GB861871A - Photosensitive materials and processing thereof - Google Patents

Photosensitive materials and processing thereof

Info

Publication number
GB861871A
GB861871A GB39161/57A GB3916157A GB861871A GB 861871 A GB861871 A GB 861871A GB 39161/57 A GB39161/57 A GB 39161/57A GB 3916157 A GB3916157 A GB 3916157A GB 861871 A GB861871 A GB 861871A
Authority
GB
United Kingdom
Prior art keywords
examples
diazo
processing
relief
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB39161/57A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Monsanto Chemicals Ltd
Monsanto Chemical Co
Original Assignee
Monsanto Chemicals Ltd
Monsanto Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Monsanto Chemicals Ltd, Monsanto Chemical Co filed Critical Monsanto Chemicals Ltd
Publication of GB861871A publication Critical patent/GB861871A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

861,871. Photosensitive compositions and procedures therewith. MONSANTO CHEMICAL CO. Dec. 17, 1957 [Dec. 17, 1956(2)], No. 39161/57. Class 98(2) The compositions comprise a photosensitive material and a partial carboxylic acid-partial carboxylic ester obtainable by the copolymerisation of a vinyl or vinylidene hydrocarbon, ester, ether, nitrile or halide and an olefinic alpha, beta-dicarboxylic acid or anhydride or ester thereof, from 5-90 %of the total carboxylic acid plus carboxylic ester groups being aliphatic, cycloaliphatic or aromatic carboxylic ester groups. As described the compositions in organic solvents, or such with a minor proportion of water where the photosensitive material requires this, are coated, exposed and processed by generally conventional methods, the resinous copolymers being sufficiently waterpermeable or solvent or alkali removable for the desired type of processing. Seventy-six of the polymers are described or indicated, and the photographic procedures followed as more particularly described are, Examples 1-17 onecomponent diazotype; Examples 18, 19 twocomponent diazotype; Examples 20, 21 silver bromide directly precipitated into the resin solution which is flowed on to a polyester glass cloth and dried with subsequent neutral amidol development; Examples 22-24 ferric chloride blue-print procedure; Examples 25-28 bichromate relief with acetone/water processing; Examples 29, 30 diazo relief including heat lamp exposure and caustic alkaline wash out of image area; Examples 31-33 diazo intaglio including coupling and ammonia washing out of image (coupled) area. Iron-silver and other iron and silver sensitising systems are referred to briefly. Printing plate production includes relief, intaglio and planographic. Numerous diazo sensitisers, monomers, adjuncts for the polymers such as softeners, hardeners and pigments; solvents, coating methods, supports, couplers and other processing liquids are referred to.
GB39161/57A 1956-12-17 1957-12-07 Photosensitive materials and processing thereof Expired GB861871A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US628492A US2980534A (en) 1956-12-17 1956-12-17 Photographic compositions and photographic elements

Publications (1)

Publication Number Publication Date
GB861871A true GB861871A (en) 1961-03-01

Family

ID=24519109

Family Applications (1)

Application Number Title Priority Date Filing Date
GB39161/57A Expired GB861871A (en) 1956-12-17 1957-12-07 Photosensitive materials and processing thereof

Country Status (2)

