and iron, and mixtures thereof, and an effective amount of boric acid to provide an observably uniform metallic film on the substrate, and
(2) said reducing solution containing an alkali borohydride.
8. The method of claim 7 wherein the metal salt solution contains from about 0.5 to about 10 percent by weight of metal ion based on the weight of the metal salt solution.
References Cited UNITED STATES PATENTS 2,956,900 10/1960 Carlson et al. 11747 A 3,235,473 2/1966 Le Duc 11747 A 3,295,999 l/1967 Klein et al. 117-47 A 3,370,974 2/1968 Hepfer 1061 X ALFRED L. LEAVITT, Primary Examiner I. A. BELL, Assistant Examiner US. Cl. X.R.
117--47 A, 105, 105.5, 124 C, B, R; l06--1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82970569A | 1969-06-02 | 1969-06-02 |
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|---|---|
| US3671291A true US3671291A (en) | 1972-06-20 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US829705A Expired - Lifetime US3671291A (en) | 1969-06-02 | 1969-06-02 | Electroless process for forming thin metal films |
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| US (1) | US3671291A (en) |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3967010A (en) * | 1973-11-30 | 1976-06-29 | Kuraray Co., Ltd. | Process for the production of metal-plated staple fibers |
| US3993491A (en) * | 1973-12-07 | 1976-11-23 | Surface Technology, Inc. | Electroless plating |
| US4021314A (en) * | 1976-03-25 | 1977-05-03 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
| US4082898A (en) * | 1975-06-23 | 1978-04-04 | Ppg Industries, Inc. | Electroless deposition of electrically nonconductive copper-boron coatings on nonmetallic substrates |
| FR2413194A1 (en) * | 1977-12-28 | 1979-07-27 | Cbs Sony Records Inc | METHOD FOR MANUFACTURING RECORDING DISCS INCLUDING AN ENGRAVING |
| US4170461A (en) * | 1976-12-29 | 1979-10-09 | Ppg Industries, Inc. | Heat treatment of electrolessly deposited cuprous oxide coating |
| US4308319A (en) * | 1978-07-03 | 1981-12-29 | Ppg Industries, Inc. | Pyrolytic deposition of a cobalt/tin oxide spinel film |
| US4315055A (en) * | 1976-12-29 | 1982-02-09 | Ppg Industries, Inc. | Direct electroless deposition of cuprous oxide films |
| US4400436A (en) * | 1980-06-30 | 1983-08-23 | Ppg Industries, Inc. | Direct electroless deposition of cuprous oxide films |
| US4419390A (en) * | 1977-06-06 | 1983-12-06 | Nathan Feldstein | Method for rendering non-platable semiconductor substrates platable |
| US4439465A (en) * | 1982-02-19 | 1984-03-27 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of making a light weight battery plaque |
| US4481249A (en) * | 1981-02-21 | 1984-11-06 | Bayer Aktiengesellschaft | Metallized carbon fibres and composite materials containing these fibres |
| US4485153A (en) * | 1982-12-15 | 1984-11-27 | Uop Inc. | Conductive pigment-coated surfaces |
| US4574094A (en) * | 1983-06-09 | 1986-03-04 | Kollmorgen Technologies Corporation | Metallization of ceramics |
| US4666744A (en) * | 1984-05-10 | 1987-05-19 | Kollmorgen Technologies Corporation | Process for avoiding blister formation in electroless metallization of ceramic substrates |
| US4701352A (en) * | 1984-05-10 | 1987-10-20 | Kollmorgen Corporation | Surface preparation of ceramic substrates for metallization |
| US4830668A (en) * | 1986-11-24 | 1989-05-16 | W. C. Heraeus Gmbh | Acidic bath for electroless deposition of gold films |
| US4983428A (en) * | 1988-06-09 | 1991-01-08 | United Technologies Corporation | Ethylenethiourea wear resistant electroless nickel-boron coating compositions |
| US6168825B1 (en) | 1998-11-02 | 2001-01-02 | O'brien Dudley | Process for producing thin transparent gold coatings |
