FR2171326A1 - Photo-cross linking polymers - from vinyl hydrocarbons maleic anhydride and acrylic cpds - Google Patents
Photo-cross linking polymers - from vinyl hydrocarbons maleic anhydride and acrylic cpdsInfo
- Publication number
- FR2171326A1 FR2171326A1 FR7304543A FR7304543A FR2171326A1 FR 2171326 A1 FR2171326 A1 FR 2171326A1 FR 7304543 A FR7304543 A FR 7304543A FR 7304543 A FR7304543 A FR 7304543A FR 2171326 A1 FR2171326 A1 FR 2171326A1
- Authority
- FR
- France
- Prior art keywords
- photo
- cpds
- acrylic
- maleic anhydride
- cross linking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004132 cross linking Methods 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 title abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title 1
- 229930195733 hydrocarbon Natural products 0.000 title 1
- 150000002430 hydrocarbons Chemical class 0.000 title 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 title 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 title 1
- 229920002554 vinyl polymer Polymers 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22492972A | 1972-02-09 | 1972-02-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2171326A1 true FR2171326A1 (en) | 1973-09-21 |
| FR2171326B1 FR2171326B1 (enrdf_load_stackoverflow) | 1976-06-11 |
Family
ID=22842819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7304543A Granted FR2171326A1 (en) | 1972-02-09 | 1973-02-08 | Photo-cross linking polymers - from vinyl hydrocarbons maleic anhydride and acrylic cpds |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4889290A (enrdf_load_stackoverflow) |
| DE (1) | DE2306531A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2171326A1 (enrdf_load_stackoverflow) |
| IT (1) | IT977259B (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0106351A3 (en) * | 1982-10-18 | 1984-09-12 | Mitsubishi Chemical Industries Limited | Photopolymerizable photosensitive composition |
| EP0197325A3 (en) * | 1985-04-06 | 1987-01-14 | Dynamit Nobel Aktiengesellschaft | Water-soluble polymers having quaternary ammonium or pyridinium groups and alkoxysilyl groups, process for preparing them and their use |
| WO1996034316A1 (en) * | 1995-04-27 | 1996-10-31 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| EP0839838A3 (en) * | 1996-10-31 | 1998-11-25 | Dow Corning Corporation | Polybutylene containing reactive unsaturated functionality |
| US5849462A (en) * | 1995-04-27 | 1998-12-15 | Minnesota Mining & Manufacturing Company | Negative-acting no-process printing plates |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0782237B2 (ja) * | 1986-09-12 | 1995-09-06 | 宇部興産株式会社 | 光硬化性組成物 |
| JP2880166B2 (ja) * | 1988-02-26 | 1999-04-05 | 上野化学工業株式会社 | 感光性樹脂組成物 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1153833A (en) * | 1966-03-14 | 1969-05-29 | Du Pont | Addition Polymerizable Compounds |
-
1973
- 1973-02-08 IT IT4813773A patent/IT977259B/it active
- 1973-02-08 JP JP1605773A patent/JPS4889290A/ja active Pending
- 1973-02-08 DE DE19732306531 patent/DE2306531A1/de active Pending
- 1973-02-08 FR FR7304543A patent/FR2171326A1/fr active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1153833A (en) * | 1966-03-14 | 1969-05-29 | Du Pont | Addition Polymerizable Compounds |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0106351A3 (en) * | 1982-10-18 | 1984-09-12 | Mitsubishi Chemical Industries Limited | Photopolymerizable photosensitive composition |
| EP0197325A3 (en) * | 1985-04-06 | 1987-01-14 | Dynamit Nobel Aktiengesellschaft | Water-soluble polymers having quaternary ammonium or pyridinium groups and alkoxysilyl groups, process for preparing them and their use |
| WO1996034316A1 (en) * | 1995-04-27 | 1996-10-31 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US5849462A (en) * | 1995-04-27 | 1998-12-15 | Minnesota Mining & Manufacturing Company | Negative-acting no-process printing plates |
| US5910395A (en) * | 1995-04-27 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US5925497A (en) * | 1995-04-27 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US6027857A (en) * | 1995-04-27 | 2000-02-22 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US6171735B1 (en) | 1995-04-27 | 2001-01-09 | 3M Innovative Properties Company | Negative-acting no-process printing plates |
| EP0839838A3 (en) * | 1996-10-31 | 1998-11-25 | Dow Corning Corporation | Polybutylene containing reactive unsaturated functionality |
Also Published As
| Publication number | Publication date |
|---|---|
| IT977259B (it) | 1974-09-10 |
| DE2306531A1 (de) | 1973-08-30 |
| JPS4889290A (enrdf_load_stackoverflow) | 1973-11-21 |
| FR2171326B1 (enrdf_load_stackoverflow) | 1976-06-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SE7612232L (sv) | Stralningsherdbara beleggningskompositioner innefattande merkaptoalkylkisel och vinylmonomer | |
| ATE18470T1 (de) | Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial. | |
| DK192376A (da) | Fremgangsmade til polymerisation af vinylchlorid i podet microsuspension | |
| DK152436C (da) | Fremgangsmaade til polymerisation af ethylenisk umaettede monomere | |
| FR2171326A1 (en) | Photo-cross linking polymers - from vinyl hydrocarbons maleic anhydride and acrylic cpds | |
| ATE13362T1 (de) | Flexible, laminierbare lichtempfindliche schicht. | |
| DK148962C (da) | Fremgangsmaade til polymerisation eller copolymerisation af ethylen samtapparat til brug ved fremgangsmaaden | |
| ZA794131B (en) | Process for the development of exposed light-sensitive printing plates based on o-naphthoquinone-diazides | |
| SE7800769L (sv) | Forfaringssett for polymerisation av vinylmonomerer | |
| NO148419C (no) | Vandig belegningsmiddel, fortrinnsvis for trefiberplater, paa basis av en akrylesterkopolymer | |
| ES2045858T3 (es) | Copolimero reticulable fluorado, su procedimiento de fabricacion y su aplicacion en los barnices y pinturas. | |
| NL7800929A (nl) | Werkwijze voor het bereiden van gekleurde poly- meren, werkwijze voor het aanbrengen van een bekledingslaag en voorwerpen voorzien van een bekledingslaag. | |
| FR2088402B1 (enrdf_load_stackoverflow) | ||
| KR890017674A (ko) | 레이저 사진 정보기록에 적당한 광중합가능한 조성물 | |
| JPS4822170B1 (enrdf_load_stackoverflow) | ||
| DK152759C (da) | Fremgangsmaade til fjernelse af vinylchloridmonomer fra en vinylchloridpolymer | |
| JPS52150493A (en) | Ultraviolet light curing resin compositions | |
| GB1277428A (en) | Light-sensitive materials | |
| ES369638A1 (es) | Procedimiento para mejorar la polimerizacion injertada o copolimerizacion injertada, inducida por radiaciones ioni- zantes ricas en energia de uno o varios compuestos polimeri-zables. | |
| JPS5518674A (en) | Ionized radiation sensitive negative type resist | |
| JPS574047A (en) | Lithographic original plate | |
| GB1057976A (en) | Polymers and photographic emulsions containing them | |
| JPS5546750A (en) | Photosensitive material | |
| JPS576842A (en) | Photographic element | |
| DK97777A (da) | Fremgangsmade til polymerisation af forbindelser indeholdende mindst en vinylgruppe |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |