FR2250139A1 - - Google Patents

Info

Publication number
FR2250139A1
FR2250139A1 FR7436260A FR7436260A FR2250139A1 FR 2250139 A1 FR2250139 A1 FR 2250139A1 FR 7436260 A FR7436260 A FR 7436260A FR 7436260 A FR7436260 A FR 7436260A FR 2250139 A1 FR2250139 A1 FR 2250139A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7436260A
Other languages
French (fr)
Other versions
FR2250139B1 (zh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of FR2250139A1 publication Critical patent/FR2250139A1/fr
Application granted granted Critical
Publication of FR2250139B1 publication Critical patent/FR2250139B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
FR7436260A 1973-11-05 1974-10-30 Expired FR2250139B1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41293073A 1973-11-05 1973-11-05
US41293373A 1973-11-05 1973-11-05

Publications (2)

Publication Number Publication Date
FR2250139A1 true FR2250139A1 (zh) 1975-05-30
FR2250139B1 FR2250139B1 (zh) 1980-06-27

Family

ID=27021973

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7436260A Expired FR2250139B1 (zh) 1973-11-05 1974-10-30

Country Status (4)

Country Link
JP (1) JPS576573B2 (zh)
DE (1) DE2446930A1 (zh)
FR (1) FR2250139B1 (zh)
GB (1) GB1487936A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013066A1 (en) * 1978-10-30 1980-07-09 Calgon Corporation Polymers with improved solvent holdout in electroconductive paper and electroconductive recording paper and electroconductive coating colour formulations containing them
EP0240726A2 (en) * 1986-03-05 1987-10-14 Daikin Industries, Limited Resist material

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7906932A (nl) * 1979-09-18 1981-03-20 Philips Nv Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.
IL141803A0 (en) 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
CA2381128A1 (en) * 2002-04-09 2003-10-09 Quantiscript Inc. Plasma polymerized electron beam resist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013066A1 (en) * 1978-10-30 1980-07-09 Calgon Corporation Polymers with improved solvent holdout in electroconductive paper and electroconductive recording paper and electroconductive coating colour formulations containing them
EP0240726A2 (en) * 1986-03-05 1987-10-14 Daikin Industries, Limited Resist material
EP0240726A3 (en) * 1986-03-05 1987-12-09 Daikin Industries, Limited Resist material

Also Published As

Publication number Publication date
JPS576573B2 (zh) 1982-02-05
JPS5073705A (zh) 1975-06-18
DE2446930A1 (de) 1975-05-07
GB1487936A (en) 1977-10-05
FR2250139B1 (zh) 1980-06-27

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