FR2088647A5 - - Google Patents

Info

Publication number
FR2088647A5
FR2088647A5 FR7014233A FR7014233A FR2088647A5 FR 2088647 A5 FR2088647 A5 FR 2088647A5 FR 7014233 A FR7014233 A FR 7014233A FR 7014233 A FR7014233 A FR 7014233A FR 2088647 A5 FR2088647 A5 FR 2088647A5
Authority
FR
France
Prior art keywords
composition
specifications
coated
april
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7014233A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR7014233A priority Critical patent/FR2088647A5/fr
Priority to BE765969A priority patent/BE765969A/en
Priority to GB1007871A priority patent/GB1343609A/en
Application granted granted Critical
Publication of FR2088647A5 publication Critical patent/FR2088647A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1343609 Photo-sensitive materials EASTMAN KODAK CO 20 April 1971 [20 April 1970] 10078/71 Heading G2C [Also in Division C3] A photo-sensitive composition comprises a polymer having residual conjugated double bands capable of cross-linking upon exposure, a solvent for the polymer and a pigment of particles completely coated with a substance insoluble in the solvent. Specified polymers are polyesters of diols with diacids containing conjugated double bands and optionally mixed with aromatic diacids as in Specification 1312655 or the polymers of Specifications 846908 and 951928. The composition may contain a sensitiser (methyl benzothiazolylidenedithioacetate). Specified pigments are Monastral Blue RFS and BGS and the pigments of Specifications 978242 and 1149898 and French Specifications 1440131 and 1476138. The composition is coated on a support and imagewise exposed and developed to remove unexposed areas and produce a coloured resist image which may be used as a printing plate. The coated pigment results in a more stable composition with less tendency to crystallize or flocculate.
FR7014233A 1970-04-20 1970-04-20 Expired FR2088647A5 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR7014233A FR2088647A5 (en) 1970-04-20 1970-04-20
BE765969A BE765969A (en) 1970-04-20 1971-04-19 COMPOSITIONS BASED ON PHOTOSENSITIVE RESINS AND PROCESS FOR OBTAINING COLORED RESERVES USING THESE COMPOSITIONS
GB1007871A GB1343609A (en) 1970-04-20 1971-04-20 Light-sensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7014233A FR2088647A5 (en) 1970-04-20 1970-04-20

Publications (1)

Publication Number Publication Date
FR2088647A5 true FR2088647A5 (en) 1972-01-07

Family

ID=9054263

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7014233A Expired FR2088647A5 (en) 1970-04-20 1970-04-20

Country Status (3)

Country Link
BE (1) BE765969A (en)
FR (1) FR2088647A5 (en)
GB (1) GB1343609A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0738931A2 (en) * 1995-04-21 1996-10-23 Agfa-Gevaert N.V. A diazo based imaging element comprising metal-free phtalocyanine as pigment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0738931A2 (en) * 1995-04-21 1996-10-23 Agfa-Gevaert N.V. A diazo based imaging element comprising metal-free phtalocyanine as pigment
EP0738931A3 (en) * 1995-04-21 1998-01-21 Agfa-Gevaert N.V. A diazo based imaging element comprising metal-free phtalocyanine as pigment

Also Published As

Publication number Publication date
GB1343609A (en) 1974-01-16
BE765969A (en) 1971-10-19

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Legal Events

Date Code Title Description
ST Notification of lapse