| US6251482B1 (en) * | 1994-05-12 | 2001-06-26 | Glaverbel | Forming a silver coating on a vitreous substrate |
| US6749307B2 (en) | 1994-05-12 | 2004-06-15 | Glaverbel | Silver coated mirror |
-
1969
- 1969-06-02 US US829705A patent/US3671291A/en not_active Expired - Lifetime
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3967010A (en) * | 1973-11-30 | 1976-06-29 | Kuraray Co., Ltd. | Process for the production of metal-plated staple fibers |
| US3993491A (en) * | 1973-12-07 | 1976-11-23 | Surface Technology, Inc. | Electroless plating |
| US4082898A (en) * | 1975-06-23 | 1978-04-04 | Ppg Industries, Inc. | Electroless deposition of electrically nonconductive copper-boron coatings on nonmetallic substrates |
| US4158716A (en) * | 1975-06-23 | 1979-06-19 | Ppg Industries, Inc. | Electrically nonconductive copper-boron coatings on nonmetallic substrates |
| US4021314A (en) * | 1976-03-25 | 1977-05-03 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
| US4097286A (en) * | 1976-03-25 | 1978-06-27 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
| US4315055A (en) * | 1976-12-29 | 1982-02-09 | Ppg Industries, Inc. | Direct electroless deposition of cuprous oxide films |
| US4170461A (en) * | 1976-12-29 | 1979-10-09 | Ppg Industries, Inc. | Heat treatment of electrolessly deposited cuprous oxide coating |
| US4419390A (en) * | 1977-06-06 | 1983-12-06 | Nathan Feldstein | Method for rendering non-platable semiconductor substrates platable |
| FR2413194A1 (en) * | 1977-12-28 | 1979-07-27 | Cbs Sony Records Inc | METHOD FOR MANUFACTURING RECORDING DISCS INCLUDING AN ENGRAVING |
| US4308319A (en) * | 1978-07-03 | 1981-12-29 | Ppg Industries, Inc. | Pyrolytic deposition of a cobalt/tin oxide spinel film |
| US4400436A (en) * | 1980-06-30 | 1983-08-23 | Ppg Industries, Inc. | Direct electroless deposition of cuprous oxide films |
| US4481249A (en) * | 1981-02-21 | 1984-11-06 | Bayer Aktiengesellschaft | Metallized carbon fibres and composite materials containing these fibres |
| US4439465A (en) * | 1982-02-19 | 1984-03-27 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of making a light weight battery plaque |
| US4485153A (en) * | 1982-12-15 | 1984-11-27 | Uop Inc. | Conductive pigment-coated surfaces |
| US4574094A (en) * | 1983-06-09 | 1986-03-04 | Kollmorgen Technologies Corporation | Metallization of ceramics |
| US4666744A (en) * | 1984-05-10 | 1987-05-19 | Kollmorgen Technologies Corporation | Process for avoiding blister formation in electroless metallization of ceramic substrates |
| US4701352A (en) * | 1984-05-10 | 1987-10-20 | Kollmorgen Corporation | Surface preparation of ceramic substrates for metallization |
| US4830668A (en) * | 1986-11-24 | 1989-05-16 | W. C. Heraeus Gmbh | Acidic bath for electroless deposition of gold films |
| US4983428A (en) * | 1988-06-09 | 1991-01-08 | United Technologies Corporation | Ethylenethiourea wear resistant electroless nickel-boron coating compositions |
| US6251482B1 (en) * | 1994-05-12 | 2001-06-26 | Glaverbel | Forming a silver coating on a vitreous substrate |
| US6565217B2 (en) | 1994-05-12 | 2003-05-20 | Glaverbel | Silver coated mirror |
| US6749307B2 (en) | 1994-05-12 | 2004-06-15 | Glaverbel | Silver coated mirror |
| US20040223238A1 (en) * | 1994-05-12 | 2004-11-11 | Pierre Laroche | Forming a silver coating on a vitreous substrate |
| US6942351B2 (en) | 1994-05-12 | 2005-09-13 | Glaverbel | Forming a silver coating on a vitreous substrate |
| US6168825B1 (en) | 1998-11-02 | 2001-01-02 | O'brien Dudley | Process for producing thin transparent gold coatings |
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