AT331273B - Lichtempfindliches schichtubertragungsmaterial - Google Patents

Lichtempfindliches schichtubertragungsmaterial

Info

Publication number
AT331273B
AT331273B AT652173A AT652173A AT331273B AT 331273 B AT331273 B AT 331273B AT 652173 A AT652173 A AT 652173A AT 652173 A AT652173 A AT 652173A AT 331273 B AT331273 B AT 331273B
Authority
AT
Austria
Prior art keywords
light
transfer material
sensitive layer
layer transfer
sensitive
Prior art date
Application number
AT652173A
Other languages
English (en)
Other versions
ATA652173A (de
Inventor
H Ruckert
B Wildenhain
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ATA652173A publication Critical patent/ATA652173A/de
Application granted granted Critical
Publication of AT331273B publication Critical patent/AT331273B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT652173A 1972-07-27 1973-07-24 Lichtempfindliches schichtubertragungsmaterial AT331273B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2236941A DE2236941C3 (de) 1972-07-27 1972-07-27 Lichtempfindliches Aufzeichnungsmaterial

Publications (2)

Publication Number Publication Date
ATA652173A ATA652173A (de) 1975-11-15
AT331273B true AT331273B (de) 1976-08-10

Family

ID=5851911

Family Applications (1)

Application Number Title Priority Date Filing Date
AT652173A AT331273B (de) 1972-07-27 1973-07-24 Lichtempfindliches schichtubertragungsmaterial

Country Status (12)

Country Link
US (1) US4093464A (de)
JP (1) JPS5635857B2 (de)
AT (1) AT331273B (de)
BE (1) BE802733A (de)
CA (1) CA1006036A (de)
CH (1) CH572633A5 (de)
DE (1) DE2236941C3 (de)
FR (1) FR2197187B1 (de)
GB (1) GB1437017A (de)
IT (1) IT990007B (de)
NL (1) NL7309940A (de)
SE (1) SE377198B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1581435A (en) * 1976-05-07 1980-12-17 Letraset International Ltd Production of dry transfer materials
JPS53119025A (en) * 1977-03-26 1978-10-18 Sumitomo Chemical Co Light forming material
US4216019A (en) * 1977-07-21 1980-08-05 Kenneth James Reed Photographically produced stencils
NO157971C (no) * 1977-09-12 1988-06-22 Standex Int Corp Fremgangsmaate for frembringelse av relieffmoenstre paa arbeidsoverflater.
JPS5511266A (en) * 1978-07-12 1980-01-26 Sumitomo Chem Co Ltd Production of photo molding material for making stencil
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
JPS5997140A (ja) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd カラ−プル−フイングシ−トの製法
JPH02502312A (ja) * 1987-12-10 1990-07-26 マクダーミツド　インコーポレーテツド 像反転性乾燥フィルムホトレジスト
US4985337A (en) * 1988-11-15 1991-01-15 Konica Corporation Image forming method and element, in which the element contains a release layer and a photosensitive o-quinone diaziode layer
US5348833A (en) * 1990-03-05 1994-09-20 Hoechst Aktiengesellschaft Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester
JP3710717B2 (ja) * 2001-03-06 2005-10-26 東京応化工業株式会社 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Ａｚエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法
US6517988B1 (en) * 2001-07-12 2003-02-11 Kodak Polychrome Graphics Llc Radiation-sensitive, positive working coating composition based on carboxylic copolymers
TW200739265A (en) * 2005-12-06 2007-10-16 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method of forming photoresist pattern using the same
KR20120104450A (ko) * 2011-03-08 2012-09-21 (주)엘지하우시스 웨이퍼 가공 필름용 점착제 조성물
WO2021094423A1 (en) 2019-11-14 2021-05-20 Merck Patent Gmbh Dnq-type photoresist composition including alkali-soluble acrylic resins

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910841B1 (de) * 1965-12-18 1974-03-13
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
US3634082A (en) * 1967-07-07 1972-01-11 Shipley Co Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether
JPS49441B1 (de) * 1968-08-14 1974-01-08
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
DE2106574A1 (de) * 1970-03-03 1971-09-23 Shpley Co Inc Lichtempfindliches Laminat
FR2095515A5 (de) * 1970-06-02 1972-02-11 Agfa Gevaert Nv
US3782939A (en) * 1972-02-09 1974-01-01 Mining And Mfg Co Dry positive-acting photoresist

Also Published As

Publication number Publication date
FR2197187A1 (de) 1974-03-22
DE2236941C3 (de) 1982-03-25
ATA652173A (de) 1975-11-15
DE2236941B2 (de) 1981-07-09
FR2197187B1 (de) 1977-05-13
JPS5635857B2 (de) 1981-08-20
US4093464A (en) 1978-06-06
GB1437017A (en) 1976-05-26
CH572633A5 (de) 1976-02-13
BE802733A (fr) 1974-01-24
DE2236941A1 (de) 1974-02-07
JPS4946734A (de) 1974-05-04
NL7309940A (de) 1974-01-29
SE377198B (de) 1975-06-23
CA1006036A (en) 1977-03-01
IT990007B (it) 1975-06-20

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee