FR2183978B3 - - Google Patents
Info
- Publication number
- FR2183978B3 FR2183978B3 FR7316647A FR7316647A FR2183978B3 FR 2183978 B3 FR2183978 B3 FR 2183978B3 FR 7316647 A FR7316647 A FR 7316647A FR 7316647 A FR7316647 A FR 7316647A FR 2183978 B3 FR2183978 B3 FR 2183978B3
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH691072A CH551498A (de) | 1972-05-09 | 1972-05-09 | Anordnung zur aufstaeubung von stoffen auf unterlagen mittels einer elektrischen niederspannungsentladung. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2183978A1 FR2183978A1 (en) | 1973-12-21 |
FR2183978B3 true FR2183978B3 (de) | 1976-04-23 |
Family
ID=4316966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7316647A Granted FR2183978A1 (en) | 1972-05-09 | 1973-05-09 | Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH551498A (de) |
DE (1) | DE2321665A1 (de) |
FR (1) | FR2183978A1 (de) |
NL (1) | NL7207901A (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2800852C2 (de) * | 1978-01-10 | 1983-07-14 | Jurij Akimovič Moskva Dmitriev | Einrichtung zum Ionenplasma-Beschichten |
DE2830134C2 (de) | 1978-07-08 | 1983-12-08 | Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle | Verfahren zum Ablagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück |
DE2857102C2 (de) * | 1978-07-08 | 1983-12-01 | Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle | Vorrichtung zum Eindiffundieren und Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück |
EP0090067B2 (de) * | 1982-03-31 | 1991-03-20 | Ibm Deutschland Gmbh | Reaktor für das reaktive Ionenätzen und Ätzverfahren |
EP0173583B1 (de) * | 1984-08-31 | 1990-12-19 | Anelva Corporation | Entladungsvorrichtung |
DE3615361C2 (de) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Vorrichtung zur Oberflächenbehandlung von Werkstücken |
IL127236A0 (en) * | 1997-11-26 | 1999-09-22 | Vapor Technologies Inc | Apparatus for sputtering or arc evaporation |
US9793098B2 (en) | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9412569B2 (en) | 2012-09-14 | 2016-08-09 | Vapor Technologies, Inc. | Remote arc discharge plasma assisted processes |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
ES2563862T3 (es) * | 2013-03-15 | 2016-03-16 | Vapor Technologies, Inc. | Depósito en fase de vapor de recubrimiento por inmersión en un plasma de arco a baja presión y tratamiento iónico |
-
1972
- 1972-05-09 CH CH691072A patent/CH551498A/de not_active IP Right Cessation
- 1972-06-09 NL NL7207901A patent/NL7207901A/xx unknown
-
1973
- 1973-04-28 DE DE19732321665 patent/DE2321665A1/de active Pending
- 1973-05-09 FR FR7316647A patent/FR2183978A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2183978A1 (en) | 1973-12-21 |
DE2321665A1 (de) | 1973-11-22 |
NL7207901A (de) | 1973-11-13 |
CH551498A (de) | 1974-07-15 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |