FR2147497A5 - - Google Patents
Info
- Publication number
- FR2147497A5 FR2147497A5 FR7127812A FR7127812A FR2147497A5 FR 2147497 A5 FR2147497 A5 FR 2147497A5 FR 7127812 A FR7127812 A FR 7127812A FR 7127812 A FR7127812 A FR 7127812A FR 2147497 A5 FR2147497 A5 FR 2147497A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7127812A FR2147497A5 (zh) | 1971-07-29 | 1971-07-29 | |
US00275304A US3778656A (en) | 1971-07-29 | 1972-07-26 | Ion source employing a microwave resonant cavity |
GB3521172A GB1352654A (en) | 1971-07-29 | 1972-07-27 | Ion source which makes use of a microwave resonant cavity |
DE2237252A DE2237252A1 (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
DE19727228091U DE7228091U (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7127812A FR2147497A5 (zh) | 1971-07-29 | 1971-07-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2147497A5 true FR2147497A5 (zh) | 1973-03-09 |
Family
ID=9081130
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7127812A Expired FR2147497A5 (zh) | 1971-07-29 | 1971-07-29 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3778656A (zh) |
DE (2) | DE7228091U (zh) |
FR (1) | FR2147497A5 (zh) |
GB (1) | GB1352654A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2475798A1 (fr) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
EP0334184A2 (en) * | 1988-03-16 | 1989-09-27 | Hitachi, Ltd. | Microwave ion source |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2621824C2 (de) * | 1976-05-17 | 1982-04-29 | Hitachi, Ltd., Tokyo | Mikrowellen-Entladungs-Ionenquelle |
US4185213A (en) * | 1977-08-31 | 1980-01-22 | Reynolds Metals Company | Gaseous electrode for MHD generator |
JPS55131175A (en) * | 1979-03-30 | 1980-10-11 | Toshiba Corp | Surface treatment apparatus with microwave plasma |
US4240007A (en) * | 1979-06-29 | 1980-12-16 | International Business Machines Corporation | Microchannel ion gun |
US4393333A (en) * | 1979-12-10 | 1983-07-12 | Hitachi, Ltd. | Microwave plasma ion source |
JPS5947421B2 (ja) * | 1980-03-24 | 1984-11-19 | 株式会社日立製作所 | マイクロ波イオン源 |
CA1159012A (en) * | 1980-05-02 | 1983-12-20 | Seitaro Matsuo | Plasma deposition apparatus |
JPS5779621A (en) * | 1980-11-05 | 1982-05-18 | Mitsubishi Electric Corp | Plasma processing device |
JPS6043620B2 (ja) * | 1982-11-25 | 1985-09-28 | 日新ハイボルテージ株式会社 | マイクロ波イオン源 |
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
FR2546358B1 (fr) * | 1983-05-20 | 1985-07-05 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique des electrons |
FR2572847B1 (fr) * | 1984-11-06 | 1986-12-26 | Commissariat Energie Atomique | Procede et dispositif d'allumage d'une source d'ions hyperfrequence |
US4649278A (en) * | 1985-05-02 | 1987-03-10 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Generation of intense negative ion beams |
DE3703207A1 (de) * | 1987-02-04 | 1988-08-18 | Loet Und Schweissgeraete Gmbh | Hochfrequenzionenquelle |
DE3712971A1 (de) * | 1987-04-16 | 1988-11-03 | Plasonic Oberflaechentechnik G | Verfahren und vorrichtung zum erzeugen eines plasmas |
US4778561A (en) * | 1987-10-30 | 1988-10-18 | Veeco Instruments, Inc. | Electron cyclotron resonance plasma source |
DE3738352A1 (de) * | 1987-11-11 | 1989-05-24 | Technics Plasma Gmbh | Filamentloses magnetron-ionenstrahlsystem |
DE3803355A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage |
DE3834984A1 (de) * | 1988-10-14 | 1990-04-19 | Leybold Ag | Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen |
GB9224745D0 (en) * | 1992-11-26 | 1993-01-13 | Atomic Energy Authority Uk | Microwave plasma generator |
DE19513345C2 (de) * | 1995-04-08 | 2000-08-03 | Ehret Hans P | ECR-Ionenquelle |
DE19600223A1 (de) * | 1996-01-05 | 1997-07-17 | Ralf Dr Dipl Phys Spitzl | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
DE19608949A1 (de) * | 1996-03-08 | 1997-09-11 | Ralf Dr Spitzl | Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen |
DE19757852C2 (de) * | 1997-12-24 | 2001-06-28 | Karlsruhe Forschzent | Vorrichtung und Verfahren zur Dotierung von Gefäßstützen mit radiaktiven und nicht radioaktiven Atomen |
DE19900437B4 (de) * | 1999-01-11 | 2009-04-23 | Ehret, Hans-P. | Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung |
US7461502B2 (en) * | 2003-03-20 | 2008-12-09 | Elwing Llc | Spacecraft thruster |
EP1460267B1 (en) * | 2003-03-20 | 2006-08-09 | Elwing LLC | Spacecraft thruster |
ATE454553T1 (de) * | 2004-09-22 | 2010-01-15 | Elwing Llc | Antriebssystem für raumfahrzeuge |
KR101260631B1 (ko) * | 2007-10-10 | 2013-05-06 | 엠케이에스 인스트루먼츠, 인코포레이티드 | 사중극 또는 비행시간형 질량 분석기를 이용한 화학적 이온화 반응 또는 양자 전이 반응 질량 분석법 |
NL2014415B1 (en) * | 2015-03-06 | 2016-10-13 | Jiaco Instr Holding B V | System and method for decapsulation of plastic integrated circuit packages. |
CN106102301B (zh) * | 2016-07-29 | 2019-01-29 | 中国原子能科学研究院 | 紧凑型超导质子回旋加速器中可耐高压的静电偏转板 |
ES2696227B2 (es) * | 2018-07-10 | 2019-06-12 | Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat | Fuente de iones interna para ciclotrones de baja erosion |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3418206A (en) * | 1963-04-29 | 1968-12-24 | Boeing Co | Particle accelerator |
-
1971
- 1971-07-29 FR FR7127812A patent/FR2147497A5/fr not_active Expired
-
1972
- 1972-07-26 US US00275304A patent/US3778656A/en not_active Expired - Lifetime
- 1972-07-27 GB GB3521172A patent/GB1352654A/en not_active Expired
- 1972-07-28 DE DE19727228091U patent/DE7228091U/de not_active Expired
- 1972-07-28 DE DE2237252A patent/DE2237252A1/de active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2475798A1 (fr) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
EP0334184A2 (en) * | 1988-03-16 | 1989-09-27 | Hitachi, Ltd. | Microwave ion source |
EP0334184A3 (en) * | 1988-03-16 | 1989-11-29 | Hitachi, Ltd. | Microwave ion source |
Also Published As
Publication number | Publication date |
---|---|
GB1352654A (en) | 1974-05-08 |
DE2237252A1 (de) | 1973-02-01 |
DE7228091U (de) | 1973-09-20 |
US3778656A (en) | 1973-12-11 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |