FR2051311A5 - - Google Patents

Info

Publication number
FR2051311A5
FR2051311A5 FR7023587A FR7023587A FR2051311A5 FR 2051311 A5 FR2051311 A5 FR 2051311A5 FR 7023587 A FR7023587 A FR 7023587A FR 7023587 A FR7023587 A FR 7023587A FR 2051311 A5 FR2051311 A5 FR 2051311A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7023587A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP44049683A external-priority patent/JPS4943561B1/ja
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Application granted granted Critical
Publication of FR2051311A5 publication Critical patent/FR2051311A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7023587A 1969-06-25 1970-06-25 Expired FR2051311A5 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP44049683A JPS4943561B1 (fr) 1969-06-25 1969-06-25
JP1375670 1970-02-19

Publications (1)

Publication Number Publication Date
FR2051311A5 true FR2051311A5 (fr) 1971-04-02

Family

ID=26349596

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7023587A Expired FR2051311A5 (fr) 1969-06-25 1970-06-25

Country Status (3)

Country Link
DE (1) DE2031476A1 (fr)
FR (1) FR2051311A5 (fr)
GB (1) GB1321108A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3787211A (en) * 1971-12-10 1974-01-22 Basf Ag Makeready foil for relief printing
EP0002321B1 (fr) 1977-11-29 1981-10-28 Bexford Limited Eléments photopolymérisables et procédé pour fabriquer des plaques d'impression à partir de tels éléments
US4315066A (en) 1979-03-29 1982-02-09 Bexford Limited Substrates suitable for the production of photopolymerizable elements
FR2455305A1 (fr) * 1979-04-24 1980-11-21 Uk Poligrafichesky Instit Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
FR2457512A1 (fr) * 1979-05-22 1980-12-19 Uk Poligrafichesky Instit Composition adhesive-antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
EP0101210B1 (fr) * 1982-08-11 1989-09-27 Imperial Chemical Industries Plc Ensemble utilisable dans la fabrication des plaques d'imprimerie
CN113306334A (zh) * 2021-05-28 2021-08-27 深圳市恒兴安实业有限公司 一种立金金属标牌制作工艺

Also Published As

Publication number Publication date
GB1321108A (en) 1973-06-20
DE2031476A1 (de) 1971-01-07

Similar Documents

Publication Publication Date Title
AU2270770A (fr)
AU465452B2 (fr)
AU429630B2 (fr)
AU450150B2 (fr)
AU2355770A (fr)
AU442375B2 (fr)
AU427401B2 (fr)
AU470301B1 (fr)
AU442463B2 (fr)
AT308690B (fr)
AU428129B2 (fr)
AU428131B2 (fr)
AU417208B2 (fr)
AU425297B2 (fr)
AU438128B2 (fr)
AU470661B1 (fr)
AU442285B2 (fr)
AU442322B2 (fr)
AU442357B2 (fr)
AU414607B2 (fr)
AU442380B2 (fr)
AU410358B2 (fr)
AU442535B2 (fr)
AU442538B2 (fr)
AU442554B2 (fr)