FR2112970A5 - - Google Patents
Info
- Publication number
- FR2112970A5 FR2112970A5 FR7133820A FR7133820A FR2112970A5 FR 2112970 A5 FR2112970 A5 FR 2112970A5 FR 7133820 A FR7133820 A FR 7133820A FR 7133820 A FR7133820 A FR 7133820A FR 2112970 A5 FR2112970 A5 FR 2112970A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/08—Germanium
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- H10P14/24—
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- H10P14/2905—
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- H10P14/3411—
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- H10P32/15—
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- H10P95/00—
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- H10W15/00—
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- H10W15/01—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/007—Autodoping
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/037—Diffusion-deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/916—Autodoping control or utilization
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8620870A | 1970-11-02 | 1970-11-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2112970A5 true FR2112970A5 (OSRAM) | 1972-06-23 |
Family
ID=22197006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7133820A Expired FR2112970A5 (OSRAM) | 1970-11-02 | 1971-09-16 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3765960A (OSRAM) |
| JP (1) | JPS5336311B1 (OSRAM) |
| DE (1) | DE2154386C3 (OSRAM) |
| FR (1) | FR2112970A5 (OSRAM) |
| GB (1) | GB1342542A (OSRAM) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3885061A (en) * | 1973-08-17 | 1975-05-20 | Rca Corp | Dual growth rate method of depositing epitaxial crystalline layers |
| US4239584A (en) * | 1978-09-29 | 1980-12-16 | International Business Machines Corporation | Molecular-beam epitaxy system and method including hydrogen treatment |
| JPS55110032A (en) * | 1979-02-19 | 1980-08-25 | Fujitsu Ltd | Method for high-frequency heated epitaxial growth |
| US4523051A (en) * | 1983-09-27 | 1985-06-11 | The Boeing Company | Thin films of mixed metal compounds |
| US4504330A (en) * | 1983-10-19 | 1985-03-12 | International Business Machines Corporation | Optimum reduced pressure epitaxial growth process to prevent autodoping |
| US4687682A (en) * | 1986-05-02 | 1987-08-18 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Back sealing of silicon wafers |
| JPH01161826A (ja) * | 1987-12-18 | 1989-06-26 | Toshiba Corp | 気相エピタキシャル成長法 |
| US4859626A (en) * | 1988-06-03 | 1989-08-22 | Texas Instruments Incorporated | Method of forming thin epitaxial layers using multistep growth for autodoping control |
| FR2766845B1 (fr) * | 1997-07-31 | 1999-10-15 | Sgs Thomson Microelectronics | Procede d'epitaxie sur un substrat de silicium comprenant des zones fortement dopees a l'arsenic |
| JP4016371B2 (ja) * | 1999-11-10 | 2007-12-05 | 信越半導体株式会社 | シリコンエピタキシャルウェーハの製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL252729A (OSRAM) * | 1959-06-18 | |||
| US3172792A (en) * | 1961-07-05 | 1965-03-09 | Epitaxial deposition in a vacuum onto semiconductor wafers through an in- teracttgn between the wafer and the support material | |
| US3177100A (en) * | 1963-09-09 | 1965-04-06 | Rca Corp | Depositing epitaxial layer of silicon from a vapor mixture of sih4 and h3 |
| USB524765I5 (OSRAM) * | 1966-02-03 | 1900-01-01 | ||
| DE1519892A1 (de) * | 1966-06-02 | 1969-02-20 | Siemens Ag | Verfahren zum Herstellen von hochreinen kristallinen,insbesondere einkristallinen Materialien |
| US3484311A (en) * | 1966-06-21 | 1969-12-16 | Union Carbide Corp | Silicon deposition process |
| US3669769A (en) * | 1970-09-29 | 1972-06-13 | Ibm | Method for minimizing autodoping in epitaxial deposition |
-
1970
- 1970-11-02 US US00086208A patent/US3765960A/en not_active Expired - Lifetime
-
1971
- 1971-09-16 FR FR7133820A patent/FR2112970A5/fr not_active Expired
- 1971-10-12 GB GB4733771A patent/GB1342542A/en not_active Expired
- 1971-10-25 JP JP8402571A patent/JPS5336311B1/ja active Pending
- 1971-11-02 DE DE2154386A patent/DE2154386C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5336311B1 (OSRAM) | 1978-10-02 |
| DE2154386A1 (de) | 1972-05-10 |
| DE2154386C3 (de) | 1981-01-22 |
| GB1342542A (en) | 1974-01-03 |
| DE2154386B2 (de) | 1980-05-08 |
| US3765960A (en) | 1973-10-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |