FR2176471A1 - Treating thin magnetic film supports - by copper electroplating, for memory elements - Google Patents
Treating thin magnetic film supports - by copper electroplating, for memory elementsInfo
- Publication number
- FR2176471A1 FR2176471A1 FR7209612A FR7209612A FR2176471A1 FR 2176471 A1 FR2176471 A1 FR 2176471A1 FR 7209612 A FR7209612 A FR 7209612A FR 7209612 A FR7209612 A FR 7209612A FR 2176471 A1 FR2176471 A1 FR 2176471A1
- Authority
- FR
- France
- Prior art keywords
- magnetic film
- memory elements
- copper electroplating
- thin magnetic
- film supports
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/06—Thin magnetic films, e.g. of one-domain structure characterised by the coupling or physical contact with connecting or interacting conductors
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Thin Magnetic Films (AREA)
Abstract
The electrolyte contg. is not >250 g/l CuSO45H2O and >=5(25) g/l HF (density 1.13) at constant temp. and at a constant current density depending on temp. and Hf conc. gives a Cu layer of thickness >=2.5 mu m and grain-thickness 1-3 mu m so that the magnetic film thereafter deposited has uniaxial anisotropy increased coercive field.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7209612A FR2176471A1 (en) | 1972-03-20 | 1972-03-20 | Treating thin magnetic film supports - by copper electroplating, for memory elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7209612A FR2176471A1 (en) | 1972-03-20 | 1972-03-20 | Treating thin magnetic film supports - by copper electroplating, for memory elements |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2176471A1 true FR2176471A1 (en) | 1973-11-02 |
FR2176471B1 FR2176471B1 (en) | 1974-10-18 |
Family
ID=9095468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7209612A Granted FR2176471A1 (en) | 1972-03-20 | 1972-03-20 | Treating thin magnetic film supports - by copper electroplating, for memory elements |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2176471A1 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB950401A (en) * | 1961-12-12 | 1964-02-26 | Ncr Co | The process of fabricating magnetic circuit devices |
CH507569A (en) * | 1967-08-09 | 1971-05-15 | Honeywell Inc | Magnetic memory element and method for its manufacture |
-
1972
- 1972-03-20 FR FR7209612A patent/FR2176471A1/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB950401A (en) * | 1961-12-12 | 1964-02-26 | Ncr Co | The process of fabricating magnetic circuit devices |
CH507569A (en) * | 1967-08-09 | 1971-05-15 | Honeywell Inc | Magnetic memory element and method for its manufacture |
Also Published As
Publication number | Publication date |
---|---|
FR2176471B1 (en) | 1974-10-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CL | Concession to grant licenses | ||
CL | Concession to grant licenses |