FR2188193A1 - - Google Patents

Info

Publication number
FR2188193A1
FR2188193A1 FR7320573A FR7320573A FR2188193A1 FR 2188193 A1 FR2188193 A1 FR 2188193A1 FR 7320573 A FR7320573 A FR 7320573A FR 7320573 A FR7320573 A FR 7320573A FR 2188193 A1 FR2188193 A1 FR 2188193A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7320573A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of FR2188193A1 publication Critical patent/FR2188193A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7320573A 1972-06-12 1973-06-06 Withdrawn FR2188193A1 (ro)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26198272A 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
FR2188193A1 true FR2188193A1 (ro) 1974-01-18

Family

ID=22995688

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7320573A Withdrawn FR2188193A1 (ro) 1972-06-12 1973-06-06

Country Status (6)

Country Link
JP (1) JPS5114042B2 (ro)
BE (1) BE800708A (ro)
DE (1) DE2329208A1 (ro)
FR (1) FR2188193A1 (ro)
GB (1) GB1440244A (ro)
NL (1) NL7307936A (ro)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0301101A1 (en) * 1987-02-02 1989-02-01 Nippon Paint Co., Ltd. Positive photosensitive resin composition
EP0302941A1 (en) * 1987-02-02 1989-02-15 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
EP0430302A2 (en) * 1989-12-01 1991-06-05 Tosoh Corporation Positive photosensitive compositions for forming lenses

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2403054C2 (de) * 1972-07-27 1983-01-13 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57173941A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Formation of positive type photo resist pattern
CN1208686C (zh) 1999-10-07 2005-06-29 Az电子材料（日本）株式会社 辐射敏感性组合物
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Ａｚエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0301101A1 (en) * 1987-02-02 1989-02-01 Nippon Paint Co., Ltd. Positive photosensitive resin composition
EP0302941A1 (en) * 1987-02-02 1989-02-15 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
EP0301101A4 (en) * 1987-02-02 1990-02-22 Nippon Paint Co Ltd POSITIVE PHOTO-SENSITIVE RESIN PREPARATION.
EP0302941A4 (en) * 1987-02-02 1990-02-22 Nippon Paint Co Ltd POSITIVE PHOTO-SENSITIVE RESIN PREPARATION AND METHOD FOR PRODUCING THE SAME.
EP0430302A2 (en) * 1989-12-01 1991-06-05 Tosoh Corporation Positive photosensitive compositions for forming lenses
EP0430302A3 (en) * 1989-12-01 1991-12-18 Tosoh Corporation Positive photosensitive compositions for forming lenses

Also Published As

Publication number Publication date
NL7307936A (ro) 1973-12-14
DE2329208A1 (de) 1974-01-03
GB1440244A (en) 1976-06-23
BE800708A (fr) 1973-10-01
JPS4957055A (ro) 1974-06-03
JPS5114042B2 (ro) 1976-05-06

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Legal Events

Date Code Title Description
ST Notification of lapse