CA1006036A - Light-sensitive layer transfer material - Google Patents
Light-sensitive layer transfer materialInfo
- Publication number
- CA1006036A CA1006036A CA177,342A CA177342A CA1006036A CA 1006036 A CA1006036 A CA 1006036A CA 177342 A CA177342 A CA 177342A CA 1006036 A CA1006036 A CA 1006036A
- Authority
- CA
- Canada
- Prior art keywords
- light
- transfer material
- sensitive layer
- layer transfer
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2236941A DE2236941C3 (de) | 1972-07-27 | 1972-07-27 | Lichtempfindliches Aufzeichnungsmaterial |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1006036A true CA1006036A (en) | 1977-03-01 |
Family
ID=5851911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA177,342A Expired CA1006036A (en) | 1972-07-27 | 1973-07-25 | Light-sensitive layer transfer material |
Country Status (12)
Country | Link |
---|---|
US (1) | US4093464A (de) |
JP (1) | JPS5635857B2 (de) |
AT (1) | AT331273B (de) |
BE (1) | BE802733A (de) |
CA (1) | CA1006036A (de) |
CH (1) | CH572633A5 (de) |
DE (1) | DE2236941C3 (de) |
FR (1) | FR2197187B1 (de) |
GB (1) | GB1437017A (de) |
IT (1) | IT990007B (de) |
NL (1) | NL7309940A (de) |
SE (1) | SE377198B (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1581435A (en) * | 1976-05-07 | 1980-12-17 | Letraset International Ltd | Production of dry transfer materials |
JPS53119025A (en) * | 1977-03-26 | 1978-10-18 | Sumitomo Chemical Co | Light forming material |
US4216019A (en) * | 1977-07-21 | 1980-08-05 | Kenneth James Reed | Photographically produced stencils |
NO157971C (no) * | 1977-09-12 | 1988-06-22 | Standex Int Corp | Fremgangsmaate for frembringelse av relieffmoenstre paa arbeidsoverflater. |
JPS5511266A (en) * | 1978-07-12 | 1980-01-26 | Sumitomo Chem Co Ltd | Production of photo molding material for making stencil |
DE3023201A1 (de) * | 1980-06-21 | 1982-01-07 | Hoechst Ag, 6000 Frankfurt | Positiv arbeitendes strahlungsempfindliches gemisch |
JPS58190952A (ja) * | 1982-04-30 | 1983-11-08 | Fuji Photo Film Co Ltd | 感光性印刷版の現像液 |
US4504566A (en) * | 1982-11-01 | 1985-03-12 | E. I. Du Pont De Nemours And Company | Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers |
JPS5997140A (ja) * | 1982-11-26 | 1984-06-04 | Fuji Photo Film Co Ltd | カラ−プル−フイングシ−トの製法 |
JPH02502312A (ja) * | 1987-12-10 | 1990-07-26 | マクダーミツド インコーポレーテツド | 像反転性乾燥フィルムホトレジスト |
US4985337A (en) * | 1988-11-15 | 1991-01-15 | Konica Corporation | Image forming method and element, in which the element contains a release layer and a photosensitive o-quinone diaziode layer |
US5348833A (en) * | 1990-03-05 | 1994-09-20 | Hoechst Aktiengesellschaft | Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester |
JP3710717B2 (ja) * | 2001-03-06 | 2005-10-26 | 東京応化工業株式会社 | 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法 |
JP4213366B2 (ja) | 2001-06-12 | 2009-01-21 | Azエレクトロニックマテリアルズ株式会社 | 厚膜レジストパターンの形成方法 |
US6517988B1 (en) * | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
TW200739265A (en) * | 2005-12-06 | 2007-10-16 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition and method of forming photoresist pattern using the same |
KR20120104450A (ko) * | 2011-03-08 | 2012-09-21 | (주)엘지하우시스 | 웨이퍼 가공 필름용 점착제 조성물 |
TW202124471A (zh) | 2019-11-14 | 2021-07-01 | 德商馬克專利公司 | 含鹼可溶之丙烯酸系樹脂的重氮萘醌(dnq)型光阻組合物 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910841B1 (de) * | 1965-12-18 | 1974-03-13 | ||
GB1136544A (en) * | 1966-02-28 | 1968-12-11 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
US3551154A (en) * | 1966-12-28 | 1970-12-29 | Ferrania Spa | Light sensitive article comprising a quinone diazide and polymeric binder |
US3634082A (en) * | 1967-07-07 | 1972-01-11 | Shipley Co | Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether |
JPS49441B1 (de) * | 1968-08-14 | 1974-01-08 | ||
US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
BE755709A (fr) * | 1969-10-29 | 1971-02-15 | Shipley Co | Procede d'application d'une reserve photographique sur un support et produit obtenu |
US3660097A (en) * | 1969-11-28 | 1972-05-02 | Polychrome Corp | Diazo-polyurethane light-sensitive compositions |
DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
FR2095515A5 (de) * | 1970-06-02 | 1972-02-11 | Agfa Gevaert Nv | |
US3782939A (en) * | 1972-02-09 | 1974-01-01 | Mining And Mfg Co | Dry positive-acting photoresist |
-
1972
- 1972-07-27 DE DE2236941A patent/DE2236941C3/de not_active Expired
-
1973
- 1973-07-17 NL NL7309940A patent/NL7309940A/xx not_active Application Discontinuation
- 1973-07-20 SE SE7310146A patent/SE377198B/xx unknown
- 1973-07-24 CH CH1079173A patent/CH572633A5/xx not_active IP Right Cessation
- 1973-07-24 AT AT652173A patent/AT331273B/de not_active IP Right Cessation
- 1973-07-24 FR FR7327023A patent/FR2197187B1/fr not_active Expired
- 1973-07-24 BE BE133820A patent/BE802733A/xx not_active IP Right Cessation
- 1973-07-25 CA CA177,342A patent/CA1006036A/en not_active Expired
- 1973-07-25 IT IT51637/73A patent/IT990007B/it active
- 1973-07-25 GB GB3537273A patent/GB1437017A/en not_active Expired
- 1973-07-26 US US05/382,864 patent/US4093464A/en not_active Expired - Lifetime
- 1973-07-27 JP JP8480873A patent/JPS5635857B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CH572633A5 (de) | 1976-02-13 |
FR2197187B1 (de) | 1977-05-13 |
FR2197187A1 (de) | 1974-03-22 |
SE377198B (de) | 1975-06-23 |
DE2236941B2 (de) | 1981-07-09 |
BE802733A (fr) | 1974-01-24 |
DE2236941A1 (de) | 1974-02-07 |
DE2236941C3 (de) | 1982-03-25 |
US4093464A (en) | 1978-06-06 |
NL7309940A (de) | 1974-01-29 |
ATA652173A (de) | 1975-11-15 |
GB1437017A (en) | 1976-05-26 |
IT990007B (it) | 1975-06-20 |
JPS5635857B2 (de) | 1981-08-20 |
JPS4946734A (de) | 1974-05-04 |
AT331273B (de) | 1976-08-10 |
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