Country Link
US (1) US2980534A (en)
GB (1) GB861871A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3297787A (en) * 1963-04-26 1967-01-10 Dow Chemical Co Copolymers of unsaturated dicarboxylic acid anhydrides and vinyl compounds
US3363029A (en) * 1965-11-24 1968-01-09 Sinclair Research Inc Amine and ammonium salts of allylic esters of styrene/maleic anhydride polymers as stabilizer in aqueous polymerization processes
US4275138A (en) 1973-07-23 1981-06-23 Fuji Photo Film Co., Ltd. Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate
GB2143961A (en) * 1983-05-23 1985-02-20 Fusion Semiconductor Systems Hardening photoresist
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
GB2277601A (en) * 1993-04-29 1994-11-02 Ronald Frederik Johnson Photosensitive negative material and composition therefor
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3170792A (en) * 1961-02-10 1965-02-23 Owens Illinois Glass Co Process for making a stencil screen coating and composition therefor
US3170791A (en) * 1961-02-10 1965-02-23 Owens Illinois Glass Co Process for making a stencil screen coating and composition therefor
US3352677A (en) * 1963-06-24 1967-11-14 Gen Aniline & Film Corp Transparentizing base stock of tracing papers and intermediate diazotype papers by use of polypropenes
DE1224611B (en) * 1963-09-25 1966-09-08 Kalle Ag Photosensitive copy material for the diazotype with 2,5-dialkoxy-4-tert-aminobenzene-diazonium salts
US3536490A (en) * 1964-04-28 1970-10-27 Pitney Bowes Inc Novel diazotype copying process
US3416926A (en) * 1964-10-02 1968-12-17 Eastman Kodak Co Scribing film
US3479183A (en) * 1965-06-16 1969-11-18 Tecnifax Corp Negative-working diazosulfonate reproduction process
US3539345A (en) * 1967-02-01 1970-11-10 Gaf Corp Thermal diazotype papers
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3868255A (en) * 1969-07-23 1975-02-25 Gaf Corp Diazonium salts and diazotype materials
US3622335A (en) * 1970-01-13 1971-11-23 Norman Thomas Notley Copolymers of an alpha acrylonitrile and a styrene used as vehicles in vesicular materials
US3873316A (en) * 1970-06-11 1975-03-25 Kalle Ag Process for the production of a light-sensitive copying material having a copper-containing support, and copying material so produced
JPS5027375B1 (en) * 1971-01-19 1975-09-06
US3877947A (en) * 1971-01-19 1975-04-15 Nobuo Tsuji Photographic element
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
US3980478A (en) * 1974-07-05 1976-09-14 Eastman Kodak Company Method of making an ultraviolet light image recording using a visible-light reflective intermediate element
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
DE2834059A1 (en) * 1978-08-03 1980-02-14 Hoechst Ag LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
US4362808A (en) * 1979-07-25 1982-12-07 Armstrong World Industries, Inc. Print screen stencil and its production
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
JPS57181543A (en) * 1981-04-30 1982-11-09 Ricoh Co Ltd Diazo copying material
US4555468A (en) * 1983-05-04 1985-11-26 Daicel Chemical Industries, Ltd. Photosensitive diazonium material with precoat of graft polymer prepared by grafting cellulose derivation with radical polymerizable monomer
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1981102A (en) * 1932-08-10 1934-11-20 Agfa Ansco Corp Photographic material and process of making the same
GB585760A (en) * 1944-10-30 1947-02-24 John Alfred Henry Hart Improvements in or relating to photographic emulsions
US2616851A (en) * 1947-04-29 1952-11-04 Socony Vacuum Oil Co Inc Mineral oil composition containing esters of product obtained by reaction between maleic anhydride and vinyl acetate
US2835656A (en) * 1953-11-25 1958-05-20 Eastman Kodak Co Light-sensitive polymers for photography
US2719141A (en) * 1954-07-07 1955-09-27 Eastman Kodak Co Hydantoin esters of maleic anhydride copolymers

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3297787A (en) * 1963-04-26 1967-01-10 Dow Chemical Co Copolymers of unsaturated dicarboxylic acid anhydrides and vinyl compounds
US3363029A (en) * 1965-11-24 1968-01-09 Sinclair Research Inc Amine and ammonium salts of allylic esters of styrene/maleic anhydride polymers as stabilizer in aqueous polymerization processes
US4275138A (en) 1973-07-23 1981-06-23 Fuji Photo Film Co., Ltd. Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate
GB2143961A (en) * 1983-05-23 1985-02-20 Fusion Semiconductor Systems Hardening photoresist
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
JPS6236657A (en) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd Resist composition
GB2277601A (en) * 1993-04-29 1994-11-02 Ronald Frederik Johnson Photosensitive negative material and composition therefor

Also Published As

Publication number Publication date
US2980534A (en) 1961-04-18

Similar Documents

Publication Publication Date Title
GB861871A (en) Photosensitive materials and processing thereof
US2990281A (en) Photosensitive resinous compositions and photographic elements
US3574617A (en) Novel photosensitive coating systems
US2675315A (en) Photosensitive coating containing a hydrophilic colloid and a polyvinyl chloride dispersion
US3778270A (en) Photosensitive bis-diazonium salt compositions and elements
US3411912A (en) Novel polymers and their use in photographic applications
US3556792A (en) Novel substituted allyl polymer derivatives useful as photoresists
CA1164710A (en) Phototropic photosensitive compositions containing fluoran colorformer
US4374193A (en) Photosensitive material and process for developing the same
US3101270A (en) Photopolymerization of unsaturated organic compounds by means of radiation sensitive iron compounds as photoinitiators
US3575925A (en) Photosensitive coating systems
US3029145A (en) Preparation of polymer resist images
US3801638A (en) Triacrylyldiethylenetriamine,method of producing the same,and photopolymerization process and system utilizing the same
US3048487A (en) Basic mordants derived from the reaction between maleic anhydride interpolymers and disubstituted diamines
US3494767A (en) Copying material for use in the photochemical preparation of printing plates
US3617278A (en) Azide sensitizers and photographic elements
US1587269A (en) Synthetic resins, photographic process, and media
US3644118A (en) Polydiacrylyl photosensitive compositions
US3770443A (en) Photosensitive composition comprising a photosensitive polymer
GB775414A (en) Improvements in or relating to light-sensitive elements and the production of reliefand printing images therefrom
US3795640A (en) Furfuryl,allyl and methylol acrylamide esters of polymeric acids
US2811509A (en) Light-sensitive polymers for photography
US2751373A (en) Light-sensitive polymers for photomechanical processes
US3157501A (en) Production of dyed polymeric images
GB1297171A (en)