FR2205684B1 - - Google Patents

Info

Publication number
FR2205684B1
FR2205684B1 FR7338972A FR7338972A FR2205684B1 FR 2205684 B1 FR2205684 B1 FR 2205684B1 FR 7338972 A FR7338972 A FR 7338972A FR 7338972 A FR7338972 A FR 7338972A FR 2205684 B1 FR2205684 B1 FR 2205684B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7338972A
Other languages
French (fr)
Other versions
FR2205684A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US303072A external-priority patent/US3891438A/en
Priority claimed from US303071A external-priority patent/US3891439A/en
Priority claimed from US05/302,994 external-priority patent/US4147545A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of FR2205684A1 publication Critical patent/FR2205684A1/fr
Application granted granted Critical
Publication of FR2205684B1 publication Critical patent/FR2205684B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7338972A 1972-11-02 1973-10-31 Developer compsn for exposed diazo-sensitised coatings - aqueous solution of water soluble lithium salt of organic acid, and/or an amphoteric surfactant Granted FR2205684A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US303072A US3891438A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US303071A US3891439A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US05/302,994 US4147545A (en) 1972-11-02 1972-11-02 Photolithographic developing composition with organic lithium compound

Publications (2)

Publication Number Publication Date
FR2205684A1 FR2205684A1 (en) 1974-05-31
FR2205684B1 true FR2205684B1 (xx) 1976-06-18

Family

ID=27404911

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7338972A Granted FR2205684A1 (en) 1972-11-02 1973-10-31 Developer compsn for exposed diazo-sensitised coatings - aqueous solution of water soluble lithium salt of organic acid, and/or an amphoteric surfactant

Country Status (6)

Country Link
JP (1) JPS5034442B2 (xx)
AU (1) AU462966B2 (xx)
DE (1) DE2353992C2 (xx)
FR (1) FR2205684A1 (xx)
IT (1) IT997722B (xx)
NL (1) NL173564C (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
JPH0820738B2 (ja) * 1986-11-21 1996-03-04 オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
JPS63170646A (ja) * 1987-01-08 1988-07-14 Konica Corp 現像性等が改良される感光性平版印刷版から印刷版の作製方法
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
JP2591643B2 (ja) * 1988-03-03 1997-03-19 コニカ株式会社 0−キノンジアジド化合物を含有する感光材料の現像液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606642A (xx) * 1960-07-29
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof

Also Published As

Publication number Publication date
NL173564B (nl) 1983-09-01
IT997722B (it) 1975-12-30
NL173564C (nl) 1984-02-01
FR2205684A1 (en) 1974-05-31
NL7315060A (xx) 1974-05-06
DE2353992A1 (de) 1974-05-16
JPS5034442B2 (xx) 1975-11-08
DE2353992C2 (de) 1982-12-02
AU462966B2 (en) 1975-07-10
AU6203273A (en) 1975-05-01
JPS4994402A (xx) 1974-09-07

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Legal Events

Date Code Title Description
ST Notification of lapse