FR2088402A1 - - Google Patents

Info

Publication number
FR2088402A1
FR2088402A1 FR7116356A FR7116356A FR2088402A1 FR 2088402 A1 FR2088402 A1 FR 2088402A1 FR 7116356 A FR7116356 A FR 7116356A FR 7116356 A FR7116356 A FR 7116356A FR 2088402 A1 FR2088402 A1 FR 2088402A1
Authority
FR
France
Prior art keywords
chosen
hydrogen
radicals
alkyl
propargyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7116356A
Other languages
English (en)
Other versions
FR2088402B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Corp
Original Assignee
GAF Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GAF Corp filed Critical GAF Corp
Publication of FR2088402A1 publication Critical patent/FR2088402A1/fr
Application granted granted Critical
Publication of FR2088402B1 publication Critical patent/FR2088402B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C08F8/32—Introducing nitrogen atoms or nitrogen-containing groups by reaction with amines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR717116356A 1970-05-07 1971-05-06 Expired FR2088402B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3555170A 1970-05-07 1970-05-07

Publications (2)

Publication Number Publication Date
FR2088402A1 true FR2088402A1 (fr) 1972-01-07
FR2088402B1 FR2088402B1 (fr) 1974-02-15

Family

ID=21883397

Family Applications (1)

Application Number Title Priority Date Filing Date
FR717116356A Expired FR2088402B1 (fr) 1970-05-07 1971-05-06

Country Status (7)

Country Link
US (1) US3657197A (fr)
JP (1) JPS5033768B1 (fr)
CA (1) CA922850A (fr)
CH (1) CH573608A5 (fr)
DE (1) DE2122036A1 (fr)
FR (1) FR2088402B1 (fr)
GB (1) GB1350214A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303986A2 (fr) * 1987-08-12 1989-02-22 Atochem North America, Inc. Stabilisants à usage multiple, liés à des polymères
EP0303988A2 (fr) * 1987-08-12 1989-02-22 Atochem North America, Inc. Stabilisants UV liés à des polymères
EP0306729A1 (fr) * 1987-08-12 1989-03-15 Atochem North America, Inc. Antioxydants liés à des polymères

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093427A (ja) * 1983-10-28 1985-05-25 Nippon Kayaku Co Ltd 感光性樹脂の硬化方法
DE3606155A1 (de) * 1986-02-26 1987-08-27 Basf Ag Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
WO2019166405A1 (fr) * 2018-03-02 2019-09-06 Agfa-Gevaert Nv Encres pour jet d'encre pour la fabrication de cartes de circuits imprimés

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6900160A (fr) * 1968-01-08 1969-07-10

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6900160A (fr) * 1968-01-08 1969-07-10

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0303986A2 (fr) * 1987-08-12 1989-02-22 Atochem North America, Inc. Stabilisants à usage multiple, liés à des polymères
EP0303988A2 (fr) * 1987-08-12 1989-02-22 Atochem North America, Inc. Stabilisants UV liés à des polymères
EP0303988A3 (en) * 1987-08-12 1989-03-08 Pennwalt Corporation Polymer bound uv stabilizers
EP0303986A3 (en) * 1987-08-12 1989-03-08 Pennwalt Corporation Multipurpose polymer bound stabilizers
EP0306729A1 (fr) * 1987-08-12 1989-03-15 Atochem North America, Inc. Antioxydants liés à des polymères

Also Published As

Publication number Publication date
GB1350214A (en) 1974-04-18
US3657197A (en) 1972-04-18
CH573608A5 (fr) 1976-03-15
CA922850A (en) 1973-03-13
DE2122036A1 (de) 1971-11-18
JPS5033768B1 (fr) 1975-11-04
FR2088402B1 (fr) 1974-02-15

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Legal Events

Date Code Title Description
ST Notification of lapse