FR2197187B1 - - Google Patents
Info
- Publication number
- FR2197187B1 FR2197187B1 FR7327023A FR7327023A FR2197187B1 FR 2197187 B1 FR2197187 B1 FR 2197187B1 FR 7327023 A FR7327023 A FR 7327023A FR 7327023 A FR7327023 A FR 7327023A FR 2197187 B1 FR2197187 B1 FR 2197187B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7402208A FR2258651A2 (en) | 1972-07-27 | 1974-01-23 | Pretreating polyester support for photosensitive transfer layer - with compsn contg halogenated fatty acid, crosslinking agent, and water soluble polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2236941A DE2236941C3 (de) | 1972-07-27 | 1972-07-27 | Lichtempfindliches Aufzeichnungsmaterial |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2197187A1 FR2197187A1 (US06168776-20010102-C00041.png) | 1974-03-22 |
| FR2197187B1 true FR2197187B1 (US06168776-20010102-C00041.png) | 1977-05-13 |
Family
ID=5851911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7327023A Expired FR2197187B1 (US06168776-20010102-C00041.png) | 1972-07-27 | 1973-07-24 |
Country Status (12)
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1581435A (en) * | 1976-05-07 | 1980-12-17 | Letraset International Ltd | Production of dry transfer materials |
| JPS53119025A (en) * | 1977-03-26 | 1978-10-18 | Sumitomo Chemical Co | Light forming material |
| US4216019A (en) * | 1977-07-21 | 1980-08-05 | Kenneth James Reed | Photographically produced stencils |
| NO157971C (no) * | 1977-09-12 | 1988-06-22 | Standex Int Corp | Fremgangsmaate for frembringelse av relieffmoenstre paa arbeidsoverflater. |
| JPS5511266A (en) * | 1978-07-12 | 1980-01-26 | Sumitomo Chem Co Ltd | Production of photo molding material for making stencil |
| DE3023201A1 (de) * | 1980-06-21 | 1982-01-07 | Hoechst Ag, 6000 Frankfurt | Positiv arbeitendes strahlungsempfindliches gemisch |
| JPS58190952A (ja) * | 1982-04-30 | 1983-11-08 | Fuji Photo Film Co Ltd | 感光性印刷版の現像液 |
| US4504566A (en) * | 1982-11-01 | 1985-03-12 | E. I. Du Pont De Nemours And Company | Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers |
| JPS5997140A (ja) * | 1982-11-26 | 1984-06-04 | Fuji Photo Film Co Ltd | カラ−プル−フイングシ−トの製法 |
| WO1989005475A1 (en) * | 1987-12-10 | 1989-06-15 | Macdermid, Incorporated | Image-reversible dry-film photoresists |
| US4985337A (en) * | 1988-11-15 | 1991-01-15 | Konica Corporation | Image forming method and element, in which the element contains a release layer and a photosensitive o-quinone diaziode layer |
| US5348833A (en) * | 1990-03-05 | 1994-09-20 | Hoechst Aktiengesellschaft | Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester |
| JP3710717B2 (ja) * | 2001-03-06 | 2005-10-26 | 東京応化工業株式会社 | 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法 |
| JP4213366B2 (ja) | 2001-06-12 | 2009-01-21 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜レジストパターンの形成方法 |
| US6517988B1 (en) * | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
| TW200739265A (en) * | 2005-12-06 | 2007-10-16 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition and method of forming photoresist pattern using the same |
| KR20120104450A (ko) * | 2011-03-08 | 2012-09-21 | (주)엘지하우시스 | 웨이퍼 가공 필름용 점착제 조성물 |
| US11822242B2 (en) | 2019-11-14 | 2023-11-21 | Merck Patent Gmbh | DNQ-type photoresist composition including alkali-soluble acrylic resins |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4910841B1 (US06168776-20010102-C00041.png) * | 1965-12-18 | 1974-03-13 | ||
| GB1136544A (en) * | 1966-02-28 | 1968-12-11 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
| US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
| US3551154A (en) * | 1966-12-28 | 1970-12-29 | Ferrania Spa | Light sensitive article comprising a quinone diazide and polymeric binder |
| US3634082A (en) * | 1967-07-07 | 1972-01-11 | Shipley Co | Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether |
| JPS49441B1 (US06168776-20010102-C00041.png) * | 1968-08-14 | 1974-01-08 | ||
| US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| BE755709A (fr) * | 1969-10-29 | 1971-02-15 | Shipley Co | Procede d'application d'une reserve photographique sur un support et produit obtenu |
| US3660097A (en) * | 1969-11-28 | 1972-05-02 | Polychrome Corp | Diazo-polyurethane light-sensitive compositions |
| DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
| FR2095515A5 (US06168776-20010102-C00041.png) * | 1970-06-02 | 1972-02-11 | Agfa Gevaert Nv | |
| US3782939A (en) * | 1972-02-09 | 1974-01-01 | Mining And Mfg Co | Dry positive-acting photoresist |
-
1972
- 1972-07-27 DE DE2236941A patent/DE2236941C3/de not_active Expired
-
1973
- 1973-07-17 NL NL7309940A patent/NL7309940A/xx not_active Application Discontinuation
- 1973-07-20 SE SE7310146A patent/SE377198B/xx unknown
- 1973-07-24 BE BE133820A patent/BE802733A/xx not_active IP Right Cessation
- 1973-07-24 CH CH1079173A patent/CH572633A5/xx not_active IP Right Cessation
- 1973-07-24 AT AT652173A patent/AT331273B/de not_active IP Right Cessation
- 1973-07-24 FR FR7327023A patent/FR2197187B1/fr not_active Expired
- 1973-07-25 IT IT51637/73A patent/IT990007B/it active
- 1973-07-25 GB GB3537273A patent/GB1437017A/en not_active Expired
- 1973-07-25 CA CA177,342A patent/CA1006036A/en not_active Expired
- 1973-07-26 US US05/382,864 patent/US4093464A/en not_active Expired - Lifetime
- 1973-07-27 JP JP8480873A patent/JPS5635857B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| ATA652173A (de) | 1975-11-15 |
| DE2236941B2 (de) | 1981-07-09 |
| NL7309940A (US06168776-20010102-C00041.png) | 1974-01-29 |
| JPS5635857B2 (US06168776-20010102-C00041.png) | 1981-08-20 |
| JPS4946734A (US06168776-20010102-C00041.png) | 1974-05-04 |
| DE2236941C3 (de) | 1982-03-25 |
| AT331273B (de) | 1976-08-10 |
| GB1437017A (en) | 1976-05-26 |
| BE802733A (fr) | 1974-01-24 |
| CH572633A5 (US06168776-20010102-C00041.png) | 1976-02-13 |
| FR2197187A1 (US06168776-20010102-C00041.png) | 1974-03-22 |
| DE2236941A1 (de) | 1974-02-07 |
| SE377198B (US06168776-20010102-C00041.png) | 1975-06-23 |
| CA1006036A (en) | 1977-03-01 |
| IT990007B (it) | 1975-06-20 |
| US4093464A (en) | 1978-06-06 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |